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Method of making an electric field device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B32B-018/00
  • B32B-031/20
출원번호 US-0697063 (1985-01-31)
우선권정보 JP-0155618 (1982-09-07)
발명자 / 주소
  • Masuda Senichi (Tokyo JPX) Fukuura Isamu (Nagoya JPX)
출원인 / 주소
  • NGK Spark Plug Co., Ltd. (JPX 03)
인용정보 피인용 횟수 : 40  인용 특허 : 3

초록

An electric field device is obtained by the steps of employing a highly pure and mechanically electrically chemically and thermally extremely durable ceramic material, such as a high purity alumina porcelain, as a dielectric material, disposing electrodes on the shaped material before sintering by a

대표청구항

A method of making a high voltage electric field device used for the formation of a corona discharge comprising: providing a first raw sheet of a fine high purity alumina ceramic dielectric material, the first sheet including opposite upper and lower surfaces; printing a linear electrode on the uppe

이 특허에 인용된 특허 (3)

  1. Fujita Tsuyoshi (Yokohama JPX) Taguchi Noriyuki (Yokohama JPX) Toda Gyozo (Hino JPX) Kuroki Takashi (Yokohama JPX) Ishihara Shoosaku (Yokohama JPX), Ceramic wiring boards.
  2. Sanada Sakae (Hadano JPX) Ohzawa Yoshiyuki (Hiratsuka JPX), Method for manufacturing ceramic substrate.
  3. Utsumi Kazuaki (Tokyo JPX) Yonezawa Masatomo (Tokyo JPX) Ohno Tomeji (Tokyo JPX), Method of manufacturing ceramic capacitors.

이 특허를 인용한 특허 (40)

