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Contacts for conductivity-type sensors 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01R-031/26
출원번호 US-0725160 (1985-04-22)
발명자 / 주소
  • Mallory Roy (Bedford MA)
출원인 / 주소
  • ADE Corporation (Newton MA 02)
인용정보 피인용 횟수 : 10  인용 특허 : 57

초록

A conductivity-type sensor, typically for use in a wafer sorting system, for detecting the conductivity-type of semiconductor wafers. In measuring conductivity, a two-contact probe is applied to the semiconductor wafer and any static charge which may have been accumulated on the wafer is initially d

대표청구항

A semiconductor wafer conductivity-type detector system comprising: contacts for providing electrical and mechanical contact with a wafer and including an axially extending sharp tip portion adapted to provide such contact; means for selectively applying said contacts to a location on a semiconducto

이 특허에 인용된 특허 (57)

  1. Kren George J. (Los Altos CA) Koenig Franklin R. (Palo Alto CA), Acoustic method and apparatus for measuring micron and submicron distances.
  2. Wheeler William R. (Saratoga CA) Kren George J. (Los Altos CA), Acoustic method and apparatus for measuring surfaces of wafers and similar articles.
  3. Daebler Donald H. (Albuquerque NM) Morgan John H. (Albuquerque NM), Apparatus and method for sorting substrates.
  4. Kawase Katsuyuki (Tokyo JA) Sato Mutumi (Tokyo JA) Hamada Kuniaki (Tokyo JA) Hayashi Seiji (Tokyo JA), Apparatus for carrying out bonding at programmed positions of a circuit element and at corrected positions of leads ther.
  5. Yamamoto ; Masao ; Iwanaga ; Sumio, Apparatus for detecting flaws in circular tablet.
  6. Shum Lanson Y. (Greensburg PA) Brecker James N. (Mt. Lebanon PA), Apparatus for gauging the shape of a conducting surface.
  7. Fromson ; Robert E. ; Brecker ; James N. ; Shum ; Lanson Y., Apparatus for gauging the texture of a conducting surface.
  8. Diepeveen John C. (1737 Kimberly Drive Sunnyvale CA 94087), Apparatus for incremental movement of die frame.
  9. Nakazawa ; Kiwao ; Tanimoto ; Akikazu, Apparatus for measuring the line width of a pattern.
  10. Bonora Anthony C. (Atherton CA), Apparatus for polishing semiconductor wafers.
  11. Bjork Svante T. (Kungsbacka SEX), Apparatus for sorting and/or handling disc-like members.
  12. Rhotert Bernhard (Laggenbeck DE), Apparatus for sorting objects.
  13. Fergason Lewis A. (O\Fallon MO) Turnbull David R. (Edmundson MO), Apparatus for wafer probing having surface level sensing.
  14. Hatakenaka Tatsuo (Yokohama JPX) Tamaki Kiyouhei (Tama JPX) Nanbu Tetsuo (Tokyo JPX), Arrangement for automatically fabricating and bonding semiconductor devices.
  15. Shum ; Lanson Y., Calibrating and measuring circuit for a capacitive probe-type instrument.
  16. Tressler Richard E. (Julian PA) Stach Joseph (State College PA) Baeten Roger L. (State College PA), Cantilevered boat-free semiconductor wafer handling system.
  17. Lecklider Thomas H. (Bishop\s Stortford OH GB2) Bowers John J. (Medina OH), Capacitive gauging system utilizing a low internal capacitance, high impedance amplifier means.
  18. Bodlaj ; Viktor, Contact-free thickness measuring method and device.
  19. Fiegl George (Palo Alto CA) Torbet Walter (Newark CA), Continuous replenishment of molten semiconductor in a Czochralski-process, single-crystal-growing furnace.
  20. Tam Johann (Santa Clara CA), Conveyor system.
  21. Szedon John R. (McKeesport PA), Corona charging for testing reliability of insulator-covered semiconductor devices.
  22. Walton Hyman (Beckermet GB2), Detecting the size and shape of bodies.
  23. Morris Adrian P. (London GB2), Displacement transducer system.
  24. Preikschat Fritz K. (16020 Lake Hills Blvd. Bellevue WA 98008), Electrical impedance measuring apparatus for providing separate measurements of the conductivity and dielectric coeffici.
  25. Cook ; Alan J. ; Brooks ; Norman ; Kirkby ; Anthony D., Finger jointing machine.
  26. Urbanek Karel (Atherton CA) Kren George J. (Los Altos CA) Wheeler William R. (Saratoga CA), Gauge for measuring distance to planar surfaces and thicknesses of planar members.
  27. Frisbie ; Milo W. ; Swapp ; Mavin C., High-speed integrated circuit handler.
  28. Mangal Norman F. (Palo Alto CA) Swidler Ronald (Palo Alto CA), Imaging surface discharge and cleaning apparatus for electrophotographic copier.
  29. Calvert James W. (Cincinnati OH) Shinkle Charles P. (Bethel OH), Indexing drive control.
  30. Robillard David R. (Westboro MA) Michaels Robert L. (Marlboro MA), Integrated test and assembly device.
  31. Ahlquist ; Gary W. ; Milley ; Michael K., Length measurement apparatus for continuously advancing articles.
  32. Mushinsky ; Albert J., Measurement system.
  33. Hoshino Yoshikazu (Kusatsu JPX) Shuto Masayoshi (Suita JPX), Method and apparatus for discriminatively determining electrical constants.
  34. Tam Johann (Santa Clara CA), Method and apparatus for drying wafers.
  35. Lile Derek L. (San Diego CA) Davis Neil M. (San Diego CA), Method and apparatus for semiconductor profiling using an optical probe.
  36. Denton David Alan (Runcorn EN) Entwisle John Hubert (Runcorn EN) Humphrey Dennis (Runcorn EN), Method and apparatus for testing anode flatness by capacitance measurement.
  37. Miller Gabriel L. (Westfield NJ), Method and apparatus for the contactless monitoring carrier lifetime in semiconductor materials.
  38. Terasawa Yoshio (Hitachi JA), Method of and device for measuring life time of carriers of semiconductor.
  39. Yamamoto Masatoshi (Higashimurayama JPX) Makino Keisuke (Funabashi JPX) Suzukawa Kiyomi (Zushi JPX) Nakamura Souichirou (Takasaki JPX) Sakai Kiyomi (Sawa JPX), Method of producing semiconductor devices.
  40. Wheeler ; William R. ; Kren ; George J. ; Urbanek ; Karel, Metrology instrument for measuring vertical profiles of integrated circuits.
  41. Ogasawara Hiroomi (3821-4 Yamakita ; Yamakitamachi ; Ashigarakami-gun ; Kanagawa-ken JPX) Ogasawara Masaomi (3833 Yamakita ; Yamakitamachi ; Ashigarakami-gun ; Kanagawa-ken JPX), Minute change detecting system.
  42. Sosniak Jacob (Millburn NJ) Unger Burton A. (Berkeley Heights NJ), Moisture level determination in sealed packages.
  43. Faure Louis Henry (Poughkeepsie NY) Johnston ; Jr. Howard Thomas (Poughkeepsie NY) Townsend Dana Roberts (Fishkill NY), Multiple site, differential displacement, surface contacting assembly.
  44. Urbanek Karel (Atherton CA) Kren George J. (Los Altos CA) Wheeler William R. (Saratoga CA), Non-contacting resistivity instrument with structurally related conductance and distance measuring transducers.
  45. Miller Gabriel L. (Westfield NJ) Robinson David A. H. (Summit NJ), Noncontacting measurement of hall effect in a wafer.
  46. Nihonmatsu Takashi (Nagano JPX), Optoelectric multi-sensor measuring apparatus and a method for measuring surface flatness therewith.
  47. Pelletier Claude (Annecy FR) Velte Roger (Annecy-le-Vieux FR), Physical displacement sensing with differential capacitor.
  48. Kren George J. (Los Altos CA) Urbanek Karel (Atherton CA) Wheeler William R. (Saratoga CA), Probe for determining p or n-type conductivity of semiconductor material.
  49. Michel Thomas J. (Miami FL), Protective transfer assembly for semiconductor devices.
  50. Bonora Anthony C. (Atherton CA) Lorenz Karl (Redwood City CA), Semiconductor wafer polishing machine and wafer carrier therefor.
  51. Faure Louis H. (Poughkeepsie NY) Hodge Philo B. (Roxbury CT), Sensing probe for determining location of conductive features.
  52. Yazaki Susumu (Hachioji JPX) Matsumura Takeshi (Kodaira JPX), Thickness measuring apparatus for non-metallic sheet-shaped bodies.
  53. Brooks Norman B. (391 East St. Carlisle MA 01741) Brooks Frank P. (5 Inverness Rd. Winchester MA 01890), Transport apparatus.
  54. Tam Johann (Saratoga CA), Two motor drive for a wafer processing machine.
  55. Brooks Norman B. (Carlisle MA) Olmstead Michael M. (Bedford MA), Wafer transport system.
  56. Brooks Norman B. (Carlisle MA) Olmstead Michael M. (Bedford MA), Wafer transport system.
  57. Grone Robert J. (Covington KY), Workpiece detection circuit.

