초록 ▼

An optical system for determining and reproducing spatial separation of features in the range of 80Åto 2500Åfor optical microscopy and lithography using visible light, the system being independent of the wavelength of the incident light. An aperture mask is provided having at least one aperture of b

An optical system for determining and reproducing spatial separation of features in the range of 80Åto 2500Åfor optical microscopy and lithography using visible light, the system being independent of the wavelength of the incident light. An aperture mask is provided having at least one aperture of between about 80Åand 2500Ådiameter. The mask may be used in optical microscopy to view objects with a high degree of resolution by placing the mask within the near field of light emanating from a sample to be viewed. The mask may also be used for high resolution optical lithography by placing a resist material within the near field of light passing through the mask.

대표청구항 ▼

A method for optically measuring with high resolution the spatial relationship of entities within a sample material, comprising: mounting a sample to be viewed on a sample table; aligning detecting means with said sample; directing a beam of high intensity light onto said sample to produce evanescen

A method for optically measuring with high resolution the spatial relationship of entities within a sample material, comprising: mounting a sample to be viewed on a sample table; aligning detecting means with said sample; directing a beam of high intensity light onto said sample to produce evanescence in said sample and to cause said sample to emit spectral phenomena characteristic of the sample; interposing between said sample and said detecting means an aperture mask incorporating at least one aperture having a diameter of about 500 Å, said mask being within the near field of said emitted phenomena; and detecting said emitted phenomena in the far field.