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Chlorosilanes with an enhanced hydrogen content are selectively produced in the direct reaction of silicon with hydrogen chloride at elevated temperatures by treating the silicon with a source of oxygen during the process. A process is also provided for producing selectively trichlorosilane by react

Chlorosilanes with an enhanced hydrogen content are selectively produced in the direct reaction of silicon with hydrogen chloride at elevated temperatures by treating the silicon with a source of oxygen during the process. A process is also provided for producing selectively trichlorosilane by reacting hydrogen chloride with a fluidized bed of silicon particles and treating the silicon particles with the source of oxygen.

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In the process for producing chlorosilanes of the formula HxSiCl4-x, wherein x is an integer from 0 to 3, by reacting silicon with hydrogen cholride at elevated temperatures, the improvement which comprises (a) treating the silicon with a source of oxygen to initially fluidize the silicon, (b) react

In the process for producing chlorosilanes of the formula HxSiCl4-x, wherein x is an integer from 0 to 3, by reacting silicon with hydrogen cholride at elevated temperatures, the improvement which comprises (a) treating the silicon with a source of oxygen to initially fluidize the silicon, (b) reacting the fluidized silicon with hydrogen chloride until selectivity decreases, and (c) thereafter intermittently fluidize the silicon with a source of oxygen to selectively form chlorosilanes which contain hydrogen.