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Apparatus for remote measurement of temperatures 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01J-005/30
출원번호 US-0864276 (1986-05-19)
발명자 / 주소
  • Stein Alexander (Secaucus NJ)
출원인 / 주소
  • Quantum Logic Corporation (Secaucus NJ 02)
인용정보 피인용 횟수 : 37  인용 특허 : 5

초록

The temperature of a thermally emitting target which radiates over a band of wavelengths which includes first and second spaced wavelengths and which has an unknown emissivity characteristic at which the emissivity at one wavelength may but does not necessarily differ from the emissivity of another

대표청구항

Apparatus for remotely reading the temperature of a thermally radiating target which radiates over a band of wavelengths which includes first and second spaced wavelengths, said target having an unknown emissivity characteristic at which the emissivity at one wavelength may but does not necessarily

이 특허에 인용된 특허 (5)

  1. Brouwer Nicholaas L. (Allegheny Township ; Allegheny County PA) Urbanic John M. (Churchill Borough PA) Anderson Albert R. (White Valley PA), Emissivity error correcting method for radiation thermometer.
  2. Stein Alexander (Secaucus NJ) Rabinowitz Paul (Old Bethpage NY) Kaldor Andrew (Watchung NJ), Laser radiometer.
  3. Iuchi Tohru (Kawasaki JPX) Watanabe Kunitoshi (Fukuoka JPX) Shibata Toshihiko (Tokai JPX) Kawamura Tetsuro (Kitakyushu JPX), Method of and an apparatus for measuring surface temperature and emmissivity of a heated material.
  4. Brisk Richard (Wayland MA) Kasindorf Barry (Framingham MA) Stein Alexander (Secaucus NJ), Pyrometer #2.
  5. Stein Alexander (Secaucus NJ), Pyrometer 1.

이 특허를 인용한 특허 (37)

  1. Glenn William H. (Vernon CT), Active optical pyrometer.
  2. Ish-Shalom Yaron,ILX ; Baharav Yael, Active pyrometry with emissivity extrapolation and compensation.
  3. Rudolph Ralph G. (Center Valley PA), Apparatus and method for measuring temperature and/or emissivity of steel strip during a coating process.
  4. Picard, Tate S.; Woods, Kenneth J.; Young, Jr., Roger E.; Connally, William J., Centralized control architecture for a laser materials processing system.
  5. Nulman Jaim (Palo Alto CA) Bacile Nick J. (San Jose CA) Blonigan Wendell T. (Sunnyvale CA), Emissivity correction apparatus and method.
  6. Berson,William, Information encoding on surfaces by varying spectral emissivity.
  7. Berson,William, Information encoding on surfaces by varying spectral emissivity.
  8. Berson, William, Label for receiving indicia having variable spectral emissivity values.
  9. Berson, William, Label for receiving indicia having variable spectral emissivity values.
  10. Berson, William, Label for receiving indicia having variable spectral emissivity values.
  11. Berson,William, Label for receiving indicia having variable spectral emissivity values.
  12. Patton Evan E. (Portland OR), Method and apparatus for active pyrometry.
  13. Morrison ; Jr. Philip W. (South Windsor CT) Solomon Peter R. (West Hartford CT) Hamblen David G. (East Hampton CT), Method and apparatus for temperature determination.
  14. Krishnan Shankar (Arlington Heights IL) Hansen George P. (Austin TX) Hauge Robert H. (Houston TX) Margrave John L. (Houston TX) Rey Charles A. (Riverwoods IL), Method and apparatus to simultaneously measure emissivities and thermodynamic temperatures of remote objects.
  15. Gaertner, Reno; Ludwig, Steffen; Kuepper, Rainer; Moellmann, Klaus-Peter, Method and system for measuring thermal radiation to determine temperature and emissivity of an object.
  16. Tank Volker (Eching DEX), Method and system for optically measuring simultaneously the emissivity and temperature of objects.
  17. Arima Jiro (Osaka JPX) Tsujimura Hiroji (Osaka JPX) Narita Tomonori (Tokyo JPX) Takebuchi Hiroki (Kawasaki JPX), Method for measuring surface temperature of semiconductor wafer substrate, and heat-treating apparatus.
  18. Twerdochlib, Michael, Method of measuring in situ differential emissivity and temperature.
  19. Twerdochlib, Michael, Method of measuring in situ differential emissivity and temperature.
  20. Schietinger Charles W. ; Adams Bruce E., Non-contact optical techniques for measuring surface conditions.
  21. Harling Gord,CAX ; Zhang Rose,CAX ; Pope Tim,CAX ; Picard Francis,CAX ; Azelmad Abdellah,CAX, Non-contacting temperature sensing device.
  22. Berson, William, Printing system ribbon including print transferable circuitry and elements.
  23. Berthet Olivier (Vanves FRX) Greffet Jean-Jacques (Antony FRX) Denayrolles Yves (Le Vesinet FRX), Process for measuring the temperature of a body by optical detection and modulated heating.
  24. Connally,William J.; Woods,Kenneth J., Process monitor for laser and plasma materials processing of materials.
  25. Arima Jiro (Osaka JPX) Tsujimura Hiroji (Osaka JPX), Pyrometer.
  26. Tanaka Fumio (Fukuoka IN JPX) DeWitt David P. (West Lafayette IN), Radiation thermometry.
  27. Berson, William, Radio frequency identification labels.
  28. Berson, William, Radio frequency identification labels and systems and methods for making the same.
  29. Berson, William, Radio frequency identification labels and systems and methods for making the same.
  30. Naor, Yoram; Brosilow, Benjamin J, Reflectivity/emissivity measurement probe insensitive to variations in probe-to-target distance.
  31. Small IV, Ward; Celliers, Peter, Single-fiber multi-color pyrometry.
  32. Shajii, Ali; Matthews, Brian; Hebb, Jeffrey P.; Danis, John, System and method for controlling movement of a workpiece in a thermal processing system.
  33. Ali Shajii ; Jeffrey P. Hebb, System and method for determining stray light in a thermal processing system.
  34. Jeffrey P. Hebb ; Ali Shajii, System and method for the real time determination of the in situ emissivity and temperature of a workpiece during processing.
  35. Hebb Jeffrey P. ; Shajii Ali, System and method for the real time determination of the in situ emissivity of a workpiece during processing.
  36. Berson, William, Systems and methods for reading indicium.
  37. Berson, William, Systems and methods for reading indicium.
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