초록 ▼

There is disclosed a one-step process for purifying an inert gas achieved by contacting the inert gas including minute quantities of an impurity selected from the group consisting of CO, CO2, O2, H2, H2O and mixtures thereof with a particulate material comprised of nickel in an amount of at least ab

There is disclosed a one-step process for purifying an inert gas achieved by contacting the inert gas including minute quantities of an impurity selected from the group consisting of CO, CO2, O2, H2, H2O and mixtures thereof with a particulate material comprised of nickel in an amount of at least about 5% by weight as elemental nickel distributed over an effective area of surface, typically from about 100 to 200 m2/g, thereby forming an inert gas having less than 1 ppm and preferably less than 0.1 ppm of any such impurity.

대표청구항 ▼

A novel single-stage process for purifying an inert gas feed stream containing not greater than 1000 ppmv of impurities selected from the group consisting of carbon monoxide, carbon dioxide, oxygen, hydrogen, water vapor and mixtures thereof, consisting essentially of passing said inert gas stream c

A novel single-stage process for purifying an inert gas feed stream containing not greater than 1000 ppmv of impurities selected from the group consisting of carbon monoxide, carbon dioxide, oxygen, hydrogen, water vapor and mixtures thereof, consisting essentially of passing said inert gas stream comprising at least carbon monoxide, carbon dioxide and oxygen through a bed of particulate material comprised of nickel in an amount of at least about 5% by weight as elemental nickel at a temperature of from 0°to 50°C. and withdrawing a purified inert gas containing less than about several parts per million of said impurity.