초록 ▼

A method of separating HF from a mixture including HF and HCl is disclosed wherein the mixture is contacted with silica causing the HF to react with the silica to form SiF4. The concentration of HCl is increased thereby increasing the relative volatility of SiF4/HCl. The SiF4 is then removed as an a

A method of separating HF from a mixture including HF and HCl is disclosed wherein the mixture is contacted with silica causing the HF to react with the silica to form SiF4. The concentration of HCl is increased thereby increasing the relative volatility of SiF4/HCl. The SiF4 is then removed as an aqueous distillate. The concentration of the HCl can be increased by various methods including adding gaseous or concentrated HCl to the mixture or by distilling off a portion of the water to thereby increase the concentration of the HCl. This method provides an efficient method of removing SiF4 and HF from HCl.

대표청구항 ▼

A method of separating HF from a mixture of HF and HCl comprising: contacting said mixture with SiO2 to form a mixture of SiF4 and HCl; establishing an aqueous solution of SiF4 and HCl having a concentration of HCl at a level effective to provide a relative volatility SiF4/HCl at greater than 1; di

A method of separating HF from a mixture of HF and HCl comprising: contacting said mixture with SiO2 to form a mixture of SiF4 and HCl; establishing an aqueous solution of SiF4 and HCl having a concentration of HCl at a level effective to provide a relative volatility SiF4/HCl at greater than 1; distilling said solution of SiF4 and HCl to remove said SiF4 from said HCl and collecting SiF4 as an aqueous distillate; and collecting aqueous HCl as a bottom product.