초록

A device and method for protecting optical means from contaminated gases, in which a substantially laminar flow of clean gas is passed over the surface of the optical means to be protected that is exposed to the contaminated gases.

대표청구항 ▼

An apparatus for protecting an optical member from contaminated gases, which comprises: means for producing a clean gas, a chamber in fluid communication with said means for producing said clean gas, a slit-like channel having a discharge opening connected without material interruption to said optic

An apparatus for protecting an optical member from contaminated gases, which comprises: means for producing a clean gas, a chamber in fluid communication with said means for producing said clean gas, a slit-like channel having a discharge opening connected without material interruption to said optical member, said discharge opening of said slit-like channel being in fluid flow communication with said chamber, said slit-like channel being dimensioned in a direction normal to a direction of flow of clean gas substantially constant over a distance from upstream of said discharge opening to said discharge opening and being identical to a dimension of said discharge opening to produce a substantially laminar flow of clean gas over and across said optical member.