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Dry-etching process 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/306
  • B44C-001/22
  • C03C-015/00
  • C23F-001/00
출원번호 US-0657524 (1984-10-04)
우선권정보 JP-0184399 (1983-10-04)
발명자 / 주소
  • Senoue Makoto (Funabashi JPX) Terase Kunihiko (Tokyo JPX) Iida Shinya (Hamura JPX) Komatsu Hideo (Hamura JPX)
출원인 / 주소
  • Asahi Glass Company Ltd. (Tokyo JPX 03) Kokusai Electric Co., Ltd. (Tokyo JPX 03)
인용정보 피인용 횟수 : 36  인용 특허 : 3

초록

A dry-etching process comprising dry-etching treatment of semiconductor material by action of a gas and, if necessary, cleaning treatment, characterized in that at least one of the dry-etching and cleaning treatments is conducted under action of a gas composed essentially of a fluorinated ether.

대표청구항

A dry-etching process comprising a dry-etching treatment of a semiconductor material by action of a gas, characterized in that the dry-etching treatment is conducted under action of a gas composed essentially of a fluorinated ether.

이 특허에 인용된 특허 (3)

  1. Dension Dean R. (Los Gatos CA) Hartsough Larry D. (Berkeley CA), Laser induced dissociative chemical gas phase processing of workpieces.
    상세보기
  2. Iida Shinya (Tama JPX) Ueki Kazuyoshi (Ohme JPX) Mizutani Tatsumi (Kokubunji JPX) Komatsu Hideo (Hinodemachi JPX) Hirobe Kado (Koganei JPX), Method for preventing corrosion of Al and Al alloys.
    상세보기
  3. Vossen ; Jr. John L. (Bridgewater NJ) Halon Bernard (Brooklyn NY), Plasma etching of aluminum.
    상세보기

이 특허를 인용한 특허 (36)

