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Apparatus and method for loading and unloading wafers 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65G-001/00
출원번호 US-0936825 (1986-12-02)
발명자 / 주소
  • Prentakis Antonios E. (Cambridge MA)
출원인 / 주소
  • Teradyne, Inc. (Boston MA 02)
인용정보 피인용 횟수 : 128  인용 특허 : 4

초록

Apparatus for loading and unloading wafers including a support structure having associated with it a predetermined wafer engagement position at which wafers can be engaged by the processing machine, a temporary storage device mounted on the support structure for storing a wafer in position for pick

대표청구항

Apparatus for transporting wafers between a temporary storage device and a processing machine comprising a support structure having associated with it a predetermined wafer engagement position at which wafers having flat surfaces can be engaged by said processing machine, a temporary storage device

이 특허에 인용된 특허 (4)

  1. Freeman, Gary T.; Maxner, Richard B.; Nash, Thomas F., Automatic board handling mechanism.
  2. Judge Robert L. (Poughkeepsie NY) Wutka Anthony D. (Burlington VT), Controls for semiconductor wafer orientor.
  3. Burkhalter David W. (Redwood City CA) Kain Maurits R. (Redwood City CA), Wafer handling mechanism.
  4. Flint Alan G. (Los Gatos CA) Jacobs William G. (San Jose CA), Wafer loading apparatus.

이 특허를 인용한 특허 (128)

