초록 ▼

The use of photosensitive compositions of matter for electroless deposition of metals, containing (a) 0.1 to 20 percent by weight of a compound of the formula I ##STR## in which Y and R 1 to R 6 are as defined in patent claim 1, (b) 70 to 99.8% by weight of a polymer with H donor groups and an a

The use of photosensitive compositions of matter for electroless deposition of metals, containing (a) 0.1 to 20 percent by weight of a compound of the formula I ##STR## in which Y and R 1 to R 6 are as defined in patent claim 1, (b) 70 to 99.8% by weight of a polymer with H donor groups and an average molecular weight of at least 2,000 Daltons, or of a polymer mixture of a polymer component with H donor groups and an average molecular weight of at least 2,000 Daltons and a second polymer component with an average molecular weight of at least 3,000 Daltons, and (c) 0.1 to 10% by weight of one or more salts of a metal of group Ib or VIII of the periodic table. Images, in particular electrically conductive coatings or patterns, can be produced with the above compositions of matter by exposing the compositions of matter to light and then depositing a metal on the zero-valent, non-conductive metal nuclei thereby formed.

대표청구항 ▼

1. A process for producing an image on the surface of an inorganic or organic substrate, which consists essentially of exposing a photosensitive composition of matter, coated on said substrate, which composition of matter contains (a) 0.1 to 20 percent by weight of a compound of the formula I ##S

1. A process for producing an image on the surface of an inorganic or organic substrate, which consists essentially of exposing a photosensitive composition of matter, coated on said substrate, which composition of matter contains (a) 0.1 to 20 percent by weight of a compound of the formula I ##STR## in which R 1, R 2, R 3 and R 4 independently of one another are a hydrogen or halogen atom, C 1-20 -alkyl, --OR 7, --N(R 7 ) 2, --SR 7 ', --NO 2, --SO 2 R 7 ', --COR 7, --COOR 7, --CON(R 7 ) 2, C 1-4 -halogenoalkyl, C 1-4 -hydroxyalkyl, --O--C d H 2d --COOH, --O[CH 2 CH(X)O] n --X, ##STR## --OCO--C(X)=CH 2, --CO--O[CH 2 CH(X)O] n --X, ##STR## or N(R 7 )(CO--C(X)=CH 2 ) or R 1 and R 2 and/or R 3 and R 4 together are --CO--OCO-- or --CO--N(R 7 )--CO--, R 5 and R 6 are each hydrogen or together are a direct bond, --CH 2 --, --CH 2 CH 2 --, --CH=CH--, --S--, --O--, --CO-- or --NH--, R 7 is hydrogen, C 1-20 -alkyl, C 1-6 -hydroxyalkyl, allyl, propargyl, --C d H 2d --OCO--C(X)=CH 2, phenyl, alkylphenyl having 1-4 C atoms in the alkyl moiety, benzyl, phenethyl, or cyclohexyl, R 7 ' has the same meaning as R 7, with the exception of hydrogen, n is a number from 1 to 50, d is a number from 1 to 4, X is hydrogen or methyl and Y is --CO-- or --CO--CO--,