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Apparatus for treating articles with solution to remove solids and then filtering the solution 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-003/00
  • B01D-023/24
출원번호 US-0023981 (1987-03-10)
발명자 / 주소
  • Striedieck Walter J. (Port Matilda PA)
출원인 / 주소
  • Chemcut Corporation (State College PA 02)
인용정보 피인용 횟수 : 28  인용 특허 : 7

초록

Apparatus is provided for treating articles, such as printed circuit boards and the like, by removing solid particles, such as polymer resists, by a chemical action such as a stripping action, with the chemical action being provided by spraying a solution onto the articles. The removed particles are

대표청구항

An apparatus for chemically removing solid matter from articles being treated by a chemical treatment liquid and filtering from the treatment liquid the solid matter thus removed, said apparatus including a treatment chamber, article supporting means in an upper portion of said chamber for supportin

이 특허에 인용된 특허 (7)

  1. Holm Kurt Anders (Skoghall SW) Norstrom Gote Jan Wilhelm (Karlstad SW), Apparatus for cleaning the surface of plate-shaped objects by means of at least two brushes.
  2. Eidschun Charles D. (Clearwater FL), Chemical process apparatus.
  3. Lee Arleigh (201 Fish House Rd. Broadalbin NY 12025), Circular filter device.
  4. Goffredo Daniel L. (Riverton NJ) Shakley Conrad Dale (Spring Mills PA), Connecting modules for an etching system.
  5. Bolton Joseph A. (Summit La. Glens Falls NY 12801) Brown Armond A. (Burgoyne Rd. ; #6 ; at the Point Saratoga Spa. NY 12866), Filter with top spray.
  6. Anderson Joseph W. (Bellevue WA), Flow-through coalescing separator.
  7. De Santis Benito (2601 W. Olive St. Burbank CA 91505), Spray equipment cleaner.

이 특허를 인용한 특허 (28)

  1. Jablonsky Julius James, Apparatus and method for recovering photoresist developers and strippers.
  2. Harry C. DeLonge ; Michael G. Costello ; Karen L. Asher, Apparatus and method for sanitizing and cleaning a filter system.
  3. Harry C. DeLonge ; Michael G. Costello ; Karen L. Asher, Apparatus and method for sanitizing and cleaning a filter system.
  4. Olashuk Kenneth R. (Follansbee WV) Shields Lester R. (Weirton WV), Apparatus for continuous flat-rolled steel strip cleansing and finishing operations.
  5. Baron David T. (Worcestershire GB2) Taylor Alexander R. (Ayrshire GB2) Johal Kuldip S. (Willenhall GB2), Apparatus for removing resist particles from stripping solutions for printed wireboards.
  6. Breunsbach Rex (Clackamas OR) Austen Paul M. (Milwaukie OR), Apparatus to clean printed circuit boards.
  7. Inkster Guy William,CAX, Bead cleansing system.
  8. Münzer, Jan; Stolte, Thomas; Till, Volker, Beverage bottling plant for filling bottles with a liquid beverage filling material, and a method for the operation thereof.
  9. Otsuka Shigeo (3-3-32 ; Kigawa-Higashi ; Yodogawa Osaka JPX), Chloro-fluoro-carbon liquid jetting immersion cleaning apparatus.
  10. Hoser,Jurgen, Cleaning device for the shaving head of a dry shaving apparatus.
  11. Olashuk Kenneth R., Continuous particle separation operation.
  12. Schneider Reinhard,DEX ; Baron David T.,GBX, Film-stripping process.
  13. Martinez-Mugica Fernando (Larrasoloeta ; 5 48200 Durango ESX), Filter system for liquids with particles in suspension.
  14. Sharkey James P. (106 Cambon Ave. St. James NY 11780), Filtration apparatus and method for removing particulate contaminants from commercial laundry waste water.
  15. Olashuk Kenneth R. ; Shields Lester R., Flat-rolled steel strip continuous cleansing methods.
  16. Bartimote John K. (54 Allen Crescent Traralong 3844 ; Victoria AUX), Material handling apparatus and method.
  17. Betancourt, Ernest; Brigante, Jeffrey A.; Gale, Glenn W.; Salamon, Jr., William, Method and apparatus for recovery of semiconductor wafers from a chemical tank.
  18. Brombin, Tiziano, Method and apparatus for sterilizing containers of plastic material and for filling them with liquid substances.
  19. Backman Sune (Gtavgen 10B Djursholm S-182 61 SEX), Method of filtering the effluent from a wire EDM process.
  20. James C. McClure ; Thomas W. McNally ; Francis A. Marks ; J. Leland Strange, Parts washing system.
  21. James C. McClure ; Thomas W. McNally ; J. Leland Strange, Parts washing system.
  22. McClure James C. ; McNally Thomas W., Parts washing system.
  23. McClure James C. ; McNally Thomas W., Parts washing system.
  24. McClure James C. ; McNally Thomas W. ; Marks Francis A. ; Strange J. Leland, Parts washing system.
  25. Strange J. Leland, Parts washing system.
  26. Gupta Anand ; Karlsrud Chris ; Gopalan Periya ; Trojan Daniel R. ; Cunnane Jeffrey B. ; MacErnie Jon R., Post-CMP wet-HF cleaning station.
  27. Griffin Bruce M. (St. Charles MO) Werkema Robert G. (St. Louis MO) Watt Elbert D. (Godfrey IL), Tank arrangement particularly designed for chemical milling operations.
  28. Lin,Chi An; Kuo,Kuo Hung; Kuan,Ta Hsin; Lo,Po Yi; Yang,Ming Hsien, Wet etching apparatus.
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