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Method for producing ultra-high purity, optical quality, glass articles

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C03B-037/023
  • C03B-037/016
  • C03B-019/06
출원번호 US-0052619 (1987-05-20)
발명자 / 주소
  • Schermerhorn Paul M. (Painted Post NY) Teter Michael P. (Corning NY) Vandewoestine Robert V. (Corning NY)
출원인 / 주소
  • Corning Glass Works (Corning NY 02)
인용정보 피인용 횟수 : 27  인용 특허 : 13

초록

A method for producing ultra-high purity, optical quality, glass articles is disclosed which involves: (1) forming a gel from a silicon-containing organic compound, such as, TEOS; (2) drying the gel to produce granules having a mean particle size of less than about 1 millimeter; (3) fully sintering

대표청구항

A method for producing a fused silica glass article comprising the steps of: (a) preparing a solution which contains at least one silicon-containing organic compound having the formula Si(OR)4 or SiR(OR)3, where R is an alkyl group; (b) polymerizing the silicon in the solution to form a SiO2 gel; (c

이 특허에 인용된 특허 (13)

  1. Tuller Harold W. (Long Valley NJ) Nussbaum Ralph W. (West Orange NJ), Encapsulant compositions based on anhydride-hardened epoxy resins.
  2. Johnson ; Jr. David W. (Pluckemin NJ) MacChesney John B. (Lebanon NJ) Rabinovich Eliezer M. (Summit NJ), Fabrication of sintered high-silica glasses.
  3. Rosler Robert K. (Toledo OH) Gore Donald B. (Swanton OH) Riddell Malcolm N. (Perrysburg OH) Hunt Earl R. (Toledo OH), Flash resistant epoxy encapsulating composition and process for preparing same.
  4. Okamoto Haruo (Joetsu JPX) Yamada Motoyuki (Joetsu JPX), Method for molding a fused quartz glass block.
  5. Bihuniak Peter P. (Corning NY) Brandes Lewis H. (Campbell NY) Guile Donald L. (Horseheads NY), Method of densifying metal oxides.
  6. Bihuniak Peter P. (Corning NY) Brandes Lewis H. (Campbell NY) Guile Donald L. (Horseheads NY), Method of densifying metal oxides.
  7. Scherer George W. (Big Flats NY), Method of forming glass or ceramic article.
  8. Matsuo Nobutaka (Nagano JPX) Itoh Yoshitaka (Nagano JPX) Kanbe Sadao (Nagano JPX) Osafune Haruo (Nagano JPX) Motoki Masanobu (Nagano JPX), Method of preparing silica glass.
  9. Bruning Rolf (Bruchkbel DEX) Breidenbach Poul-Erik (Bruchkbel DEX) Cibis Norbert (Frankfurt am Main DEX) Aldinger Fritz (Rodenbach DEX) Werdecker Waltraud (Hanau DEX), Method of producing a bubble-free vitreous material.
  10. Gonczy Stephen T. (Mount Prospect IL) Lawson Randy J. (Arlington Heights IL) Rosen Bruce I. (Skokie IL), Preparation of ceramics.
  11. Satoh Shin (Iruma JPX) Susa Kenzo (Tokyo JPX) Matsuyama Iwao (Sagamihara JPX) Suganuma Tsuneo (Tokorozawa JPX), Process for producing optical glass.
  12. Toki Motoyuki (Suwa JPX) Kanbe Sadao (Suwa JPX) Miyashita Satoru (Suwa JPX) Takeuchi Tetsuhiko (Suwa JPX), Silica glass formation process.
  13. Blaszyk ; Paul E. ; Shoup ; Robert D. ; Wein ; William J., Silica-containing porous bodies of controlled pore size.