  1. Hoi Cheong Sun ; Dominic Stephen Rosati ; Eugene Samuel Puliniak ; Bawa Singh ; Nitin Vithalbhai Desai, AC waveforms biasing for bead manipulating chucks.
  2. Sun Hoi Cheong Steve ; Poliniak Eugene Samuel ; Rosati Dominic Stephen ; Singh Bawa ; Desai Nitin Vithalbhai, AC waveforms biasing for bead manipulating chucks.
  3. Sun, Hoi Cheong Steve; Brycki, Bogdan, Apparatus for clamping a planar substrate.
  4. Sonoda, Akihiro, Apparatus having a static eliminator for manufacturing semiconductor devices and a method for eliminating a static electricity on a semiconductor wafer.
  5. Fujisawa, Hiroshi; Miyashita, Kinya, Bipolar electrostatic chuck.
  6. Nagase Yukio (Tokyo JPX) Satomura Hiroshi (Hatogaya JPX) Egami Hidemi (Zama JPX) Hirose Yoshihiko (Yokohama JPX), Charging or discharging device.
  7. Sun Hoi Cheong Steve ; Knoedler Christina Marie, Chucks and methods for positioning multiple objects on a substrate.
  8. Shimanaka, Yasuhiko, Discharge device.
  9. Iwanaga Masao (7-603 ; 17 ; Nishiogiminami 2-chome Suginami-ku ; Tokyo JPX), Discharge element and apparatus to which the same is applied.
  10. Genovese Frank C. (Fairport NY) Anderson Robert W. (Fairport NY), Distributed resistance corona charging device.
  11. Poliniak Eugene Samuel ; Sun Hoi Cheong Steve ; Desai Nitin Vithalbhai ; Kumar Nalin ; Roach William Ronald ; Hammer Lawrence Harrison ; Southgate Peter David ; Singh Bawa ; Rivenburg Howard Christop, Dry powder deposition apparatus.
  12. Masuda Senichi (Tokyo JPX) Fukuura Isamu (Nagoya JPX), Electric field device.
  13. Busse, Benedikt; Trutwig, Leonhard; Segl, Maximilian; Wandke, Dirk; Kopp, Matthias; Nolte, Michael; Scharf, Johannes; Storck, Karl-Otto, Electrode arrangement for a dielectrically limited gas discharge.
  14. Divakar, Ramesh; Zandi, Morteza, Electrostatic chuck susceptor and method for fabrication.
  15. Divakar, Ramesh; Zandi, Morteza, Electrostatic chucks with flat film electrode.
  16. Matsumoto Kazuyoshi (Tokyo JPX) Miyakawa Seiichi (Nagareyama JPX) Ohdake Eishu (Yokohama JPX) Suzuki Shigeru (Yokohama JPX), Flat solid discharging device.
  17. Divakar, Ramesh, High-purity low-resistivity electrostatic chucks.
  18. Sekoguchi,Yoshinori; Morikawa,Mamoru, Ion generator, and electric apparatus and air conditioning apparatus incorporating the same.
  19. Okuda Kouji (Kobe JPX) Nishi Tokumitsu (Osaka JPX) Hoshino Hisakiyo (Settsu JPX) Takai Hiroshi (Nishinomiya JPX) Miyake Natsumi (Toyonaka JPX), Joining method for joining electrically ceramic bodies.
  20. Fotland, Richard; Bowers, John; Jameson, William, Method and apparatus for producing uniform small portions of fine powders and articles thereof.
  21. Hoi Cheong Steve Sun ; Bogdan Brycki, Method for clamping and electrostatically coating a substrate.
  22. Fotland, Richard; Bowers, John; Jameson, William, Method for depositing particles onto a substrate using an alternating electric field.
  23. Hoi Cheong Steve Sun ; Timothy Allen Pletcher, Method of depositing particles with an electrostatic chuck.
  24. Sun, Hoi Cheong Steve; Pletcher, Timothy Allen, Method of depositing particles with an electrostatic chuck.
  25. Poliniak, Eugene Samuel; Steve Sun, Hoi Cheong; Desai, Nitin Vithalbhai; Kumar, Nalin; Roach, William Ronald; Hammer, Lawrence Harrison; Southgate, Peter David; Singh, Bawa; Rivenburg, Howard Christo, Methods using dry powder deposition apparatuses.
  26. Poliniak, Eugene Samuel; Sun, Hoi Cheong Steve; Desai, Nitin Vithalbhai; Kumar, Nalin; Roach, William Ronald; Hammer, Lawrence Harrison; Southgate, Peter David; Singh, Bawa; Rivenburg, Howard Christo, Methods using dry powder deposition apparatuses.
  27. Krichtafovitch, Igor A.; Wiklof, Christopher A., Multijet burner with charge interaction.
  28. Morita Naotoshi,JPX ; Wakita Sachio,JPX, Ozonizer having transparent cover and water purifier.
  29. Morita Naotoshi,JPX ; Wakita Sachio,JPX, Ozonizer, water purifier and method of cleaning an ozonizer.
  30. Murata Takaaki,JPX ; Kobayashi Shinji,JPX ; Yamanashi Ichiro,JPX ; Okita Yuuji,JPX ; Kawaguchi Shigeru,JPX ; Ogura Yasuhiro,JPX ; Ando Sueo,JPX ; Inaba Michihiko,JPX, Ozonizing unit ozone generator and ozone-processing system.
  31. Shunpei Yamazaki JP; Toru Takayama JP; Mitsunori Sakama JP; Hisashi Abe JP; Hiroshi Uehara JP; Mika Ishiwata JP, Plasma CVD apparatus.
  32. Yamazaki Shunpei,JPX ; Takayama Toru,JPX ; Sakama Mitsunori,JPX ; Abe Hisashi,JPX ; Uehara Hiroshi,JPX ; Ishiwata Mika,JPX, Plasma CVD apparatus.
  33. Yamazaki, Shunpei; Takayama, Toru; Sakama, Mitsunori; Abe, Hisashi; Uehara, Hiroshi; Ishiwata, Mika, Plasma CVD apparatus.
  34. Yamazaki, Shunpei; Takayama, Toru; Sakama, Mitsunori; Abe, Hisashi; Uehara, Hiroshi; Ishiwata, Mika, Plasma CVD apparatus.
  35. Yamazaki, Shunpei; Takayama, Toru; Sakama, Mitsunori; Abe, Hisashi; Uehara, Hiroshi; Ishiwata, Mika, Plasma CVD apparatus.
  36. Masayoshi Murata JP; Yoshiaki Takeuchi JP; Hiroshi Mashima JP; Akemi Takano JP; Hirohisa Yoshida JP, Plasma chemical vapor deposition apparatus.
  37. Fujioka, Yasumasa; Masuda, Masaaki; Kondo, Atsuo, Plasma generating electrode and plasma reactor.
  38. Ivan Herman Murzin ; Yanwei Zhang, Plasma immersion ion processor for fabricating semiconductor integrated circuits.
  39. Murzin Ivan Herman ; Zhang Yanwei, Plasma immersion ion processor for fabricating semiconductor integrated circuits.
  40. Hull, David M.; Vinci, Stephen J.; Fraser, Jr., William T.; Repicky, Philip N.; Sturdevant, Luke E., Systems and methods involving electric-field cages.
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