초록 ▼

A method of manufacturing a semiconductor device is disclosed. In the manufacturing method, an impurity diffusion layer as a first interconnection layer is formed on a semiconductor substrate. Then, an aluminum layer as a second interconnection layer is formed on the semiconductor substrate with an

A method of manufacturing a semiconductor device is disclosed. In the manufacturing method, an impurity diffusion layer as a first interconnection layer is formed on a semiconductor substrate. Then, an aluminum layer as a second interconnection layer is formed on the semiconductor substrate with an insulating film interposing therebetween. Another insulating layer is further formed on the aluminum layer. An anisotropic etching process is applied to the insulating layer, the second interconnection layer, and the insulating film, thereby forming a contact extending up to the first interconnection layer through these layers, and the insulating film. After the formation of the contact hole, an aluminum layer is formed on the entire surface of the insulating film including the inner surface of the contact hole. The aluminum layer formed in the contact hole electrically interconnects the first and second interconnecting layers.

대표청구항 ▼

A method for connecting first and second interconnection layers of an integrated circuit device comprising the steps of: forming said first interconnection layer of a predetermined pattern, forming a first insulation film on said first interconnection layer, forming said second interconnection layer

A method for connecting first and second interconnection layers of an integrated circuit device comprising the steps of: forming said first interconnection layer of a predetermined pattern, forming a first insulation film on said first interconnection layer, forming said second interconnection layer of a predetermined pattern on said first insulation film, forming a second insulation film on said second interconnection layer, forming a photoresist layer as a mask on said second insulation film, with a contact opening, forming a contact hole of uniform diameter in one continuous step extending through said second insulation film, said second interconnection layer, and said first insulation film, removing said photoresist layer, and forming a conductive layer of a predetermined pattern extending into said contact hole and connecting said first and second interconnection layers together.