Method of bonding silver to glass and mirrors produced according to this method
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B32B-009/04
출원번호
US-0636511
(1984-07-31)
발명자
/ 주소
Pitts, John R.
Thomas, Terence M.
Czanderna, Alvin W.
출원인 / 주소
The United States of America as represented by the United States Department of Energy
대리인 / 주소
Richardson, Kenneth L.Albrecht, John M.Hightower, Judson R.
인용정보
피인용 횟수 :
45인용 특허 :
0
초록▼
A method for adhering silver to a glass substrate for producing mirrors includes attaining a silicon enriched substrate surface by reducing the oxygen therein in a vacuum and then vacuum depositing a silver layer onto the silicon enriched surface. The silicon enrichment can be attained by electron b
A method for adhering silver to a glass substrate for producing mirrors includes attaining a silicon enriched substrate surface by reducing the oxygen therein in a vacuum and then vacuum depositing a silver layer onto the silicon enriched surface. The silicon enrichment can be attained by electron beam bombardment, ion beam bombardment, or neutral beam bombardment. It can also be attained by depositing a metal, such as aluminum, on the substrate surface, allowing the metal to oxidize by pulling oxygen from the substrate surface, thereby leaving a silicon enriched surface, and then etching or eroding the metal oxide layer away to expose the silicon enriched surface. Ultraviolet rays can be used to maintain dangling silicon bonds on the enriched surface until covalent bonding with the silver can occur. This disclosure also includes encapsulated mirrors with diffusion layers built therein. One of these mirrors is assembled on a polymer substrate.
대표청구항▼
1. The method of adhering silver to the surface of a glass substrate, comprising the steps of: placing the glass substrate in an evacuated chamber; enriching the surface of the glass substrate with silicon atoms while the surface of the glass substrate is in the evacuated chamber so as to substa
1. The method of adhering silver to the surface of a glass substrate, comprising the steps of: placing the glass substrate in an evacuated chamber; enriching the surface of the glass substrate with silicon atoms while the surface of the glass substrate is in the evacuated chamber so as to substantially eliminate the oxygen from the surface of the glass substrate and to substantially protect the surface from impurities and contaminants; and depositing silver atoms on the silicon-enriched surface of the glass substrate while the glass substrate is in the evacuated chamber, and wherein eliminating the oxygen from the surface of the glass substrate and protecting the surface from impurities enables a bond to be formed between the silicon atoms and silver atoms which has sufficient strength and durability to withstand degradation caused by terrestrial environmental conditions. 2. The method of claim 1, wherein the step of silicon enriching the substrate surface is accomplished by the step of bombarding the surface of the glass substrate with a beam of electrons. 3. The method of claim 1, wherein the step of silicon enriching the substrate surface is accomplished by the step of bombarding the surface of the glass substrate with a beam of ions. 4. The method of claim 1, wherein the step of silicon enriching the substrate surface is accomplished by the step of bombarding the surface of the glass substrate with a neutral beam. 5. The method of claim 1, wherein the step of silicon enriching the substrate surface is accomplished by the step of depositing a layer of silicon on the surface of the glass substrate . 6. The method of claim 1, wherein the step of silicon enriching the substrate surface is accomplished by the step of depositing a layer of metal that has a greater affinity for oxygen than silicon on the surface of the glass substrate, allowing the metal to react with the oxygen in the glass substrate surface layer to form metal oxide over a layer of oxygen-reduced, silicon-enriched substrate. 7. The method of claim 6, including the additional step of etching the layer of metal oxide off the substrate to expose the silicon-enriched surface layer of the substrate. 8. The method of claim 7, wherein the step of etching the metal oxide off the substrate is accomplished by ion beam bombardment of the metal oxide layer until the metal oxide layer is completely removed from the substrate. 9. The method of claim 7, wherein the step of depositing a layer of metal on the substrate surface is accomplished by depositing aluminum on the substrate surface. 10. The method of claim 7, including the additional step of heating the substrate after the metal layer is deposited thereon to a temperature approaching, but not reaching, the softening temperature of the glass substrate to enhance oxidation of the metal on the surface of the substrate. 11. The method of claim 1, including the step of shining ultraviolet rays on the substrate surface during the steps of silicon enriching the substrate surface and depositing silver thereon. 12. A process for forming a silvered-glass mirror having a silver layer substantially impervious to separation due to environmental weathering, said process comprising the steps of: placing a glass substrate in an evacuated chamber; reducing a surface of the glass substrate in the chamber such that the surface of the glass substrate is substantially devoid of oxygen and comprised substantially of only a metal-like silicon layer; depositing and bonding a layer of silicon on said reduced surface to form a composite structure so as to effect formation of direct silver-to-silicon covalent bonding, and wherein reducing the surface of the glass substrate substantially enhances adhesion of the silver layer to the glass substrate as defined by the properties of such covalent silver-to-silicon covalent bonds. 13. The process of claim 12, including the additional steps of dissolving a polymer that is free of heavy metals, fluorides chlorides, and sulfides in a suitable solvent to obtain a liquid form, spreading the dissolved polymer over the silver layer and over the edges of the silver layer and the silver-to-glass interface, and allowing the solvent to evaporate leaving the silver layer and the edges of the silver and the silver-to-glass interface encapsulated and sealed by hardened polymer. 14. A silvered-glass mirror capable of providing protection against moisture and other forms of environmental weathering having a structure fabricated by a process comprising the steps of: placing a polymer substrate in an evacuated chamber; depositing a layer of transparent metal oxide on a surface of the polymer substrate; enriching the exposed surface of the metal oxide layer with silicon atoms; depositing a silver layer on the silicon-enriched surface of the metal oxide layer; depositing a metal oxide layer over the exposed surface of the silver layer; removing this composite structure of metal oxide and silver layers bonded to the polymer substrate from the evacuated chamber and encapsulating the composite structure, including the interface edges of all said layers with each other and with the substrate with a dissolved polymer in liquid form, and allowing the solvent to evaporate, leaving a hardened polymer shell that hermetically seals the metal oxide and silver layers and the layer-to-substrate interface edges from the atmosphere. 15. The mirror structure of claim 14, wherein the metal oxide deposited on said substrate surface is silicon oxide. 16. The mirror structure of claim 14, wherein the metal oxide deposited on said substrate surface is aluminum oxide. 17. The mirror structure of claim 15, wherein the fabricating process also includes the step of depositing a silicon-rich layer on the exposed surface of the silver layer and then depositing a layer of silicon oxide on the silicon-rich layer.
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