초록 ▼

A process for etching a glass surface employing a mask film comprising a porous support layer having a resist area impervious to a glass etchant composition and non-resist areas pervious to the glass etching composition. The glass surface to be etched is cleaned and wetted with a basic aqueous solut

A process for etching a glass surface employing a mask film comprising a porous support layer having a resist area impervious to a glass etchant composition and non-resist areas pervious to the glass etching composition. The glass surface to be etched is cleaned and wetted with a basic aqueous solution. The backside of the mask is applied to the wetted glass surface and squeeged thereon to form a film of the basic aqueous solution to detachably secure the mask to the glass surface. The glass etchant composition is applied to the face of the mask to cover all the non-resist areas to etch the underlying glass. After the glass has been etched to the desired degree, the mask together with substantially all of the glass etchant composition is removed from the glass surface. The surface of the glass is then washed with the aqueous basic solution to remove any residual glass etchant composition.

대표청구항 ▼

A process for permanently marking a glass surface comprising the steps of: (a) wiping a glass surface with a basic aqueous cleaning solution; (b) wiping the backside of a mask having a face and a back side with the basic aqueous cleaning solution, said mask comprising a porous support layer permeabl

A process for permanently marking a glass surface comprising the steps of: (a) wiping a glass surface with a basic aqueous cleaning solution; (b) wiping the backside of a mask having a face and a back side with the basic aqueous cleaning solution, said mask comprising a porous support layer permeable to a glass etchant composition and a resist material impervious to said glass etchant composition, said mask having resist areas impervious to a glass etchant composition where said porous support layer is impregnated with said resist material, and non-resist areas pervious to said glass etchant composition where said porous support layer is substantially free of said resist material, said resist areas and non-resist areas in combination delineating a marking pattern on the mask to be etched into the glass surfce; (c) applying the back side of said mask to the wiped glass surface to bind the mask to said glass surface; (d) applying a glass etchant composition operative to etch glass to the face of the mask to cover all of the non-resist areas of the mask with the glass etchant composition for a time operative for the glass etchant composition to etch the marking pattern into the surface of the glass; and (e) removing the mask from the glass surface.