초록 ▼

Demetallizing method and apparatus capable of high speed continuous production of selectively patterned metallized film, particularly polymeric film, useful in packaging products are disclosed. A water-based varnish having etchant dissolved therein is printed on the metallized surface in a desired p

Demetallizing method and apparatus capable of high speed continuous production of selectively patterned metallized film, particularly polymeric film, useful in packaging products are disclosed. A water-based varnish having etchant dissolved therein is printed on the metallized surface in a desired pattern, the spent etchant solution is washed from the etched surface while the other surface is maintained out of contact with the wash water, and the etched web is dried.

대표청구항 ▼

A method of forming a pattern on a metallized film, which comprises: printing onto the metallized surface of the film a pattern of a water-based varnish having an etchant dissolved therein, permitting said pattern to remain in contact with the metallized surface for a period of time sufficient to et

A method of forming a pattern on a metallized film, which comprises: printing onto the metallized surface of the film a pattern of a water-based varnish having an etchant dissolved therein, permitting said pattern to remain in contact with the metallized surface for a period of time sufficient to etch said pattern into the metallized surface, washing spent etchant from said film, and drying the resulting washed film.