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A vapor delivery system for the manufacture of an optical preform includes a deposition bubbler (60) and another bubbler (40) referred to as a supply bubbler which is interposed between a reservoir (24) of a liquid and the deposition bubbler. Heat energy is applied to the supply bubbler and to the d

A vapor delivery system for the manufacture of an optical preform includes a deposition bubbler (60) and another bubbler (40) referred to as a supply bubbler which is interposed between a reservoir (24) of a liquid and the deposition bubbler. Heat energy is applied to the supply bubbler and to the deposition bubbler to vaporize liquid therein. A carrier gas is introduced into the liquid in the supply bubbler at a location below the free surface and into the deposition bubbler to cause vapor of the liquid to become entrained in the carrier gas and to flow from the supply bubbler into the deposition bubbler and from the deposition bubbler to a substrate tube from which an optical preform is made. Facilities are provided for maintaining sufficient liquid in the supply bubbler and suitable temperatures of the liquid in the supply and deposition bubblers to control the vapor flow into and out of the deposition bubbler to prevent unintended perturbations in the deposition bubbler. As a result, the concentration level of the vapor which is entrained in the carrier gas and delivered to the substrate tube is maintained at a substantially constant value.

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A method of controlling the delivery of vapor of a liquid to a vapor deposition site, said method including the steps of: providing a deposition bubbler which contains a quantity of the liquid and which is in fluid communication with the deposition site; providing a supply bubbler which contains a q

A method of controlling the delivery of vapor of a liquid to a vapor deposition site, said method including the steps of: providing a deposition bubbler which contains a quantity of the liquid and which is in fluid communication with the deposition site; providing a supply bubbler which contains a quantity of the liquid and which is in fluid communication with the deposition bubbler; heating the liquid in the supply bubbler and in the deposition bubbler to vaporize liquid therein; introducing a gaseous medium into the supply bubbler and then flowing the gaseous medium from the supply bubbler into the deposition bubbler to cause vapor of the liquid to become entrained in the gaseous medium and to flow from the supply bubbler into the deposition bubbler and from the deposition bubbler to the deposition site; and maintaining sufficient liquid within the supply bubbler and suitable temperatures of the liquid in the supply and in the deposition bubblers to control the mass flow rate of vapor into and out of the deposition bubbler to prevent unintended perturbations in the deposition bubbler and cause the concentration level of the delivered vapor which is entrained in the gaseous medium to have a predetermined value.