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Position detecting system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01B-011/00
  • G01B-015/00
출원번호 US-0333295 (1981-12-22)
우선권정보 JP-0024329 (1981-02-23)
발명자 / 주소
  • Ido Satoshi (Tokorozawa JPX) Fujinami Minpei (Iruma JPX) Kato Yasuo (Zama JPX) Sakitani Yoshio (Iruma JPX) Ozasa Susumu (Kashiwa JPX)
출원인 / 주소
  • Nippon Telegraph & Telephone Public Corporation (Tokyo JPX 03) Hitachi, Ltd. (Tokyo JPX 03)
인용정보 피인용 횟수 : 45  인용 특허 : 4

초록

A position detecting system suitable for the position control of the surface of a workpiece mounted in an electron beam exposure system is disclosed which includes an electrically-driven light source, a first optical system for focusing a light beam from the light source on a workpiece, a position-c

대표청구항

A system for detecting a height position of a workpiece suitable for use in an electron beam exposure apparatus which includes an electron beam source for forming an electron beam having a depth of focus in an evacuatable chamber and a movable table for supporting said workpiece to irradiate said wo

이 특허에 인용된 특허 (4)

  1. Mossey Paul W. (Greenhills OH), Apparatus and method for optical clearance determination.
  2. Dreyfus Marc G. (4 Arnold St. Old Greenwich CT 06870) Pellman Arnold (30 Colony Ct. Stamford CT 06905), Electro-optical triangulation rangefinder for contour measurement.
  3. Sato Masatoshi (Yokohama JPX), Flatness measuring apparatus.
  4. Waters James P. (Ellington CT) Thornton Robert K. (Coventry CT), Noncontact optical gauging system.

이 특허를 인용한 특허 (45)

  1. Jann Peter C. ; Li Wayne W. ; Iosilevsky Igor ; Womack Kenneth H. ; Cejna Vlastimil ; Burt ; Jr. George A., Apparatus and method for surface inspection by specular interferometric and diffuse light detection.
  2. Kobayashi Masaki (Yamanashi JPX) Ohta Minemasa (Yamanashi JPX), Device for measuring angular deviation of flat plate.
  3. Hariyama, Tatsuo; Sasazawa, Hideaki; Yoshida, Minoru; Serikawa, Shigeru, Disk surface inspection apparatus, inspection system thereof, and inspection method thereof.
  4. Hibbard Earl Roger ; Cashin James A., Focusing mirror control system and method for adjusting same.
  5. Tokura Nobufumi (Fukuoka JPX), Height measurement apparatus using laser light beam.
  6. Hayashi,Yoichi; Tada,Nobuyuki, Inspection device of winding appearance of tape and improvement processing method for the same.
  7. De Laat, Wilhelmus Johannes Maria; Gui, Cheng-Qun; Giesen, Peter Theodorus Maria; Van Der Heijden, Marcus Theodoor Wilhelmus; Meinders, Erwin Rinaldo; Péter, Mária, Lithographic apparatus and method.
  8. Abraham Michael,DEX ; Depner Oliver,DEX ; Eberhardt Matthias,DEX, Method and device for automatic relative adjustment of samples in relation to an ellipsometer.
  9. Takahashi Fumiyuki,JPX ; Tsukahara Hiroyuki,JPX ; Oshima Yoshitaka,JPX ; Nishiyama Youji,JPX ; Fuse Takashi,JPX, Method for inspecting height, and a height inspection apparatus to carry out the method.
  10. Liphardt, Martin M., Method of evaluating data quality.
  11. Berger Gerald,DEX ; Oulabi Jorg,DEX, Method of optically measuring the surface of yarn packages.
  12. Dumoulin, Charles Leopold Elisabeth, Multi PSD-arrangement and circuitry.
  13. Laczik, Zsolt John, Non-contact topographical analysis apparatus and method thereof.
  14. Lu Huizong, Optical apparatus for determining the height and tilt of a sample surface.
  15. van der Werf Jan E. (Eindhoven NLX) Biesterbos Johannes W. M. (Eindhoven NLX), Optical imaging arrangement comprising an opto-electronic focussing-error detection system.
  16. Podoleanu, Adrian Gh.; Jackson, David A.; Rogers, John A.; Dobre, George M.; Cucu, Radu G., Optical mapping apparatus with adjustable depth resolution and multiple functionality.
  17. Koyagi Yasuyuki (Tenjinkitamachi JPX), Optical position detecting method and apparatus therefor.
  18. Mizuno, Seiichiro; Kurahashi, Akira; Adachi, Izumi, Optical position detection device and distance measurement device.
  19. Leslie Brian C. ; Nikoonahad Mehrdad ; Wells Keith B., Optical scanning system for surface inspection.
  20. Leslie, Brian C.; Nikoonahad, Mehrdad; Wells, Keith B., Optical scanning system for surface inspection.
  21. Leslie,Brian C.; Nikoonahad,Mehrdad; Wells,Keith B., Optical scanning system for surface inspection.
  22. Leslie,Brian C.; Nikoonahad,Mehrdad; Wells,Keith B., Optical scanning system for surface inspection.
  23. Dong Haozhe, Optical triangulation distance sensing system and method using a position sensitive detector and an automatic power co.
  24. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
  25. Ogawa Kimiaki (Tokyo JPX), Range finder.
  26. Shinno, Kazuhisa; Ogawa, Fumio, Reflection type optical sensor and method for detecting surface roughness.
  27. Mehdi Vaez-Iravani ; Stanley Stokowski ; Guoheng Zhao, Sample inspection system.
  28. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  29. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  30. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  31. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  32. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  33. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  34. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  35. Nikoonahad, Mehrdad; Stokowski, Stanley E., Scanning system for inspecting anamolies on surfaces.
  36. Nikoonahad Mehrdad ; Stokowski Stanley E., Scanning system for inspecting anomalies on surfaces.
  37. Nikoonahad Mehrdad ; Stokowski Stanley E., Scanning system for inspecting anomalies on surfaces.
  38. Nikoonahad,Mehrdad; Stokowski,Stanley E., Scanning system for inspecting anomalies on surfaces.
  39. Sekiya,Takeshi; Sato,Chikara, Sheet feeding apparatus.
  40. Jordan ; III John R. ; Nikoonahad Mehrdad ; Wells Keith B., Surface inspection system.
  41. Nikoonahad Mehrdad ; Wayman Charles E., Surface inspection system with misregistration error correction and adaptive illumination.
  42. Liphardt, Martin H.; Johs, Blaine D., System and method of aligning a sample.
  43. Liphardt, Martin M.; Johs, Blaine D., System and method of aligning a sample.
  44. Biellak,Steve; Stokowski,Stanley E.; Vaez Iravani,Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
  45. Nikoonahad Mehrdad (Menlo Park CA) Tebelskis James A. (San Jose CA), Wafer alignment sensor.
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