[특허]Valve block and container for semiconductor source reagent dispensing and/or purification

Valve block and container for semiconductor source reagent dispensing and/or purification 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B01D-053/04
출원번호	US-0117207 (1987-11-04)
발명자 / 주소	Tom Glenn M. (New Milford CT)
출원인 / 주소	Advanced Technology Materials, Inc. (New Milford CT 02)
인용정보	피인용 횟수 : 61 인용 특허 : 0

초록 ▼

A valve block leak-tightly joinable to a receptacle to form a container suitable for liquid storage/vapor dispensing, and gas purification applications. The valve block is provided with first and second valve ports with which valves may be employed to flow feed gas through the valve block and receptacle. To effect purging the valve block ports and gas flow passages, the valve block is provided with a purge valve port which may be opened while the first and second valve ports are closed, to remove dead space hold-up gas from the respective ports and flow passages of the block prior to initiation of vapor dispensing or gas purification operation. The disclosed container is particularly advantageous for dispensing or purifying source reagent compounds for elements of Group III and Group V, in semiconductor manufacturing applications.

대표청구항 ▼

A valve block, comprising: (a) a block leak-tightly joinable at its bottom face to a receptacle and having top, bottom, front, rear and side faces; (b) an inlet in the top face of the block for introducing fluid thereto; (c) an outlet in the top face of the block for discharging fluid therefrom, in spaced relationship to said inlet, (d) a first valve port in a first side face of the block; (e) a second valve port in a second side face of the block; (f) a third valve port in the front face of the block; (g) a first fluid flow passage joining the inlet and the first valve port; (h) a second fluid flow passage joining the first valve port and the bottom face of the block; (i) a third fluid flow passage joining the first valve port and the third valve port; (j) a fourth fluid flow passage joining the third valve port and the second valve port; (k) a fifth fluid flow passage joining the second valve port and the bottom face of the block, and in spaced relationship to the second fluid flow passage; (l) a sixth fluid flow passage joining the second valve port and the outlet; the respective fluid flow passages at each of said respective valve ports being positioned relative to one another whereby independently operable valves disposed in said valve ports and operable to provide selected open or closed valve positions provide: (A) when said third valve port valve is closed and said first and second valve port valves are open, sequential fluid flow from said inlet through only said first fluid flow passage, first valve port, second fluid flow passage, said receptacle, sixth fluid flow passage, and said outlet; and (B) when said third valve port valve is open and said first and second valve port valves are closed, sequential fluid flow from said inlet through only said first fluid flow passage, first valve port, third fluid flow passage, third valve port, fourth fluid flow passage, second valve port, sixth fluid flow passage, and said outlet.

이 특허를 인용한 특허 (61)

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Yoshioka, Naoki; Kawamoto, Tatsushi; Kawao, Mitsushi; Matsuno, Shigeru; Yamada, Akira; Miyashita, Shoji; Uchikawa, Fusaoki, Liquid substance supply device for vaporizing system, vaporizer, vaporization performance appraisal method.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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Valve block and container for semiconductor source reagent dispensing and/or purification 원문보기

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Valve block and container for semiconductor source reagent dispensing and/or purification 원문보기

초록 ▼

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연구과제 타임라인

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이 특허를 인용한 특허 (61)

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