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Fluidized bed reactor with microwave heating system for preparing high-purity polycrystalline silicon 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01J-008/42
출원번호 US-0008899 (1987-01-30)
우선권정보 KR-0009938 (1985-12-28)
발명자 / 주소
  • Yoon Poong (Seoul KRX) Song Yongmok (Chungnam KRX)
출원인 / 주소
  • Korea Research Institute of Chemical Technology (Chungnam KRX 03)
인용정보 피인용 횟수 : 51  인용 특허 : 4

초록

An apparatus for preparing high-purity polycrystalline silicon is constructed with a heating applicator, a vertical fluidized bed quartz reactor within the applicator, a microwave generator, microwave guide tubes for conveying microwaves from the microwave generator to the applicator, a reacting gas

대표청구항

An apparatus for the preparation of high-purity polycrystalline silicon, comprising applicator means, an elongated reactor means installed within said applicator means with the longitudinal axis of the reactor means being vertically disposed, said reactor means having an upper portion a microwave sh

이 특허에 인용된 특허 (4)

  1. Ingle William M. (Phoenix AZ) Darnell Robert D. (Phoenix AZ) Thompson Stephen W. (Rosenberg TX), Ascending differential silicon harvesting means and method.
  2. Setty H. S. N. (Dalas TX) Yaws Carl L. (Dalas TX) Martin Bobby Ray (Plano TX) Wangler Daniel Joseph (Irving TX), Method of operating a quartz fluidized bed reactor for the production of silicon.
  3. Chitre Sanjeev R. (Reseda CA), Silicon growth technique and apparatus using controlled microwave heating.
  4. Padovani Francois A. (Dallas TX), Silicon seed production process.

이 특허를 인용한 특허 (51)

