$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Linear gas bearing with integral vacuum seal for use in serial process ion implantation equipment 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • F16C-032/06
  • F16C-033/72
  • F16J-015/16
  • F16J-015/40
출원번호 US-0921435 (1986-10-22)
발명자 / 주소
  • Pollock John D. (Rowley MA)
출원인 / 주소
  • Eclipse Ion Technology, Inc. (Gloucester MA 02)
인용정보 피인용 횟수 : 42  인용 특허 : 0

초록

A high vacuum ion implantation chamber has a lower wall formed with an opening accommodating a depending sleeve through which a shaft passes supporting a substrate support platform at the top and connectable to external linear and rotary drives at the bottom. The sleeve is formed with four axially s

대표청구항

A linear gas bearing comprising shaft means for coupling vertical linear movement from an external source to a platform located inside a high vacuum chamber having a chamber wall, sleeve means connected to said chamber wall for slidably accommodating said shaft means, said sleeve means being formed

이 특허를 인용한 특허 (42)

  1. Kimba, Toshifumi; Satake, Tohru; Karimata, Tsutomu; Watanabe, Kenji; Noji, Nobuharu; Murakami, Takeshi; Hatakeyama, Masahiro; Nakasuji, Mamoru; Sobukawa, Hirosi; Yoshikawa, Shoji; Oowada, Shin; Saito, Mutsumi, Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former.
  2. Kimba,Toshifumi; Satake,Tohru; Karimata,Tsutomu; Watanabe,Kenji; Noji,Nobuharu; Murakami,Takeshi; Hatakeyama,Masahiro; Nakasuji,Mamoru; Sobukawa,Hirosi; Yoshikawa,Shoji; Oowada,Shin; Saito,Mutsumi, Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former.
  3. Kimba,Toshifumi; Satake,Tohru; Karimata,Tsutomu; Watanabe,Kenji; Noji,Nobuharu; Murakami,Takeshi; Hatakeyama,Masahiro; Nakasuji,Mamoru; Sobukawa,Hirosi; Yoshikawa,Shoji; Oowada,Shin; Saito,Mutsumi, Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former.
  4. John W. Vanderpot ; John D. Pollock, Compact load lock system for ion beam processing of foups.
  5. Nakasuji,Mamoru; Satake,Tohru; Noji,Nobuharu; Sobukawa,Hirosi; Karimata,Tsutomu; Yoshikawa,Shoji; Kimba,Toshifumi; Oowada,Shin; Saito,Mutsumi; Hamashima,Muneki; Kohama,Yoshiaki; Okubo,Yukiharu, Electron beam apparatus and device fabrication method using the electron beam apparatus.
  6. Nakasuji, Mamoru; Noji, Nabuharu; Satake, Tohru; Hatakeyama, Masahiro; Watanabe, Kenji; Kato, Takao; Sobukawa, Hirosi; Karimata, Tsutomu; Yoshikawa, Shoji; Kimba, Toshifumi; Oowada, Shin; Saito, Mutsumi; Hamashima, Muneki, Electron beam apparatus and method of manufacturing semiconductor device using the apparatus.
  7. Nakasuji, Mamoru; Satake, Tohru; Watanabe, Kenji; Murakami, Takeshi; Noji, Nobuharu; Sobukawa, Hirosi; Karimata, Tsutomu; Yoshikawa, Shoji; Kimba, Toshifumi; Oowada, Shin; Saito, Mitsumi; Hamashima, Muneki; Takagi, Toru; Kihara, Naoto; Nishimura, Hiroshi, Electron beam apparatus and method of manufacturing semiconductor device using the apparatus.
  8. Nakasuji, Mamoru; Satake, Tohru; Watanabe, Kenji; Murakami, Takeshi; Noji, Nobuharu; Sobukawa, Hirosi; Karimata, Tsutomu; Yoshikawa, Shoji; Kimba, Toshifumi; Oowada, Shin; Saito, Mutsumi; Hamashima, , Electron beam apparatus and method of manufacturing semiconductor device using the apparatus.
  9. Nakasuji,Mamoru; Noji,Nobuharu; Satake,Tohru; Hatakeyama,Masahiro; Watanabe,Kenji; Kato,Takao; Sobukawa,Hirosi; Karimata,Tsutomu; Yoshikawa,Shoji; Kimba,Toshifumi; Oowada,Shin; Saito,Mutsumi; Hamashi, Electron beam apparatus and method of manufacturing semiconductor device using the apparatus.
  10. Nakasuji,Mamoru; Noji,Nobuharu; Satake,Tohru; Hatakeyama,Masahiro; Watanabe,Kenji; Kato,Takao; Sobukawa,Hirosi; Karimata,Tsutomu; Yoshikawa,Shoji; Kimba,Toshifumi; Oowada,Shin; Saito,Mutsumi; Hamashima,Muneki, Electron beam apparatus and method of manufacturing semiconductor device using the apparatus.
  11. Nakasuji,Mamoru; Satake,Tohru; Watanabe,Kenji; Murakami,Takeshi; Noji,Nobuharu; Sobukawa,Hirosi; Karimata,Tsutomu; Yoshikawa,Shoji; Kimba,Toshifumi; Oowada,Shin; Saito,Mutsumi; Hamashima,Muneki; Taka, Electron beam apparatus and method of manufacturing semiconductor device using the apparatus.
  12. Fujikawa, Yoshio; Itoh, Takayuki, Externally pressurized gas bearing spindle assembly.
  13. Sogard Michael R., Fluid bearing operable in a vacuum region.
  14. Smick Theodore H. ; Farley Marvin ; Sakase Takao ; Ryding Geoffrey, Fluid bearing vacuum seal assembly.
