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Vacuum processing system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/02
출원번호 US-0790924 (1985-10-24)
발명자 / 주소
  • Davis Cecil J. (Greenville TX) Matthews Robert (Plano TX) Hildenbrand Randall C. (Richardson TX)
출원인 / 주소
  • Texas Instruments Incorporated (Dallas TX 02)
인용정보 피인용 횟수 : 63  인용 특허 : 4

초록

A system for performing one semiconductor manufacturing operation or sequence of operations with reduced particulate contamination. A vacuum-tight wafer carrier, which contains numerous wafers in vacuum in a sealed box, is placed into a platform inside a vacuum load lock. The platform contains slots

대표청구항

A load lock comprising: a chamber having a vacuum-sealable lid; space within said chamber for a wafer carrier having a door; and a door opener, positioned inside said load lock in proximity to said space for a wafer carrier, whereby said door opener can open and close the door of the wafer carrier w

이 특허에 인용된 특허 (4)

  1. Richards Edmond A. (Marlton NJ), Apparatus for conveying a semiconductor wafer.
  2. Uehara, Akira; Hijikata, Isamu; Nakane, Hisashi; Nakayama, Muneo, Automatic plasma processing device and heat treatment device for batch treatment of workpieces.
  3. Jacoby Hans-Dieter (Werdorf DEX) Schmidt Peter (Huettenberg DEX), Device for automatically transporting disk shaped objects.
  4. Koch George R. (Los Altos CA) Petersen ; III Carl T. (Fremont CA), Modular loadlock.

이 특허를 인용한 특허 (63)

