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Measurement of electrical signals with subpicosecond resolution 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01R-023/16
출원번호 US-0593993 (1984-03-27)
발명자 / 주소
  • Mourou Gerard (Rochester NY) Valdmanis Janis A. (Westfield NJ)
출원인 / 주소
  • The University of Rochester (Rochester NY 02)
인용정보 피인용 횟수 : 59  인용 특허 : 3

초록

Electrical signals are measured (analyzed and displayed) with subpicosecond resolution by electro-optic sampling of the signal in an electro-optic crystal, the index of which changes in response to the electric field produced by the signal, in accordance with the Pockels effect. The crystal is dispo

대표청구항

The method of measuring an electrical signal on a line in a micro-circuit with subpicosecond resolution which comprises the steps of propagating said signal along a line on a substrate of said micro-circuit which creates an electric fringe field adjacent thereto, placing an electro-optic crystal of

이 특허에 인용된 특허 (3)

  1. Valdmanis Janis A. (Columbus IN) Mourou Gerard (Rochester NY), Measurement of electrical signals with picosecond resolution.
  2. Baues Peter (Krailling DE) Mahlein Hans (Munich DE) Moeckel Peter (Munich DE) Reichelt Achim (Munich DE) Winzer Gerhard (Munich DE), Movable probe carrying optical waveguides with electro-optic or magneto-optic material for measuring electric or magneti.
  3. Chen Bor-Uei (Northridge CA), RF Spectrum analyzer.

이 특허를 인용한 특허 (59)