  1. Weaver, William T.; Yudovsky, Joseph; Blahnik, Jeffrey, Apparatus and methods for wafer rotation to improve spatial ALD process uniformity.
  2. Bell James A. E. (Oakville CAX) Conard Bruce R. (Oakville CAX), Apparatus and process for coloring objects by plasma coating.
  3. Gaudon, Alain; Astegno, Pierre; El Jarjini, Mohammed, Apparatus and process for identification of characters inscribed on a semiconductor wafer containing an orientation mark.
  4. Nulman,Jaim; Sidi,Nissim, Apparatus for storing and moving a cassette.
  5. Perlov Ilya ; Gantvarg Evgueni ; Belitsky Victor, Apparatus for storing and moving a cassette.
  6. Perlov, Ilya; Gantvarg, Evgueni; Belitsky, Victor, Apparatus for storing and moving a cassette.
  7. Doherty, Brian J.; Mariano, Thomas R.; Sullivan, Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  8. Doherty, Brian J.; Mariano, Thomas R.; Sullivan, Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  9. Doherty, Brian J.; Mariano, Thomas R.; Sullivan, Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  10. Doherty, Brian J.; Mariano, Thomas R.; Sullivan, Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  11. Doherty,Brian J.; Mariano,Thomas R.; Sullivan,Robert P., Automated material handling system for semiconductor manufacturing based on a combination of vertical carousels and overhead hoists.
  12. Beer, Emanuel; White, John M., Automated substrate processing system.
  13. Sagues Paul ; Peurach John T. ; Aggarwal Sanjay D., Automatic calibration system for wafer transfer robot.
  14. Moriyama Masashi (Tokorozawa JPX), Automatic coating system.
  15. Hofmeister Christopher A. ; Kiley Christopher C., Batch loader arm.
  16. Dvir, Eran, Buffer system for a wafer handling system.
  17. Rice,Michael R.; Englhardt,Eric A.; Lowrance,Robert B.; Elliott,Martin R.; Hudgens,Jeffrey C.; Van Katwyk,Kirk; Puri,Amit, Calibration of high speed loader to substrate transport system.
  18. Farnworth Warren M., Complete blade and wafer handling and support system without tape.
  19. Farnworth Warren M., Complete blade and wafer handling and support system without tape.
  20. Farnworth Warren M., Complete blade and wafer handling and support system without tape.
  21. Warren M. Farnworth, Complete blade and wafer handling and support system without tape.
  22. Warren M. Farnworth, Complete blade and wafer handling and support system without tape.
  23. Tepman Avi, Consecutive deposition system.
  24. Lee,Jae Chull; Berkstresser,David, Curved slit valve door with flexible coupling.
  25. Weaver, William Tyler, Datum plate for use in installations of substrate handling systems.
  26. Weaver,William Tyler, Datum plate for use in installations of substrate handling systems.
  27. Lee, Jae-Chull; Kurita, Shinichi; White, John M.; Anwar, Suhail, Decoupled chamber body.
  28. Burg Marlo ; Miller Kenneth W., Disk transfer apparatus.
  29. Kurita, Shinichi; Blonigan, Wendell T., Double dual slot load lock chamber.
  30. Dennis L. Goodwin ; Eric R. Wood ; Ivo Raaijmakers, Dual arm linear hand-off wafer transfer assembly.
  31. Goodwin Dennis L. ; Wood Eric R. ; Raaijmakers Ivo, Dual arm linear hand-off wafer transfer assembly.
  32. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  33. Kurita, Shinichi; Blonigan, Wendell T.; Hosokawa, Akihiro, Dual substrate loadlock process equipment.
  34. Hughes John L. (Rodeo CA) Shula Thomas E. (Palo Alto CA) Rodriguez Carlos E. (Redwood City CA), Dual track handling and processing system.
  35. Hansen, Torben M., Eliminating inline positional errors for four-point resistance measurement.
  36. Fosnight,William John; Bufano,Michael; Friedman,Gerald; Sullivan,Robert, Extractor/buffer.
  37. Miller,Jimmie Andrew, Fiducial calibration method and system for assembling parts.
  38. Miller,Jimmie Andrew, Fiducial calibration method for measuring a workpiece.
  39. Miller, Jimmie Andrew, Fiducial calibration systems and methods for manufacturing, inspection, and assembly.
  40. Frank J. Ardezzone, IC wafer handling apparatus incorporating edge-gripping and pressure or vacuum driven end-effectors.
  41. Kurita Shinichi ; White John M., In-situ substrate transfer shuttle.
  42. Walde Michael (Rodenbach DEX) Zeidler Peter (Hanau DEX) Domroese Dirk (Bispingen-Behringen DEX), Installation for charging and discharging substrates out of a vacuum tank.
  43. Auer-Jongepier, Suzan L.; Onvlee, Johannes; Bartray, Petrus R.; Luttikhuis, Bernardus A. J.; Plug, Reinder T.; Segers, Hubert M., Integrated post-exposure bake track.
  44. Danna,Mark; Hine,Roger G.; Bonom,Anthony C., Integrated system for tool front-end workpiece handling.
  45. Kurita, Shinichi; Blonigan, Wendell T.; Tanase, Yoshiaki, Large area substrate transferring method for aligning with horizontal actuation of lever arm.
  46. Meulen, Peter van der, Linear semiconductor processing facilities.