  1. Dyer Timothy Scott, Apparatus and method for removing silicon dioxide residues from CVD reactors.
    상세보기
  2. Nimitz Jonathan S., Blend compositions of trifluoroiodomethane, tetrafluoroethane and difluoroethane.
    상세보기
  3. Eric K. Grieger ; Michael T. Andreas ; Michael A. Walker, Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication.
    상세보기
  4. Grieger Eric K. ; Andreas Michael T. ; Walker Michael A., Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication.
    상세보기
  5. Grieger Eric K. ; Andreas Michael T. ; Walker Michael A., Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication.
    상세보기
  6. LaPlaca Joseph P. (Merrimack NH), Cleaning method for keyboard assemblies.
    상세보기
  7. Ji Ding ; Hidehiro Kojiri JP; Yoshio Ishikawa JP; Keiji Horioka JP; Ruiping Wang ; Robert W. Wu ; Hoiman Hung, Dielectric etch process reducing striations and maintaining critical dimensions.
    상세보기
  8. Sekiya, Akira; Takagaki, Tetsuya; Morikawa, Shinsuke; Yamashita, Shunichi; Takaichi, Tsuyoshi; Hibino, Yasuo; Furutaka, Yasuhisa; Iwasaki, Masami; Ohtsuka, Norifumi, Dry etching gas.
    상세보기
  9. Ueda, Yasuhiko, Dry etching method and method of manufacturing semiconductor device.
    상세보기
  10. Nimitz Jonathan S. (Albuquerque NM) Lankford Lance H. (Newcastle CA), Fluoroiodocarbon blends as CFC and halon replacements.
    상세보기
  11. Nimitz Jonathan Shelley (Albuquerque NM) Lankford Lance Harrell (Newcastle CA), Fluoroiodocarbon blends as CFC and halon replacements.
    상세보기
  12. Nimitz Jonathan Shelley ; Lankford Lance Harrell, Fluoroiodocarbon blends as CFC and halon replacements.
    상세보기
  13. Ni Tuqiang ; Demos Alex, Gas injection system for plasma processing.
    상세보기
  14. Roy, Sudipto Ranendra; Xu, Yi; Chooi, Simon; Aliyu, Yakub; Zhou, Mei Sheng; Sudijono, John Leonard; Ho, Paul Kwok Keung; Gupta, Subhash, Method for cleaning semiconductor structures using hydrocarbon and solvents in a repetitive vapor phase/liquid phase sequence.
    상세보기
  15. Becker David S. ; Blalock Guy T. ; Breiner Lyle D., Method for enhancing oxide to nitride selectivity through the use of independent heat control.
    상세보기
  16. Becker David S. ; Blalock Guy T. ; Roe Fred L., Method for enhancing oxide to nitride selectivity through the use of independent heat control.
    상세보기
  17. Becker,David S.; Blalock,Guy T.; Roe,Fred L., Method for enhancing silicon dioxide to silicon nitride selectivity.
    상세보기
  18. Chandrachood, Madhavi; Kumar, Ajay; Yau, Wai-Fan, Method for etching a molybdenum layer suitable for photomask fabrication.
    상세보기
  19. Barber Jeffrey R. (Pittsburgh PA) Breiten Charles P. (Manassass VA) Stanasolovich David (Manassas VA) Theisen Jacob F. (Manassas VA), Method for making borderless contacts.
    상세보기
  20. Kim Jae-Jeong,KRX, Method for removing etch residue material.
    상세보기
  21. Niino Hiroaki (Nagahama JPX), Method for washing deposition film-forming device.
    상세보기
  22. Becker David S. ; Blalock Guy T. ; Roe Fred L., Method of etching a substrate.
    상세보기
  23. Sang-sup Jeong KR; Tae-hyuk Ahn KR, Method of etching insulating layer in semiconductor device.
    상세보기
  24. Cho,Il Joo; Park,Eun Chul; Hong,Songcheol; Yoon,Euisik, Method of fabricating probe for scanning probe microscope.
    상세보기
  25. Suhr Harald (Tbingen DEX) Feurer Ernst (Tbingen DEX) Oehr Christian (Reusten DEX), Method of producing metallic structures on inorganic non-conductors.
    상세보기
  26. Yen Ming-Shuo,TWX ; Chen Horng-Wen,TWX ; Chen Pei Hung,TWX, Method to reduce contact resistance by means of in-situ ICP.
    상세보기
  27. Cheng Jerry ; Wang Fei, Nitride etch using N.sub.2 /Ar/CHF.sub.3 chemistry.
    상세보기
  28. Ohkuni Mitsuhiro,JPX ; Kugo Shunsuke,JPX ; Sasaki Tomoyuki,JPX ; Tateiwa Kenji,JPX ; Nikoh Hideo,JPX, Pattern formation method.
    상세보기
  29. Misra Ashutosh, Plasma cleaning and etching methods using non-global-warming compounds.
    상세보기
  30. Jianmin Qiao ; Sanjay Thekdi ; Manuj Rathor ; James E. Nulty, Plasma etch chemistry and method of improving etch control.
    상세보기
  31. Koshiishi Akira,JPX, Plasma etching method.
    상세보기
  32. Alwan, James J.; Carpenter, Craig M., Polishing slurry and method for chemical-mechanical polishing.
    상세보기
  33. Ding, Ji; Kojiri, Hidehiro; Ishikawa, Yoshio; Horioka, Keiji; Wang, Ruiping; Wu, Robert W.; Hung, Hoiman (Raymond), Precision dielectric etch using hexafluorobutadiene.
    상세보기
  34. Chan-Lon Yang ; Dan Arnzen ; Jim Nulty, Selective SAC etch process.
    상세보기
  35. Jucha Rhett B. (Celeste TX) Carter Duane E. (Plano TX) Davis Cecil J. (Greenville TX) Crank Sue E. (Coppell TX), Selective etching of tungsten by remote and in situ plasma generation.
    상세보기
  36. Maekawa, Hisayuki, Semiconductor device and a method of manufacturing thereof.
    상세보기

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