이 특허를 인용한 특허 (27)

  1. Dawes, Steven B.; Fiacco, Richard M.; Hrdina, Kenneth E.; Wasilewski, Michael H., Doped silica glass articles and methods of forming doped silica glass boules and articles.
  2. Dawes,Steven B.; Fiacco,Richard M.; Hrdina,Kenneth E.; Wasilewski,Michael H., Doped silica glass articles and methods of forming doped silica glass boules and articles.
  3. Bowden,Bradley F.; Bishop,Seann; Hrdina,Kenneth E.; Wight, Jr.,John F., EUV lithography glass structures formed by extrusion consolidation process.
  4. Thomas P. Seward, III, Fused silica having high resistance to optical damage.
  5. Allan, Douglas C.; Borrelli, Nicholas F.; Powell, William R.; Seward, III, Thomas P.; Smith, Charlene M., Method for determining laser-induced compaction in fused silica.
  6. Jeong, Won-II; Oh, Jeong-Hyun; Bang, Jung-Je; Baik, Young-Min, Method for fabricating silica glass using sol-gel process.
  7. Bernas,James J.; Bowden,Bradley F.; Hrdina,Kenneth E., Method for making extreme ultraviolet lithography structures.
  8. Chiurlo Paolo,ITX ; Cogliati Guido,ITX ; Costa Lorenzo,ITX, Method for preparing optical components and devices in their final or nearly final dimensions, and products obtained th.
  9. Ochs, Stefan, Method for producing iron-doped silica glass.
  10. Borrelli, Nicholas F.; Danielson, Paul S.; Heslin, Michael R.; Logunov, Stephan L.; Moll, Johannes; Schermerhorn, Paul M.; Smith, Charlene M., Method of inducing transmission in optical lithography preforms.
  11. Allan Douglas C. ; Powell William R. ; Borrelli Nicholas F. ; Seward ; III Thomas P. ; Smith Charlene M., Method pre-compaction of fused silica.
  12. Lum, Richard M; Mixon, David A; Monberg, Eric M; Trevor, Dennis J, Multi-pass sintering of a sol-gel body through a hot zone.
  13. Frey Volker (Burghausen DEX) Pachaly Bernd (Burghausen DEX) Zeller Norbert (Burghausen DEX), Process for preparing highly porous glass-ceramic molded parts.
  14. Ito Masumi (Yokohama JPX) Danzuka Toshio (Yokohama JPX) Ohga Yuichi (Yokohama JPX) Hoshino Sumio (Yokohama JPX) Tsuchiya Ichiro (Yokohama JPX), Process for production of glass preform for optical fiber including consolidating in a furnace with a temperature gradie.
  15. Seward ; III Thomas P., Production of fused silica having high resistance to optical damage.
  16. Sato, Tatsuhiro; Kaitou, Takahiro; Fujinoki, Akira; Kato, Toshiyuki; Segawa, Tohru; Yoshida, Nobumasa, Production process of synthetic quartz glass.
  17. Berkey, George Edward; Moore, Lisa Anne; Yu, Charles Chunzhe, Projection lithography photomask blanks, preforms and method of making.
  18. Berkey George Edward ; Moore Lisa Anne ; Yu Charles Chunzhe, Projection lithography photomask blanks, preforms and methods of making.
  19. Berkey, George Edward; Moore, Lisa Anne; Pierson, Michelle Diane, Projection lithography photomasks and method of making.
  20. Berkey, George Edward; Moore, Lisa Anne; Pierson, Michelle Diane, Projection lithography photomasks and method of making.
  21. Berkey George Edward ; Moore Lisa Anne ; Pierson Michelle Diane, Projection lithography photomasks and methods of making.
  22. Shaw Richard D. (“Dunedin” ; High Elms Road ; Downe ; Orpington ; Kent GB2), Settable systems for the manufacture of refractories and ceramics.
  23. Borrelli Nicholas F. ; Seward ; III Thomas P. ; Smith Charlene, Silica with low compaction under high energy irradiation.
  24. Lisa A. Moore ; Charlene Smith, Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass.
  25. Moore Lisa A. ; Smith Charlene, Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass.
  26. Moore, Lisa A.; Smith, Charlene M., Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass.
  27. Moore, Lisa A.; Smith, Charlene M., Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass.
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