  1. Slkner Gerald (Ottobrunn DEX), Apparatus and method for optical measuring and imaging of electrical potentials.
  2. Rao Valluri Ramana M., Apparatus for performing quantitative measurement of DC and AC current flow in integrated circuit interconnects by meas.
  3. William K. Lo, Beam delivery and imaging for optical probing of a device operating under electrical test.
  4. Hartemann Frederick (Paris MA FRX) Bekefi George (Brookline MA), Cerenkov electrooptic shutter.
  5. Takahashi Hironori (Hamamatsu JPX) Aoshima Shinichiro (Hamamatsu JPX) Hirano Isuke (Hamamatsu JPX), Electro-optic apparatus for measuring an electric field of a sample.
  6. Yanagisawa, Yoshiki; Takeuchi, Nobuaki; Kikuchi, Jun; Endou, Yoshio; Shinagawa, Mitsuru; Nagatsuma, Tadao; Matsuhiro, Kazuyoshi, Electro-optic apparatus for measuring signal potentials.
  7. Valdmanis Janis A. (Westfield NJ), Electro-optic measurements of voltage waveforms on electrical conductors.
  8. Williamson Steven (Ann Arbor MI), Electro-optic signal measurement.
  9. Williamson Steven (Ann Arbor MI), Electro-optic signal measurement.
  10. Williamson Steven L. (Henrietta NY), Electro-optic signal measurement.
  11. Takahashi Hironori (Shizuoka JPX) Aoshima Shinichiro (Shizuoka JPX) Tsuchiya Yutaka (Shizuoka JPX), Electro-optic voltage detector having a transparent electrode.
  12. Takahashi Hironori (Hamamatsu JPX) Tsuchiya Yutaka (Hamamatsu JPX) Kamiya Takeshi (Suginami-ku JPX), Electro-optic voltage measurement apparatus.
  13. Xi-Cheng Zhang ; Zhiping Jiang CA, Electro-optic/magneto-optic measurement of electromagnetic radiation using chirped optical pulse.
  14. Zhang Xi-Cheng ; Riordan Jenifer Ann ; Sun Feng-Guo, Electro-optical and magneto-optical sensing apparatus and method for characterizing free-space electromagnetic radiation.
  15. Popek Marc H. (Indian Harbour Beach FL), Electro-optical phase modulator.
  16. Akishige Ito JP; Katsushi Ohta JP; Toshiyuki Yagi JP; Mitsuru Shinagawa JP; Tadao Nagatsuma JP; Junzo Yamada JP, Electro-optical probe for oscilloscope measuring signal waveform.
  17. Zhang Xi-Cheng ; Libelo Louis Francis ; Wu Qi, Electro-optical sensing apparatus and method for characterizing free-space electromagnetic radiation.
  18. Nakamura Takuya (Shizuoka JPX) Aoshima Shinichiro (Shizuoka JPX) Tsuchiya Yutaka (Shizuoka JPX), Electro-optical voltage detector.
  19. Knox Wayne H. (Rumson NJ) Miller David A. B. (Fair Haven NJ), Electrooptic apparatus for the measurement of ultrashort electrical signals.
  20. Loualiche Slimane (Lannion FRX) Salin Francois (Paris FRX), Electrooptic measurement systems for frequency analysis of very wide range signals.
  21. Pfaff, Paul L., Holographic condition assessment system for a structure including a semiconductor material.
  22. Jaeger Nicolas A. F. (Richmond CAX), Integrated optics Pockels cell voltage sensor.
  23. Meyrueix Paul (Paris FRX) Tremblay Gerard (Loudin CA FRX) Vernhes Jean P. (San Jose CA), Method and apparatus for electro-optically testing circuits.
  24. Beha Johannes G. (Waedenswil DEX) Blacha Armin U. (Rueschlikon DEX) Clauberg Rolf (Gattikon DEX) Seitz Hugo K. (Wollerau DEX), Method for contactless testing of conducting paths in a substrate using photo-assisted tunneling.
  25. Beha Johannes G. (Waedenswil CHX) Blacha Armin U. (Rueschlikon CHX) Clauberg Rolf (Gattikon CHX) Seitz Hugo K. (Wollerau CHX), Method for contactless testing of conducting paths in a substrate using photon-assisted tunneling.
  26. Burgess David L. ; Trapp Orlin D., Method for detecting failures in electric circuits and tester, liquid crystal for use therewith.
  27. Pfaff, Paul L., Method for optically testing semiconductor devices.
  28. Pfaff,Paul, Method for optically testing semiconductor devices.
  29. Rao Valluri Ramana M., Method for performing quantitative measurement of DC and AC current flow in integrated circuit interconnects by the measurement of magnetic fields with a magneto optic laser probe.
  30. Pfaff, Paul; Russell, Kevin L., Method for testing a device under test including the interference of two beams.
  31. Zhang, Xi-Cheng; Jiang, Zhiping, Method of characterizing free-space radiation using a chirped optical pulse.
  32. Pfaff, Paul L., Methods and processes for optical interferometric or holographic test in the development, evaluation, and manufacture of semiconductor and free-metal devices utilizing anisotropic and isotropic materials.
  33. Pfaff, Paul L., Methods for obtaining and analyzing digital interferometric data for computer testing and developing semiconductor and anisotropic devices and materials.
  34. Pfaff, Paul L., Methods for optically enhanced holographic interferometric testing for test and evaluation of semiconductor devices and materials.
  35. Pfaff, Paul L., Multiple beam transmission interferometric testing methods for the development and evaluation of subwavelength sized features within semiconductor and anisotropic devices.
  36. Pfaff, Paul L., Multiple optical wavelength interferometric testing methods for the development and evaluation of subwavelength sized features within semiconductor devices and materials, wafers, and monitoring all phases of development and manufacture.
  37. Pfaff,Paul; Mauck,Michael, Non-destructive testing system using a laser beam.
  38. Mukohzaka Naohisa (Shizuoka JPX), Optical associative memory employing an autocorrelation matrix.
  39. Pfaff, Paul L., Optical to optical methods enhancing the sensitivity and resolution of ultraviolet, electron beam and ion beam devices.
  40. Pfaff, Paul L., Optically enhanced holographic interferometric testing methods for the development and evaluation of semiconductor devices, materials, wafers, and for monitoring all phases of development and manufacture.
  41. Ishikawa Masatoshi (Ibaraki JPX) Mukohzaka Naohisa (Shizouka JPX), Opto-electric hybrid associative memory.
  42. Mourou Gerard A. ; Son Joo-Hiuk ; Kim Joungho,KRX, Photoconductive element and method for measuring high frequency signals.
  43. Bennion Ian (Northampton GB2) Whatmore Roger W. (Buckenhamshire GB2) Stewart William J. (Northants GB2), Spatial light modulator.
  44. Williamson Steven (Ann Arbor MI), System for electrical signal sampling with ultrashort optical pulses.
  45. Elsayed-Ali Hani E. (Rochester NY), System for surface temperature measurement with picosecond time resolution.
  46. Takahashi Hironori (Shizuoka JPX) Aoshima Shinichiro (Shizuoka JPX) Nakamura Takuya (Shizuoka JPX) Tsuchiya Yutaka (Shizuoka JPX), Voltage detecting device.
  47. Takahashi, Hironori; Aoshima, Shinichiro; Tsuchiya, Yutaka, Voltage detecting device.
  48. Aoshima Shinichiro (Hamamatsu JPX) Tsuchiya Yutaka (Hamamatsu JPX), Voltage detector.
  49. Aoshima Shinichiro (Shizuoka JPX) Tsuchiya Yutaka (Shizuoka JPX), Voltage detector employing electro-optic material having a corner-cube shape.
  50. Takahashi Hironori (Shizuoka JPX) Tsuchiya Yutaka (Shizuoka JPX) Aoshima Shinichiro (Shizuoka JPX), Voltage detector for detecting a voltage developing in a selected area of an object.
  51. Aoshima Shinichiro (Shizuoka JPX) Tsuchiya Yutaka (Shizuoka JPX) Takahashi Hironori (Shizuoka JPX), Voltage detector having compensation for polarization change caused by spontaneous birefringence.
  52. Aoshima Shinichiro (Shizuoka JPX) Tsuchiya Yutaka (Shizuoka JPX) Nakamura Takuya (Shizuoka JPX), Voltage detector using electro-optic material and interference of light beams.
  53. Takahashi Hironori (Shizuoka JPX) Aoshima Shinichiro (Shizuoka JPX) Ooi Yoshiharu (Shizuoka JPX) Takahashi Mutsuji (Shizuoka JPX) Tsuchiya Yutaka (Shizuoka JPX), Voltage detector using electro-optic material having anti-reflective coatings.
  54. Aoshima Shinichiro (Shizuoka JPX) Tsuchiya Yutaka (Shizuoka JPX), Voltage detector utilizing an optical probe of electro-optic material.
  55. Henley Francois J. (Los Gatos CA), Voltage imaging system using electro-optics.
  56. Takahashi Hironori (Shizuoka JPX) Aoshima Shinichiro (Shizuoka JPX) Tsuchiya Yutaka (Shizuoka JPX), Voltage mapping device having fast time resolution.
  57. Takahashi Hironori (Hamamatsu JPX) Koishi Musubu (Hamamatsu JPX) Takeshima Akira (Hamamatsu JPX), Voltage measurement system.
  58. Takahashi Hironori (Shizuoka JPX) Aoshima Shinichiro (Shizuoka JPX) Tsuchiya Yutaka (Shizuoka JPX), Voltage measuring apparatus.
  59. Pfaff,Paul; Russell,Kevin L., Voltage testing and measurement.
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