  47. van der Meulen, Peter, Linear semiconductor processing facilities.
  48. Kurita,Shinichi; Blonigan,Wendell T.; Tanase,Yoshiaki, Load lock chamber for large area substrate processing system.
  49. Kurita,Shinichi; Blonigan,Wendell T., Load lock chamber having two dual slot regions.
  50. Lee, Jae-Chull; Anwar, Suhail; Kurita, Shinichi, Load lock chamber with decoupled slit valve door seal compartment.
  51. Codatto Antonio (Via Alcide de Gasperi 20 Lonigo (Vicenza) ITX), Manipulators for plate sheets.
  52. Farassat,Farhad, Mechanism for exchanging chip-carrier plates for use in a hybrid chip-bonding machine.
  53. Cheng David, Method and apparatus for handling and testing wafers.
  54. Cheng David, Method and apparatus for integrated wafer handling and testing.
  55. Cheng David, Method and apparatus for loading and unloading wafers from a wafer carrier.
  56. Antonell, Michael; Houge, Erik Cho; Plew, Larry E.; Vartuli, Catherine; Juszczak, Jennifer, Method and apparatus for minimizing semiconductor wafer contamination.
  57. White John M. ; Blonigan Wendell T. ; Tiner Robin L. ; Kurita Shinichi, Method and apparatus for substrate transfer and processing.
  58. Astegno, Pierre; Esteve, Ekaterina; Gaudon, Alain, Method and device for changing a semiconductor wafer position.
  59. Astegno,Pierre; Esteve,Ekaterina; Gaudon,Alain, Method and device for changing a semiconductor wafer position.
  60. Kurita,Shinichi; Blonigan,Wendell T., Method for transferring substrates in a load lock chamber.
  61. Lowrance, Robert B.; Englhardt, Eric Andrew; Rice, Michael R.; Shah, Vinay; Koshti, Sushant S.; Hudgens, Jeffrey C., Methods and apparatus for a band to band transfer module.
  62. Cina Michael F. (Hopewell Junction NY) Cohen Mitchell S. (Ossining NY) Flint Ephraim B. (Garrison NY) Grebe Kurt R. (Beacon NY) Hall Douglas J. (Newark Valley NY) Jackson Kenneth P. (Danbury CT) Opry, Methods and apparatus for precise alignment of objects.
  63. van der Meulen, Peter, Mid-entry load lock for semiconductor handling system.
  64. van der Meulen,Peter, Mid-entry load lock for semiconductor handling system.
  65. Babbs, Daniel; Ewald, Timothy; Coady, Matthew; Fosnight, William J., Modular sorter.
  66. White John M. ; Conner Robert B. ; Law Kam S. ; Turner Norman L. ; Lee William T. ; Kurita Shinichi, Modular substrate processing system.
  67. John M. White ; Wendell T. Blonigan ; Michael W. Richter, Multi-function chamber for a substrate processing system.
  68. White John M. ; Blonigan Wendell T. ; Richter Michael W., Multi-function chamber for a substrate processing system.
  69. White John M. ; Blonigan Wendell T. ; Richter Michael W., Multi-function chamber for a substrate processing system.
  70. Aggarwal Ravinder ; Stevens Ronald R., Multi-stage single-drive FOUP door system.
  71. Kurita, Shinichi; Anwar, Suhail; Lee, Jae-Chull, Multiple slot load lock chamber and method of operation.
  72. Takebuchi, Ryuichi, Probe apparatus and method of alignment for the same.
  73. Canella Robert L. ; Farnworth Warren M., Process for testing a semiconductor device.
  74. De Ridder, Christianus Gerardus Maria; den Hartog, Edwin, Processing system with increased cassette storage capacity.
  75. Maher Joseph A. (South Hamilton MA) Vowles E. John (Goffstown NH) Napoli Joseph D. (Winham NH) Zafiropoulo Arthur W. (Manchester MA) Miller Mark W. (Burlington MA), Quad processor.
  76. Tepman, Avi, Robot blade with dual offset wafer supports.
  77. Wood, Eric R.; Crabb, Richard; Alexander, James A., Semiconductor handling robot with improved paddle-type end effector.
  78. Wood,Eric R.; Crabb,Richard; Alexander,James A., Semiconductor handling robot with improved paddle-type end effector.
  79. Makita, Toshiyuki, Semiconductor manufacturing method and semiconductor manufacturing apparatus.
  80. van der Meulen, Peter, Semiconductor manufacturing systems.
  81. Shirai, Hidenobu, Semiconductor transfer and manufacturing apparatus.
  82. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
  83. van der Meulen, Peter; Kiley, Christopher C; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling and transport.
  84. van der Meulen, Peter; Kiley, Christopher C.; Pannese, Patrick D.; Ritter, Raymond S.; Schaefer, Thomas A., Semiconductor wafer handling transport.
  85. Edward E. Ehrichs ; Chris Wooten, Semiconductor wafer review system and method.
  86. Howells John ; Peltola Randall W., Semiconductor wafer transfer method and apparatus.
  87. Yang, Chunyu; Yuan, Man; Zhang, Ji; Zhang, Wei; Yin, Yongzhi; Liu, Yanhong, Separation device for backlight source.
  88. Carducci Jim, Single drive, dual plane robot.
  89. Hasper,Albert; Nooten,Sebastiaan Eliza; Hendriks,Menso, Sorting/storage device for wafers and method for handling thereof.
