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Transparent coatings by reactive sputtering 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-014/10
  • C23C-014/18
출원번호 US-0010023 (1987-02-02)
발명자 / 주소
  • Belkind Abraham I. (North Plainfield NJ) Bjornard Erik (Concord CA) Hofmann James J. (Hackettstown NJ) Jacobson Donald V. (Concord CA) Nadel Steven J. (Oakland CA)
출원인 / 주소
  • The BOC Group, Inc. (Montvale NJ 02)
인용정보 피인용 횟수 : 59  인용 특허 : 0

초록

A method for depositing a protective coating by cathode sputtering of an alloy of aluminum and silicon in a reactive gas is disclosed. The sputtering target contains sufficient silicon to produce an amorphous coating; 6 to 18 percent silicon is preferred. Targets of approximately 88% aluminum and 12

대표청구항

A coated article comprising a substrate, a coating on the substrate, and a protective overcoating on the coating where the overcoating comprises an amorphous dielectric layer of reaction products formed by sputtering a target in a reactive gas wherein the target is an alloy comprising aluminum and s

이 특허를 인용한 특허 (59)

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