초록 ▼

Apparatus is described for exposing a layer of photosensitive material to form an image thereon, by passing the photosensitive layer under a row of closely spaced light shutter apertures which are selectively opened and closed. The total light falling on each pixel area at the photosensitive layer i

Apparatus is described for exposing a layer of photosensitive material to form an image thereon, by passing the photosensitive layer under a row of closely spaced light shutter apertures which are selectively opened and closed. The total light falling on each pixel area at the photosensitive layer is increased by using apertures which are long and thin, and concentrating the light passing therethrough onto a pixel at the photosensitive layer. Two rows of staggered apertures are used. The photosensitive layer is on a transparent substrate, and a reflector lies on a side of the substrate opposite the light apertures, so light passing through the photosensitive layer and substrate is reflected back through the layer to pass twice therethrough. The entire sheet is pre-exposed to light of a level less than a threshold, with the light subsequently passing through each light aperture being sufficient to raise the total exposure beyond the threshold.

대표청구항 ▼

Apparatus for selectively exposing each of a multiplicity of subminiature areas of a photosensitive layer of photosensitive material, to light, comprising: means defining an exposure station for positioning a photosensitive layer to be exposed; means for moving the photosensitive layer in a predeter

Apparatus for selectively exposing each of a multiplicity of subminiature areas of a photosensitive layer of photosensitive material, to light, comprising: means defining an exposure station for positioning a photosensitive layer to be exposed; means for moving the photosensitive layer in a predetermined direction past said exposure station; a row of independently operable light shutters, each shutter including a shutter area and being independently operable to an open state to pass light through a corresponding shutter area, and to a closed state to substantially block the passage of light through the shutter area; means for directing light at the locations of said shutter areas, and for focusing light that passes through the shutter area of each open shutter onto a different pixel of a row of pixels that lie at the position of a photosensitive layer at the exposure station, said row of pixels extending largely perpendicular to the direction of movement of said layer past said exposure station; each shutter area having a length which is a plurality of time greater than its average width, and said focusing means focuses light passing through each shutter area onto a corresponding one of said pixels, said corresponding one having a length parallel to the direction of movement of the layer which is less than the length of said each shutter area.