이 특허를 인용한 특허 (10)

  1. Poduje Noel S. (Needham Heights MA) Mallory Roy S. (Bedford MA), A.C. capacitive gauging system.
  2. Sagues Paul ; Peurach John T. ; Aggarwal Sanjay D., Automatic calibration system for wafer transfer robot.
  3. Lui Philip Y. F. (35 W. 64th St. New York NY 10023), Computerized music notation system.
  4. Palleiko Benjamin (Stoughton MA), Fixture and nonrepeatable error compensation system.
  5. Eugene Michael McCarron ; Patricia A. Morris, Infrared thermographic screening technique for semiconductor-based chemical sensors.
  6. Inaba Hitoshi (Atsugi JPX) Ohmi Tadahiro (1-17-30 ; Komegakubo 2-chome ; Aoba-ku Sendai-shi ; Miyagi-ken 980 JPX), Neutralizing apparatus for charged body.
  7. Poduje Noel S. (Needham Heights MA) Mallory Roy E. (Bedford MA), Prealigner probe.
  8. Wang, Mill-Jer; Peng, Ching-Nen; Lin, Hung-Chih; Chen, Hao, Three dimensional integrated circuit electrostatic discharge protection and prevention test interface.
  9. Wang, Mill-Jer; Peng, Ching-Nen; Lin, Hung-Chih; Chen, Hao, Three dimensional integrated circuit electrostatic discharge protection and prevention test interface.
  10. Sagues Paul ; Gaudio Stephen A. ; Wong Tim K., Wafer aligner system.
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