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Fixed ophthalmic lens polishing pad

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24D-011/00
출원번호 US-0616175 (1984-06-01)
발명자 / 주소
  • Shukla Jayendra G. (Marietta GA) Sohn Ki G. (Penn Yan NY) Twickler Carl (Milford CT) de Pierne Otto S. (E. Norwalk CT)
출원인 / 주소
  • Ferro Corporation (Cleveland OH 02)
인용정보 피인용 횟수 : 56  인용 특허 : 4

초록

A rosette shaped polishing pad includes a tough, flexible substrate, which is coated on one side with a layer of pressure sensitive adhesive for securing the pad to a polishing lap or the like, and on its opposite side with a flexible, water soluble matrix containing polishing particles such as ceri

대표청구항

A pad for polishing optical quality surfaces, including a flexible support, and a flexible layer of polishing material secured to one surface of said support, said layer of polishing material comprising, a flexible matrix secured to said one surface of said support and containing a plurality of poli

이 특허에 인용된 특허 (4)

  1. Hartfelt Jorgen (36 Berkeley Dr. Horsholm MA DKX) Hoehn Ralf (36 Berkeley Dr. Chelmsford MA 01824), Abrasive of a microporous polymer matrix with inorganic particles thereon.
  2. Butzke Hilbert C. (North Hudson WI) Harry Dennis W. (Mahtomedi MN), Fining sheet and method of making and using the same.
  3. Balz Gunther W. (Kalamazoo MI), Finishing machine with abrasive lined chamber and method of finishing.
  4. Kronzer Frank J. (Munising MI), Substrate having a thermoplastic binder coating for use in fabricating abrasive sheets and abrasive sheets manufactured.

이 특허를 인용한 특허 (56)

