초록 ▼

An improved transport container for semiconductor wafers includes chamber structure of sheet material with structure in the chamber for supporting the semiconductor wafers. The chamber includes a first access door portion through which the semiconductor wafers may be introduced into and removed from

An improved transport container for semiconductor wafers includes chamber structure of sheet material with structure in the chamber for supporting the semiconductor wafers. The chamber includes a first access door portion through which the semiconductor wafers may be introduced into and removed from the chamber, a coupling for attaching the chamber to a source of inert gas for flowing inert gas through the coupling to create a positive pressure in the chamber, and a port spaced from the coupling for continuously releasing gas from the chamber preferably at a rate in the range of one-half to ten cubic centimeters per minute so that the wafers are exposed to a flowing, low but positive pressure inert gas environment during storage and transport.

대표청구항 ▼

A transport container system for semiconductor wafers comprising; portable chamber structure of material that is substantially opaque to ultraviolet radiation, said chamber structure having a top and a bottom, support structure in said chamber structure for supporting semiconductor wafers in general

A transport container system for semiconductor wafers comprising; portable chamber structure of material that is substantially opaque to ultraviolet radiation, said chamber structure having a top and a bottom, support structure in said chamber structure for supporting semiconductor wafers in generally horizontal parallel spaced relation, said chamber structure including a first access door portion through which wafers may be introduced into and removed from said chamber structure, a coupling at the top of said chamber structure for attaching said chamber structure to a source of inert gas for flowing inert gas through said coupling to create a positive pressure in said chamber structure, and bleed port means adjacent the bottom of said chamber for continuously releasing gas from said chamber structure at a rate of at least about one cubic centimeter per minute and providing a continuous downward flow of inert gas across semiconductor wafers on said support structure in said chamber structure to provide a flowing inert gas protective environment for semiconductor wafers in said chamber structure.