초록

This invention is a composition suitable for stripping cross-linked photoresist polymer which comprises (a) a lower alkyl monoether of a propylene glycol, or a mixture of lower alkyl monoethers of propylene glycol; (b) a C2-6 alkanol; (c) an alkanolamine; and (d) a base.

대표청구항 ▼

A composiion suitable for stripping cross-linked photoresist polymer which comprises (a) between about 40 and 75 percent by weight of a lower alkyl monoether of a propylene glycol, or a mixture of lower alkyl monethers of propylene glycol; (b) between about 10 and 30 percent by weight of a C2-6 alka

A composiion suitable for stripping cross-linked photoresist polymer which comprises (a) between about 40 and 75 percent by weight of a lower alkyl monoether of a propylene glycol, or a mixture of lower alkyl monethers of propylene glycol; (b) between about 10 and 30 percent by weight of a C2-6 alkanol; (c) between about 4 and 28 percent by weight of an alkanolamine; and (d) between about 1 and 14 percent by weight of a base wherein the base is an alkali metal hydroxide, alkaline earth metal hydroxide, ammonium hydroxide, alkali metal carbonate, alkaline earth metal carbonate or ammonium carbonate. A method of stripping corss-linked photoresist polymer from a substrate which comprises contacting a substrate upon which a cross-linked photoresist polymer is adhered with a stripper composition comprising (a) between about 40 and 75 percent by weight of a lower alkyl monoether of a propylene glycol, or a mixture of lower alkyl monoethers of propylene glycol; (b) between about 10 and 30 percent by weight of a C2-6 alkanol; (c) between about 4 and 28 percent by weight of an alkanolamine; and (d) between about 1 and 14 percent by weight of a base wherein the base is an alkali metal hydroxide, alkaline earth metal hydroxide, ammonium hydroxide, alkali metal carbonate, alkaline earth metal carbonate or ammonium carbonate; wherein the stripper composition has a pH of 9 or greater, at a temperature at which the stripper composition is a single phase, for a time sufficient to strip the cross-linked photoresist polymer from the substrate, under conditions such that the cross-linked photoresist polymer is stripped from the substrate.