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Closure apparatus for a high pressure vessel 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B65D-045/32
출원번호 US-0159924 (1988-02-24)
발명자 / 주소
  • Noe Renato R. (Union City NJ)
출원인 / 주소
  • Public Service Electric & Gas Company (Newark NJ 02)
인용정보 피인용 횟수 : 34  인용 특허 : 6

초록

Closure apparatus for a high pressure vessel includes a closure member having a hemispherically concave interior and a stepped cylindrical exterior portion. The stepped cylindrical exterior portion is adapted to complement the cross-sectional shape of flanged sector blocks so that the sector blocks

대표청구항

Closure apparatus for a high pressure vessel having a cylindrical interior channel wall including a circumferential groove, the closure apparatus comprising: a closure member and a plurality of flanged sector blocks, the closure member having an outer rim adapted to slidably engage the cylindrical i

이 특허에 인용된 특허 (6)

  1. Platts Douglas J. (Worksop GB2), Closure for pipes or pressure vessels.
  2. Ravicchio Donald P. (Appolo PA) Geary Carl H. (Greensburg PA), End wall closure apparatus.
  3. Summerfield James D. (Saginaw MI), Groove structure for a retaining ring.
  4. Tsou John L. (Berlin WI), High pressure feedwater heater closure assembly.
  5. Tsou John L. (Berlin WI), High pressure feedwater heater closure assembly.
  6. Korner Jorg-Peter (Hagen DEX) Jekat Herbert (Trostberg DEX), High-pressure vessel with inner closure.

이 특허를 인용한 특허 (34)

  1. Yokomizo,Kenji, Apparatus and method of securing a workpiece during high-pressure processing.
  2. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of a workpiece.
  3. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Apparatus for supercritical processing of multiple workpieces.
  4. Lollis, Jack D; Lollis, Corey M; Howerton, Richard A, Closure for pressure vessels.
  5. Jones,William Dale, Control of fluid flow in the processing of an object with a fluid.
  6. Sheydayi,Alexei; Sutton,Thomas, Gate valve for plus-atmospheric pressure semiconductor process vessels.
  7. Jones, William D., High pressure fourier transform infrared cell.
  8. Biberger, Maximilian A.; Layman, Frederick Paul; Sutton, Thomas Robert, High pressure processing chamber for semiconductor substrate.
  9. Biberger,Maximilian A.; Layman,Frederick Paul; Sutton,Thomas Robert, High pressure processing chamber for semiconductor substrate.
  10. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  11. Jones,William Dale, High-pressure processing chamber for a semiconductor wafer.
  12. Tseronis, James A.; Mortiz, Heiko D.; Chandra, Mohan; Farmer, Robert B.; Jafri, Ijaz H.; Talbott, Jonathan, Inverted pressure vessel with horizontal through loading.
  13. Robert B Farmer ; Jonathan A. Talbott ; Mohan Chandra ; James A. Tseronis ; Heiko D. Moritz, Inverted pressure vessel with shielded closure mechanism.
  14. Sheydayi,Alexei, Method and apparatus for clamping a substrate in a high pressure processing system.
  15. Goshi,Gentaro, Method and apparatus for cooling motor bearings of a high pressure pump.
  16. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method and apparatus for supercritical processing of multiple workpieces.
  17. Parent,Wayne M.; Goshi,Gentaro, Method and system for cooling a pump.
  18. Parent,Wayne M., Method and system for determining flow conditions in a high pressure processing system.
  19. Parent, Wayne M.; Geshell, Dan R., Method and system for passivating a processing chamber.
  20. Hansen,Brandon; Lowe,Marie, Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid.
  21. Bratsch, Christian, Method for producing filled and reclosable pressure vessels.
  22. Kawamura,Kohei; Asano,Akira; Miyatani,Koutarou; Hillman,Joseph T.; Palmer,Bentley, Method for supercritical carbon dioxide processing of fluoro-carbon films.
  23. Biberger, Maximilian Albert; Layman, Frederick Paul; Sutton, Thomas Robert, Method for supercritical processing of multiple workpieces.
  24. Biberger,Maximilian Albert; Layman,Frederick Paul; Sutton,Thomas Robert, Method of supercritical processing of a workpiece.
  25. Sheydayi,Alexei, Non-contact shuttle valve for flow diversion in high pressure systems.
  26. Sheydayi,Alexei, Pressure energized pressure vessel opening and closing device and method of providing therefor.
  27. Wuester,Christopher D., Process flow thermocouple.
  28. Richard J. LaConte, Quick release and fastening cover.
  29. Mullee, William H., Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process.
  30. Heiko D Moritz ; Jonathan A. Talbott ; Mohan Chandra ; James A. Tseronis ; Ijaz Jafri, Supercritical fluid drying system and method of use.
  31. Gale,Glenn; Hillman,Joseph T.; Jacobson,Gunilla; Palmer,Bentley, System and method for processing a substrate using supercritical carbon dioxide processing.
  32. Jacobson,Gunilla; Yellowaga,Deborah, Treatment of a dielectric layer using supercritical CO.
  33. Kevwitch, Robert, Treatment of substrate using functionalizing agent in supercritical carbon dioxide.
  34. Sheydayi,Alexei, Vacuum chuck utilizing sintered material and method of providing thereof.
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