초록 ▼

A device for measuring an object includes a laser beam, a translator for moving the object with respect to the beam, an object reference plane which is the plane perpendicular to the beam that is first entered by the object, a lens system for imaging a light pattern formed in a second plane onto a f

A device for measuring an object includes a laser beam, a translator for moving the object with respect to the beam, an object reference plane which is the plane perpendicular to the beam that is first entered by the object, a lens system for imaging a light pattern formed in a second plane onto a first plane, wherein the second plane is adjacent to the object reference plane, and the light pattern includes a diffraction pattern caused by interaction of the beam and the object, a slit interposed at the first plane for limiting the extent of the beam that passes through the first plane, and a photodetector that emits a signal representative of the light received behind the slit for detecting the portion of the beam that passes through this slit. The slit is sufficiently small so as to enable resolution of the diffraction pattern by the photodetector. The device further includes a circuit for calculating a dimension of the object in response to the signal emitted by the photodetector. A method of gauging roundness includes using this device for moving the object in a direction perpendicular to the beam and rotating the object within the beam.

대표청구항 ▼

A method of measuring comprising the steps of: providing a laser beam; translating an object to be measured into the beam; imaging onto a first plane a light pattern formed in a second plane, said light pattern including a diffraction pattern caused by interaction of the beam and the object, said se

A method of measuring comprising the steps of: providing a laser beam; translating an object to be measured into the beam; imaging onto a first plane a light pattern formed in a second plane, said light pattern including a diffraction pattern caused by interaction of the beam and the object, said second plane being adjacent the plane perpendicular to the beam that is first entered by the object; moving the object within the beam while the intensity of the light pattern is below a threshold value; sampling the intensity of the light pattern in the first plane over a fraction of its extent, said fraction being sufficiently small to enable resolution of the diffraction pattern; and calculating a dimension of the object from the sampled light pattern.