  90. van der Meulen, Peter, Stacked process modules for a semiconductor handling system.
  91. van der Meulen,Peter, Stacked process modules for a semiconductor handling system.
  92. Yonemitsu Shuji,JPX ; Karino Toshikazu,JPX ; Yoshida Hisashi,JPX ; Watahiki Shinichiro,JPX ; Yoshida Yuji,JPX ; Shimura Hideo,JPX ; Sugimoto Takeshi,JPX ; Aburatani Yukinori,JPX ; Ikeda Kazuhito,JPX, Substrate processing apparatus.
  93. Yonemitsu Shuji,JPX ; Karino Toshikazu,JPX ; Yoshida Hisashi,JPX ; Watahiki Shinichiro,JPX ; Yoshida Yuji,JPX ; Shimura Hideo,JPX ; Sugimoto Takeshi,JPX ; Aburatani Yukinori,JPX ; Ikeda Kazuhito,JPX, Substrate processing apparatus with a processing chamber, transfer chamber, intermediate holding chamber, and an atmospheric pressure section.
  94. Osaka, Akihiro; Murobayashi, Masaki; Matsunaga, Tatsuhisa; Noto, Kouichi, Substrate processing method and apparatus.
  95. Ueda Issei,JPX ; Akimoto Masami,JPX ; Kudou Hiroyuki,JPX, Substrate transfer apparatus.
  96. Murata, Akira; Enokida, Suguru; Douki, Yuichi, Substrate transfer apparatus, substrate process system, and substrate transfer method.
  97. Kitayama Hirofumi (Aikawa JPX) Kato Mitsuo (Sagamihara JPX) Takanabe Eiichiro (Shiroyama JPX) Kobayashi Masaru (Shiroyama JPX), Substrate transfer device.
  98. White, John M.; Turner, Norman L.; Tiner, Robin L.; Keller, Ernst; Kurita, Shinichi; Blonigan, Wendell T.; Berkstresser, David E., Substrate transfer shuttle.
  99. White, John M.; Turner, Norman L.; Tiner, Robin L.; Keller, Ernst; Kurita, Shinichi; Blonigan, Wendell T.; Berkstresser, David E., Substrate transfer shuttle.
  100. Blonigan Wendell T. ; White John M., Substrate transfer shuttle having a magnetic drive.
  101. Blonigan, Wendell T.; White, John M., Substrate transfer shuttle having a magnetic drive.
  102. Wendell T. Blonigan ; John M. White, Substrate transfer shuttle having a magnetic drive.
  103. Raaijmakers Ivo ; Jacobs Loren ; Halpin Mike ; Alexander Jim ; O'Neill Ken ; Goodwin Dennis Lee, Substrate transfer system for semiconductor processing equipment.
  104. Raaijmakers Ivo ; Jacobs Loren R. ; Halpin Michael W. ; Alexander James A. ; O'Neill Ken ; Goodwin Dennis L., Substrate transfer system for semiconductor processing equipment.
  105. Yonemitsu Shuji,JPX ; Karino Toshikazu,JPX ; Yoshida Hisashi,JPX ; Watahiki Shinichiro,JPX ; Yoshida Yuji,JPX ; Shimura Hideo,JPX ; Sugimoto Takeshi,JPX ; Aburatani Yukinori,JPX ; Ikeda Kazuhito,JPX, Substrate transferring mechanism.
  106. Yamagishi, Takayuki; Kobayashi, Tamihiro; Watanabe, Akira; Kaneuchi, Kunihiro, Substrate-processing apparatus with buffer mechanism and substrate-transferring apparatus.
  107. Maher Joseph A. ; Vowles E. John ; Napoli Joseph D. ; Zafiropoulo Arthur W. ; Miller Mark W., System for processing substrates.
  108. Walker Delroy (Springdale MD) Zihmer Joseph (Frederick MD) Furches Danny (Columbia MD) Garmer Christopher J. (Rockville MD), System for transferring articles between controlled environments.
  109. Cho,Yeon Ha, System to determine proper wafer alignment.
  110. Fairbairn, Kevin; Barzilai, Jessica; Ponnekanti, Hari K.; Taylor, W. N. (Nick), Tandem process chamber.
  111. Tanguay, Michael J., Throughput enhancement for single wafer reactor.
  112. Oosawa Tetsu,JPX ; Ushikawa Harunori,JPX, Transfer apparatus, transfer method, treatment apparatus and treatment method.
  113. Nishi Hironobu (Sagamihara JPX), Transfer device.
  114. Ozawa Jun,JPX ; Hirose Jun,JPX ; Hirose Eiji,JPX ; Ohara Makoto,JPX, Transfer system for vacuum process equipment.
  115. Turner, Norman L.; White, John M.; D'Entremont, Alan, Vacuum processing system having improved substrate heating and cooling.
  116. Kim, Sam Hyungsam; Lee, Jae-Chull; Sterling, William N.; Brown, Paul, Valve door with ball coupling.
  117. Blum Rick ; Fairbairn Kevin ; Lane Christopher, Vertical dual loadlock chamber.
  118. Shinozuka, Masamitsu, Wafer carrying system and carrying method thereof.
  119. Moslehi Mehrdad M., Wafer handler for multi-station tool.
  120. Hillman Gary, Wafer handling method and apparatus.
  121. Engelbrecht Orest (Ridgefield CT), Wafer handling system.
  122. Howells John ; Gorman Andrew P. ; Peltola Randall W., Wafer handling system and method.
  123. Shulman, Benjamin; Alper, Yoav, Wafer monitoring system.
  124. Matthew W. Coady ; Hillman L. Bailey, Wafer orienting and reading mechanism.
  125. Nering Eric A., Wafer positioning device with storage capability.
  126. Ohtani Masami (Kyoto JPX) Nishida Masami (Kyoto JPX), Wafer transfer apparatus having an improved wafer transfer portion.
  127. Dennis L. Goodwin ; Eric R. Wood ; Ivo Raaijmakers, Wafer transfer arm stop.
  128. Wiesler Mordechai (Lexington MA) Weiss Mitchell (Haverford PA), Wafer transfer system having rotational capability.
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