초록

This invention relates to apparatus and methods for laser induced vapor deposition upon a substrate. The invention includes apparatus isolated from the deposition chamber for preheating the substrate before deposition. A bellows arrangement permits adjustment of the heat applied to the substrate.

대표청구항 ▼

A system for chemical vapor deposition of a substance on substrates in a vapor deposition chamber without deposition of vapor on the chamber walls, comprising: means for producing substantially coherent light; means for positioning at last one of the substrates in the vapor deposition chamber; means

A system for chemical vapor deposition of a substance on substrates in a vapor deposition chamber without deposition of vapor on the chamber walls, comprising: means for producing substantially coherent light; means for positioning at last one of the substrates in the vapor deposition chamber; means displaced from the deposition chamber for producing heat on the substrate in a substantially uniform and localized relationship to raise the temperature of the substrate to a particular temperature before the deposition of the substance on the substrate for facilitating the deposition of the substance upon the substrate; means for supplying to the deposition chamber donors of a substance to be deposited; means for directing the substantially coherent light from the light means in a direction substantially parallel, and contiguous, to the substrate to obtain an interaction of the donors in response to the substantially coherent light and to obtain a deposition of the substance upon the substrate; and means for providing for an adjustment in the orientation of the substrates relative to the beam of substantially coherent light to optimize the deposition of the substance on the substrates. A process for chemical vapor deposition of a substance on a substrate in a vapor deposition chamber without deposition of the substance on walls of the chamber, comprising the steps of: positioning the substrate adjacent a window in the vapor deposition chamber; directing localized and substantially uniform heat upon the substrate through the window to heat the substrate substantially uniformly to a particular temperature for facilitating the deposition of the substance substantially uniformly on the substrate; supplying donors of the substance to be deposited upon the substrate to obtain an interaction of the donors for the production of the substance in accordance with the energy imparted to the donors; directing a beam of substantially coherent light in a direction substantially parallel, and contiguous, to the substrate to impart energy to the donors for inducing deposition of the substance on the substrate; and adjusting the orientation of the substrate relative to the beam of substantially coherent light moving past the substrate to optimize the deposition of the substance on the substrate.