  1. Kambe, Nobuyuki; Chiruvolu, Shivkumar, Dispersions of blends of silicon nanoparticles and silica nanoparticles.
  2. Kambe, Nobuyuki; Chiruvol, Shivkumar, Dispersions of silicon nanoparticles.
  3. Kambe, Nobuyuki, Dispersions of submicron doped silicon particles.
  4. Kambe, Nobuyuki; Chiruvolu, Shivkumar, Dispersions of submicron doped silicon particles.
  5. Weidhaus, Dieter; Crössmann, Ivo; Schreieder, Franz, Dust-free and pore-free, high-purity granulated polysilicon.
  6. Nuber, Dirk; Ströder, Michael; Stockhausen, Werner; Beyzavi, Ali-Naghi; Formanek, Lothar; Hirsch, Martin, Fluidized bed method and plant for the heat treatment of solids containing titanium.
  7. Jiang, Wenwu; Jiang, Hongfu; Jiang, Limin; Wang, Xiaojun, Fluidized bed reactor and a process using same to produce high purity granular polysilicon.
  8. Jiang, Wenwu; Jiang, Hongfu; Wu, Feng; Zhong, Zhenwu; Chen, Wenlong, Fluidized bed reactor and a process using same to produce high purity granular polysilicon.
  9. Weckesser, Dirk; Hertlein, Harald, Fluidized bed reactor and method for producing granular polysilicon.
  10. Hertlein, Harald; Hauswirth, Rainer; Weidhaus, Dieter, Granular polycrystalline silicon and production thereof.
  11. Kim, Hee Young; Yoon, Kyung Koo; Park, Yong Ki; Choi, Won Choon, High-pressure fluidized bed reactor for preparing granular polycrystalline silicon.
  12. Kim, Hee Young; Yoon, Kyung Koo; Park, Yong Ki; Choi, Won Choon, High-pressure fluidized bed reactor for preparing granular polycrystalline silicon.
  13. Murzin Ivan Herman ; Ramamurthi Ram K., Inductively coupled plasma powder vaporization for fabricating integrated circuits.
  14. Nuber, Dirk; Stockhausen, Werner; Ströder, Michael, Method and apparatus for heat treatment in a fluidized bed.
  15. Kim, Young Hee; Park, Yong-Ki, Method and apparatus for preparing polysilicon granules.
  16. Orth, Andreas; Hirsch, Martin; Weber, Peter, Method and plant for producing low-temperature coke.
  17. Freytag, Jochen; Hirsch, Martin; Ströder, Michael, Method and plant for the conveyance of fine-grained solids.
  18. Hirsch, Martin; Stroeder, Michael; Weber, Peter, Method and plant for the heat treatment of solids containing iron oxide.
  19. Hirsch, Martin; Ströder, Michael; Weber, Peter, Method and plant for the heat treatment of solids containing iron oxide.
  20. Orth, Andreas; Hirsch, Martin; Weber, Peter; Sneyd, Stuart; Nuber, Dirk; Stroeder, Michael, Method and plant for the heat treatment of solids containing iron oxide.
  21. Orth, Andreas; Hirsch, Martin; Weber, Peter; Sneyd, Stuart; Nuber, Dirk; Ströder, Michael, Method and plant for the heat treatment of solids containing iron oxide using a fluidized bed reactor.
  22. Kim, Hee Young; Yoon, Kyung Koo; Park, Yong Ki; Choi, Won Choon, Method for continual preparation of polycrystalline silicon using a fluidized bed reactor.
  23. Kim, Hee Young; Yoon, Kyung Koo; Park, Yong Ki; Choi, Won Choon, Method for continual preparation of polycrystalline silicon using a fluidized bed reactor.
  24. Evangellos Vekris ; Nainesh J. Patel ; Murali Hanabe, Method for doping spherical semiconductors.
  25. Akiyama Shoji,JPX ; Otsuka Toru,JPX ; Habuka Hitoshi,JPX, Method for fabrication of thin film.
  26. Kim, Hee Young; Yoon, Kyung Koo; Park, Yong Ki; Choi, Won Choon, Method for preparing granular polycrystalline silicon using fluidized bed reactor.
  27. Auner, Norbert, Method for the production of silicon from silyl halides.
  28. Auner, Norbert, Method for the production of silicon from silyl halides.
  29. Bi, Xiangxin; Kambe, Nobuyuki; Gardner, James T.; Mosso, Ronald J.; Chiruvolu, Shivkumar; Kumar, Sujeet; McGovern, William E., Methods for synthesizing submicron doped silicon particles.
  30. Nuber, Dirk; Stroeder, Michael; Stockhausen, Werner; Formanek, Lothar; Hirsch, Martin; Beyzavi, Ali-Naghi, Plant for the heat treatment of solids containing titanium.
  31. Li, Weidong; Soeda, Masaya; Pengra-Leung, Gina Elizabeth; Chiruvolu, Shivkumar, Printable inks with silicon/germanium based nanoparticles with high viscosity alcohol solvents.
  32. Hirsch, Martin; Stockhausen, Werner; Stroeder, Michael, Process and plant for producing metal oxide from metal compounds.
  33. Hirsch, Martin; Stockhausen, Werner; Ströder, Michael, Process and plant for producing metal oxide from metal compounds.
  34. Schreieder Franz,DEX ; Kim Hee Young,KRX, Process for preparing highly pure silicon granules.
  35. Sanjurjo Angel (San Jose CA), Process for producing crystalline silicon ingot in a fluidized bed reactor.
  36. Weidhaus,Dieter; Hayduk,Alexander, Radiation-heated fluidized-bed reactor.
  37. Chu, Xi, Reactor and method for producing high-purity granular silicon.
  38. Filtvedt, Josef; Filtvedt, Werner O., Reactor and method for production of silicon.
  39. Weckesser, Dirk, Reactor and process for preparing granular polysilicon.
  40. Chu, Xi, Reactor for producing high-purity granular silicon.
  41. Weckesser, Dirk, Reactor for producing polycrystalline silicon and method for removing a silicon-containing layer on a component of such a reactor.
  42. Lord Stephen M. ; Milligan Robert J., Silicon deposition reactor apparatus.
  43. Kambe, Nobuyuki, Silicon nanoparticle dispersions.
  44. Kambe, Nobuyuki, Silicon nanoparticle dispersions.
  45. Chiruvolu, Shivkumar; Altman, Igor; Frey, Bernard M.; Li, Weidong; Liu, Guojun; Lynch, Robert B.; Pengra-Leung, Gina Elizabeth; Srinivasan, Uma, Silicon/germanium nanoparticle inks, laser pyrolysis reactors for the synthesis of nanoparticles and associated methods.
  46. Chiruvolu, Shivkumar; Altman, Igor; Frey, Bernard M.; Li, Weidong; Liu, Guojun; Lynch, Robert B.; Pengra-Leung, Gina Elizabeth; Srinivasan, Uma, Silicon/germanium nanoparticles and inks having low metal contamination.
  47. Hieslmair, Henry; Chiruvolu, Shivkumar; Du, Hui, Silicon/germanium oxide particle inks and processes for forming solar cell components and for forming optical components.
  48. Hieslmair, Henry; Dioumaev, Vladimir K.; Chiruvolu, Shivkumar; Du, Hui, Silicon/germanium particle inks, doped particles, printing and processes for semiconductor applications.
  49. Auner, Norbert; Holl, Sven; Bauch, Christian; Lippold, Gerd; Deltschew, Rumen, Solid polysilane mixtures.
  50. Freeman Alex, System and method for plasma etch on a spherical shaped device.
  51. Netsu, Shigeyoshi; Oguro, Kyoji; Shimizu, Takaaki; Kurosawa, Yasushi; Kume, Fumitaka, System for producing polycrystalline silicon, apparatus for producing polycrystalline silicon, and process for producing polycrystalline silicon.
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