  1. Niewmierzycki, Leszek; Barker, David; Kuhlman, Michael; Pakulski, Ryan; Shan, Hongqing; Zucker, Martin, Advanced low cost high throughput processing platform.
  2. Gaudon, Alain; Astegno, Pierre; El Jarjini, Mohammed, Apparatus and process for identification of characters inscribed on a semiconductor wafer containing an orientation mark.
  3. English Roe E. (Euless TX) Kilgore Michael A. (McKinney TX) Crone Jerry A. (Kaufman TX), Automated diagnostic system.
  4. Kaczynski Ulrich (Bad Nauheim DEX) Schmidt Peter (Huettenberg DEX) Paul Hans-Helmut (Wetzlar DEX), Automatic handling apparatus for plate-shaped objects.
  5. Hofmeister Christopher A. ; Kiley Christopher C., Batch loader arm.
  6. Cockrum Charles A. (Goleta CA) Barton Jeffrey B. (Goleta CA) Schulte Eric F. (Santa Barbara CA), Buried junction infrared photodetector process.
  7. French ; Jr. Norman L., Circuit and apparatus for verifying a chamber seal, and method of depositing a material onto a substrate using the same.
  8. Norman L. French, Jr., Circuit and apparatus for verifying a chamber seal, and method of depositing a material onto a substrate using the same.
  9. Masujima Sho,JPX ; Miyauchi Eisaku,JPX ; Miyajima Toshihiko,JPX ; Watanabe Hideaki,JPX, Clean transfer method and apparatus therefor.
  10. Masujima Sho,JPX ; Miyauchi Eisaku,JPX ; Miyajima Toshihiko,JPX ; Watanabe Hideaki,JPX, Clean transfer method and apparatus therefor.
  11. Hofmeister Christopher A., Coaxial drive elevator.
  12. Kiley Christopher, Coaxial drive loader arm.
  13. Lee,Jae Chull; Berkstresser,David, Curved slit valve door with flexible coupling.
  14. Lee, Jae-Chull; Kurita, Shinichi; White, John M.; Anwar, Suhail, Decoupled chamber body.
  15. Zejda Jaroslav (Rodenbach DEX) Schuhmacher Manfred (Alzenau-Michelbach DEX), Device for accepting and holding a workpiece in vacuum coating apparatus.
  16. Kurita, Shinichi; Blonigan, Wendell T., Double dual slot load lock chamber.
  17. Avi Tepman ; Donald J. K. Olgado ; Allen L. D'Ambra, Dual buffer chamber cluster tool for semiconductor wafer processing.
  18. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  19. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  20. Kraus, Joseph Arthur; Strassner, James David, Dual wafer load lock.
  21. Kraus, Joseph Arthur; Strassner, James David, Dual wafer load lock.
  22. Haranoya Tomoji (Ashikaga JPX) Motegi Toshio (Ashikaga JPX) Abe Masaaki (Ohmiya JPX), Electrostatic flocking apparatus.
  23. Walde Michael (Rodenbach DEX) Zeidler Peter (Hanau DEX) Domroese Dirk (Bispingen-Behringen DEX), Installation for charging and discharging substrates out of a vacuum tank.
  24. Lazzari Jean-Pierre (Corenc FRX) Cortial Henri (Sassenage FRX), Installation for the storage and transfer of objects in a very clean atmosphere.
  25. Kurita, Shinichi; Blonigan, Wendell T.; Tanase, Yoshiaki, Large area substrate transferring method for aligning with horizontal actuation of lever arm.
  26. Sugawara, Yudo, Lid opening and closing device.
  27. Kurita,Shinichi; Blonigan,Wendell T.; Tanase,Yoshiaki, Load lock chamber for large area substrate processing system.
  28. Kurita,Shinichi; Blonigan,Wendell T., Load lock chamber having two dual slot regions.
  29. Lee, Jae-Chull; Anwar, Suhail; Kurita, Shinichi, Load lock chamber with decoupled slit valve door seal compartment.
  30. Niewmierzycki, Leszek, Low cost high throughput processing platform.
  31. Niewmierzycki, Leszek; Barker, David; Devine, Daniel J.; Kuhlman, Michael; Pakulski, Ryan; Shan, Hongqing; Zucker, Martin, Low cost high throughput processing platform.
  32. Niewmierzycki, Leszek; Barker, David; Devine, Daniel J.; Kuhlman, Michael; Pakulski, Ryan; Shan, Hongqing; Zucker, Martin, Low cost high throughput processing platform.
  33. Astegno, Pierre; Esteve, Ekaterina; Gaudon, Alain, Method and device for changing a semiconductor wafer position.
  34. Astegno,Pierre; Esteve,Ekaterina; Gaudon,Alain, Method and device for changing a semiconductor wafer position.
  35. Motta Antonino (Milan ITX), Method for decontamination of a chamber used in vacuum processes for deposition, etching and/or growth of high purity fi.
  36. Kurita,Shinichi; Blonigan,Wendell T., Method for transferring substrates in a load lock chamber.
  37. Freeman Dean W. (Garland TX) Burris James B. (Dallas TX) Davis Cecil J. (Greenville TX) Loewenstein Lee M. (Plano TX), Method for wafer treating.
  38. Torii, Hiroomi; Nishida, Hiroaki; Kaneko, Hiroyuki; Date, Misao; Mitsuya, Takashi; Nakamura, Takamasa, Method of operating substrate processing apparatus and substrate processing apparatus.
  39. Elliott, Martin R.; Shah, Vinay, Methods and apparatus for mapping carrier contents.
  40. Stark Lawrence R. (San Jose CA) Turner Frederick (Sunnyvale CA), Modular wafer transport and processing system.
  41. Kurita, Shinichi; Anwar, Suhail; Lee, Jae-Chull, Multiple slot load lock chamber and method of operation.
  42. Murata, Tatsuya, Optical disk device and optical disk processing system having optical disk device.
  43. Murata, Tatsuya, Optical disk device and optical disk processing system having optical disk device.
  44. Nakazato Horoshi (OhmeTokyo JPX) Iijima Mamoru (Yokohama JPX) Nakamura Akihiro (Yokohama JPX), Plate-like article conveying system.
  45. Davis Cecil J. (Greenville TX) Freeman Dean W. (Garland TX) Matthews Robert T. (Plano TX) Tomlin Joel T. (Garland TX), Processing apparatus for wafers.
  46. Mitomi Yoshimichi (Wadasaki JPX), Reactive ion etching appartus.
  47. Iizuka Kazuo (Yokohama JPX), Reticle conveying device.
  48. Tepolt Gary B., Robotic wafer handler.
  49. Wei Che-Chia (Plano TX) Tang Thomas E. (Dallas TX) Bohlman James G. (Forney TX) Douglas Monte A. (Coppell TX), Selective silicidation process using a titanium nitride protective layer.
  50. Selyutin Leonid ; Zhao Jun, Self aligning lift mechanism.
  51. Reardon,Timothy J.; Oberlitner,Thomas H.; Meuchel,Craig P.; Owczarz,Aleksander; Thompson,Raymon F., Semiconductor processing apparatus.
  52. Kevin Thomas Ryan ; Peter Lawrence Kellerman ; Frank Sinclair ; Ernest Everett Allen ; Roger Bradford Fish, Serial wafer handling mechanism.
  53. Nulman Jaim (Palo Alto CA), Single anneal step process for forming titanium silicide on semiconductor wafer.
  54. Blake Julian G. (Cambridge MA) Muka Richard S. (Topsfield MA) Younger Peter R. (Newton MA), Sputtering system.
  55. Meulen, Peter van der, Substrate container sealing via movable magnets.
  56. Tony R. Kroeker, Three chamber load lock apparatus.
  57. Iwai Hiroyuki,JPX ; Tanifuji Tamotsu,JPX ; Asano Takanobu,JPX ; Okura Ryoichi,JPX, Treatment apparatus.
  58. Miller Richard F. (10905 Eureka St. Boca Raton FL 33428), Ultraclean robotic material transfer method.
  59. Mellink Willem F. (Eindhoven NLX) Janssen Peter J. G. M. (Nijmegen NLX) Zwier Jan (Eindhoven NLX) Lotterman Harm (Nijmegen NLX), Vacuum system.
  60. Kim, Sam Hyungsam; Lee, Jae-Chull; Sterling, William N.; Brown, Paul, Valve door with ball coupling.
  61. Chrisos John M. (Beverly MA) Fowler ; Jr. Bertram F. (Danvers MA) Muka Richard S. (Topsfield MA), Wafer handling apparatus.
  62. Durham, Christopher E.; Malriat, William J.; Melcher, Allen R.; Penn, Randy J., Wafer handling apparatus and method.
  63. Davis Cecil J. (Greenville TX) Loewenstein Lee M. (Plano TX) Matthews Robert T. (Plano TX) Jones John I. (Plano TX) Jucha Rhett B. (Celeste TX), Wafer processing apparatus and method.
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