  1. Pisacane Ferdinand Frederick ; Luo Eric, Abrasive article and method for making the same.
  2. Negus B. Adefris ; Louis R. Carpentier ; Todd J. Christianson ; Brian D. Goers ; Ashu N. Mujumdar ; Gary M. Palmgren ; Soon C. Park, Abrasive article and method of grinding glass.
  3. Mujumdar,Ashutosh N.; Christianson,Todd J.; Schwabel,Mark G., Abrasive article and methods for grinding glass.
  4. Christianson Todd J. ; Nguyen David D. ; Visser Robert G., Abrasive article for providing a clear surface finish on glass.
  5. Christianson Todd J. ; Nguyen David D. ; Visser Robert G. ; Park Soon C., Abrasive article for providing a clear surface finish on glass.
  6. Brain D. Goers ; Scott W. Peterson ; Edward J. Woo, Abrasive article suitable for abrading glass and glass ceramic workpieces.
  7. Goers, Brian D.; Peterson, Scott W.; Woo, Edward J., Abrasive article suitable for abrading glass and glass ceramic workpieces.
  8. Manning, James J.; Sternberg, Mark E.; Wang, Jianna, Abrasive products and methods for fine polishing of ophthalmic lenses.
  9. Manning, James J.; Wang, Jianna; Herbert, Charles G.; Rice, William C.; Seth, Anuj, Abrasive products and methods for finishing coated surfaces.
  10. Manning, James J.; Sternberg, Mark E.; Wang, Jianna, Abrasive products and methods for finishing hard surfaces.
  11. Manning, James J.; Sternberg, Mark E.; Wang, Jianna, Abrasive products and methods for finishing hard surfaces.
  12. Cai, Ying; Manning, James J.; Wang, Jianna, Abrasive products and methods for finishing surfaces.
  13. Umbrell Richard, Buffer centering system.
  14. Zimmer Jerry W., CVD diamond coated substrate for polishing pad conditioning head and method for making same.
  15. Slutz,David E.; Finke,Steven J., CVD diamond-coated composite substrate containing a carbide-forming material and ceramic phases and method for making same.
  16. Umbrell Richard T., Centering system for buffing pad.
  17. Lacy, Michael S.; Boyd, John M., Chemical mechanical planarization belt assembly and method of assembly.
  18. Steven Avanzino ; Bhanwar Singh ; Bharath Rangarajan ; Alvin M. Dangca, Chemical-mechanical polishing of photoresist layer.
  19. Wang, Jianna; Manning, James J.; Goldsmith, Paul S.; Gaeta, Anthony C., Coated abrasive aggregates and products containg same.
  20. Chasman Jonathan N. (Shoreview MN) Hegel Ramon F. (St. Paul MN) Kendall Philip E. (Woodbury MN) Postma Nathan B. (White Bear Lake MN) Spencer Douglas S. (St. Paul MN), Coated abrasive suitable for use as a lapping material.
  21. Callinan Kevin M. (Michigan City IN) Enniss James P. (Granger IN), Conformable abrasive article.
  22. Balmelle, Alain, Consumable polishing element, particularly for finishing optical glass.
  23. Kinisky Thomas G. ; Swei Gwo Shin ; Arvidson ; Jr. Dean B. ; Laconto ; Sr. Ronald W. ; Schlair Rami, Fixed abrasives for optical polishing.
  24. Lombardo, Brian, Foam semiconductor polishing belts and pads.
  25. Lombardo, Brian; Otto, Jeffrey P., Froth and method of producing froth.
  26. Mayton Mark M. (Stanley NY) LoPresti Alan J. (Geneva NY), Gel producing pad and improved method for surfacing and polishing lenses.
  27. Umbrell Richard T., Heat dissipating buffing pad.
  28. Pant Anil K. ; Jairath Rahul ; Mishra Kamal ; Chadda Saket ; Krusell Wilbur C., Integrated pad and belt for chemical mechanical polishing.
  29. Pant, Anil K.; Jairath, Rahul; Mishra, Kamal; Chadda, Saket; Krusell, Wilbur C., Integrated pad and belt for chemical mechanical polishing.
  30. Binderbauer Horst (7431 Baxtershire Dallas TX 75230) Binderbauer Michl (7431 Baxtershire Dallas TX 75230), Liquid dispenser.
  31. Chopra, Dinesh; Meikle, Scott G., Method and apparatus for controlling chemical interactions during planarization of microelectronic substrates.
  32. Boyd, John M.; Lacy, Michael S., Method and apparatus for fixed abrasive substrate preparation and use in a cluster CMP tool.
  33. Boyd, John M.; Lacy, Michael S., Method and apparatus for fixed abrasive substrate preparation and use in a cluster CMP tool.
  34. John M. Boyd ; Michael S. Lacy, Method and apparatus for fixed abrasive substrate preparation and use in a cluster CMP tool.
  35. Pecen, Jiri; Chadda, Saket; Jairath, Rahul; Krusell, Wilbur C., Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing.
  36. Chopra Dinesh, Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic-device substrate assemblies.
  37. Lamphere Craig F. ; Kim Chong Yong ; Kaisaki David A. ; Kranz Heather K. ; Williams Julia P., Method and article for the production of optical quality surfaces on glass.
  38. Lamphere Craig F. ; Kim Chong Yong ; Kaisaki David A. ; Kranz Heather K. ; Williams Julia P., Method and article for the production of optical quality surfaces on glass.
  39. Lamphere Craig F. ; Kim Chong Yong ; Kaisaki David A. ; Kranz Heather K. ; Williams Julia P., Method and article for the production of optical quality surfaces on glass.
  40. Barber ; Jr. Loren L., Method for making an abrasive article and abrasive articles thereof.
  41. Loren L. Barber, Jr., Method for making an abrasive article and abrasive articles thereof.
  42. Christianson Todd J. ; Nguyen David D. ; Visser Robert G., Method for providing a clear surface finish on glass.
  43. Christianson Todd J. ; Visser Robert G. ; Nguyen David D., Method for providing a clear surface finish on glass.
  44. Wedell Eric D. (White Bear Lake MN) Strecker Darlene N. (Oakdale MN), Method for texturing a metallic thin film.
  45. Lindholm Gene O. (River Falls WI) Follensbee Robert A. (Cottage Grove MN), Method for the polishing and finishing of optical lenses.
  46. Laconto ; Sr. Ronald W. ; Schlair Rami, Optical polishing formulation.
  47. Michalec, Ralph J., Pad for grinding or polishing ophthalmic lenses.
  48. Hirabayashi,Hideaki; Saito,Akiko; Sakurai,Naoaki; Oshibe,Yoshihiro; Ishidoya,Masahiro, Polishing cloth, polishing apparatus and method of manufacturing semiconductor devices.
  49. Robert G. Swisher ; Alan E. Wang, Polishing pad.
  50. Reinhardt, Heinz F.; Roberts, John V. H.; McClain, Harry George; Budinger, William D.; Jensen, Elmer William, Polishing pad for a semiconductor device having a dissolvable substance.
  51. Dudovicz, Walter, Polishing silicon wafers.
  52. Dudovicz, Walter, Polishing silicon wafers.
  53. Petersen, John G., Sandpaper with laminated non-slip layer.
  54. Cangshan Xu ; Brian S. Lombardo, Unsupported chemical mechanical polishing belt.
  55. Wright David Q. ; Skrovan John K., Variable abrasive polishing pad for mechanical and chemical-mechanical planarization.
  56. Wright David Q. ; Skrovan John K., Variable abrasive polishing pad for mechanical and chemical-mechanical planarization.
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