초록 ▼

An exposure control apparatus including a diaphragm for controlling the exposure on a focal plane, a light metering element for measuring the light passing through an aperture of the diaphragm, a servo control circuit for controlling the size of the aperture in response to the output of the light me

An exposure control apparatus including a diaphragm for controlling the exposure on a focal plane, a light metering element for measuring the light passing through an aperture of the diaphragm, a servo control circuit for controlling the size of the aperture in response to the output of the light metering element, and a signal forming circuit receptive of the output of the light metering element for producing an output signal to control the amount of light of a flash device.

대표청구항 ▼

An exposure control apparatus comprising: (a) diaphragm means having an aperture and arranged for controlling the amount of an exposure on a focal plane; (b) light metering means for metering light through the aperture of said diaphragm means; (c) control means for servo controlling said aperture by

An exposure control apparatus comprising: (a) diaphragm means having an aperture and arranged for controlling the amount of an exposure on a focal plane; (b) light metering means for metering light through the aperture of said diaphragm means; (c) control means for servo controlling said aperture by an output of said light metering means; (d) signal output means for producing a signal for controlling the amount of light emitted from a flash device; and (e) changeover means for directing an output of said light metering means to either one of said control means and said signal output means.