  15. Chilese, Francis C.; Garcia, Rudy F., Gas bearing assembly for an EUV light source.
  16. Bisschops, Theodorus H. J.; Vijfvinkel, Jakob; Soemers, Hermanus M. J. R.; Driessen, Johannes C.; Renkens, Michael J. M.; Bouwer, Adrianus G., Gas bearings for use with vacuum chambers and their application in lithographic projection apparatus.
  17. Bisschops, Theodorus H. J.; Vijfvinkel, Jakob; Soemers, Hermanus M. J. R.; Driessen, Johannes C.; Renkens, Michael J. M.; Bouwer, Adrianus G., Gas bearings for use with vacuum chambers and their application in lithographic projection apparatuses.
  18. Yuasa, Satoru; Tamura, Yoshio; Nakaya, Makoto; Matsuno, Tomoyasu; Nagai, Nobuo, Holder driving unit.
  19. Berrian, Donald W.; Pollock, John D.; Vanderpot, John W., Hybrid scanning system and methods for ion implantation.
  20. Sai,Choshoku, Hydrostatic bearing and stage apparatus using same.
  21. Nakasuji, Mamoru; Noji, Nobuharu; Satake, Tohru; Hatakeyama, Masahiro; Kimba, Toshifumi; Sobukawa, Hirosi; Yoshikawa, Shoji; Murakami, Takeshi; Watanabe, Kenji; Karimata, Tsutomu; Oowada, Shin; Saito, Mutsumi; Yamazaki, Yuichiro; Nagai, Takamitsu; Nagahama, Ichirota, Inspection system by charged particle beam and method of manufacturing devices using the system.
  22. Nakasuji, Mamoru; Noji, Nobuharu; Satake, Tohru; Hatakeyama, Masahiro; Kimba, Toshifumi; Sobukawa, Hirosi; Yoshikawa, Shoji; Murakami, Takeshi; Watanabe, Kenji; Karimata, Tsutomu; Oowada, Shin; Saito, Mutsumi; Yamazaki, Yuichiro; Nagai, Takamitsu; Nagahama, Ichirota, Inspection system by charged particle beam and method of manufacturing devices using the system.
  23. Nakasuji, Mamoru; Noji, Nobuharu; Satake, Tohru; Hatakeyama, Masahiro; Kimba, Toshifumi; Sobukawa, Hirosi; Yoshikawa, Shoji; Murakami, Takeshi; Watanabe, Kenji; Karimata, Tsutomu; Oowada, Shin; Saito, Mutsumi; Yamazaki, Yuichiro; Nagai, Takamitsu; Nagahama, Ichirota, Inspection system by charged particle beam and method of manufacturing devices using the system.
  24. Geoffrey Ryding, Ion implanter with vacuum piston counterbalance.
  25. Katsuhito Nishikawa ; Thomas F. Carlos, Linear robot.
  26. Smick Theodore H. ; Ryding Geoffrey ; Farley Marvin, Method and apparatus for controlling a workpiece in a vacuum chamber.
  27. Smick Theodore H. ; Ryding Geoffrey ; Farley Marvin, Method and apparatus for controlling a workpiece in a vacuum chamber.
  28. Theodore H. Smick ; Geoffrey Ryding ; Marvin Farley, Method and apparatus for controlling a workpiece in a vacuum chamber.
  29. Power Bernard A. (255 Touzin Avenue Dorval ; Quebec CAX) Power Mark B. (255 Touzin Avenue Dorval ; Quebec CAX H9S 2N1), Method and apparatus for sealing rocket motor segment joints.
  30. Daniel Edward A. ; Couchot Norman J. ; Keller Daniel L. ; Brewer William C., Method for controlling oil in a press.
  31. Nakasuji,Mamoru; Noji,Nobuharu; Satake,Tohru; Kimba,Toshifumi; Hatakeyama,Masahiro; Watanabe,Kenji; Sobukawa,Hirosi; Karimata,Tsutomu; Yoshikawa,Shoji; Oowada,Shin; Saito,Mutsumi; Hamashima,Muneki, Method for inspecting substrate, substrate inspecting system and electron beam apparatus.
  32. Devitt,Andrew J., Moving vacuum chamber stage with air bearing and differentially pumped grooves.
  33. Smick, Theodore H.; Roberts, Frank D.; Farley, Marvin; Ryding, Geoffrey; Sakase, Takao; Murrell, Adrian; Edwards, Peter; Harrison, Bernard, Multi-directional scanning of movable member and ion beam monitoring arrangement therefor.
  34. Katsuhito Nishikawa ; Thomas F. Carlos, Particulate free air bearing and seal.
  35. Nakamura, Tsuyoshi; Saji, Nobuhito, Positioning apparatus.
  36. Nakamura,Tsuyoshi; Saji,Nobuhito, Positioning apparatus.
  37. Vanderpot John W., Scanning system with linear gas bearings and active counter-balance options.
  38. Shinozaki, Hiroyuki, Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber.
  39. Ryding, Geoffrey, Semiconductor processing apparatus having a moving member and a force compensator therefor.
  40. Sai,Choshoku; Akutsu,Kotaro, Static gas bearing system, stage mechanism, exposure apparatus, and device manufacturing method.
  41. Yamaga Kenichi,JPX, Thermal processing apparatus.
  42. Devitt, Andrew J., Vacuum chamber stage with application of vacuum from below.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로