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Surface pit detection system and method 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G18
출원번호 US-0047889 (1987-05-08)
발명자 / 주소
  • Quackenbos George S. (Newburyport MA) Ormsby Jay L. (Salem NH) Chase Eric T. (Andover MA) Broude Sergey V. (Acton MA) Nishine Koichi (Westford MA)
출원인 / 주소
  • QC Optics, Inc. (Burlington MA 02)
인용정보 피인용 횟수 : 60  인용 특허 : 5

초록

An apparatus and method for uniquely detecting pits on a smooth surface by irradiating an area of the surface; separately sensing radiation scattered from the surface in the near-specular region indicative of a pit and in the far-specular region indicative of a flaw and producing signals representat

대표청구항

A detection system for uniquely defining pits on a smooth surface comprising: means for directing a beam of radiation to a surface; means for separately sensing radiation scattered from the surface in the near-specular region and in the far-specular region and producing signals representative thereo

이 특허에 인용된 특허 (5)

  1. Steigmeier Edgar F. (Hedingen CHX) Auderset Heinrich (Horgen CHX), Apparatus and method for detecting defects and dust on a patterned surface.
  2. Clarke Graham M. (Edinburgh GB6), Inspection apparatus.
  3. Peoples Patrick J. (Intervale NH), Linear flaw detector.
  4. Leser Jacques F. (Montpellier FRX), Process and apparatus for the detection of flaws in transparent sheets of glass.
  5. Yamaji Hiroshi (Yokohama JPX) Ogawa Shigeru (Yokohama JPX) Okumura Katsuya (Yokohama JPX), Surface condition judging apparatus.

이 특허를 인용한 특허 (60)

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  2. Vaez-Iravani, Mehdi; Rzepiela, Jeffrey Alan; Treadwell, Carl; Zeng, Andrew; Fiordalice, Robert, Defect detection system.
  3. Vaez-Iravani, Mehdi; Rzepiela, Jeffrey Alan; Treadwell, Carl; Zeng, Andrew; Fiordalice, Robert, Defect detection system.
  4. Xu,James J.; Lee,Ken K., Defect review system with 2D scanning and a ring detector.
  5. Vaez Iravani,Mehdi, Inspection system for integrated applications.
  6. Evan F. Cromwell ; Johann F. Adam, Laser scatterometer with adjustable beam block.
  7. Horai Izuo,JPX, Magnetic disk testing method and surface defect testing device.
  8. Jann Peter C. ; Burt ; Jr. George A. ; Libove Joel, Method and apparatus for detecting defects on a disk using interferometric analysis on reflected light.
  9. Bose Chinmoy B. (Green Brook NJ), Method and apparatus for differentiating a planar textured surface from a surrounding background.
  10. Eremin Yuri A.,RUX ; Stover John C. ; Scheer Craig A., Method and apparatus for distinguishing particles from subsurface defects on a substrate using polarized light.
  11. Treves, David; O'Dell, Thomas A., Method and apparatus for inspecting substrates.
  12. Treves, David; O'Dell, Thomas A.; Hsieh, Yung-Chieh, Method and apparatus for inspecting substrates.
  13. Chou, Mau-Song; Arenberg, Jonathan W.; Menard, Mark A., Method and apparatus for inspection of multi-junction solar cells.
  14. Chou,Mau Song; Arenberg,Jonathan W.; Menard,Mark A.; Chung,Thomas T., Method and apparatus for inspection of semiconductor devices.
  15. Treves,David; O'Dell,Thomas A., Method and apparatus for reducing or eliminating stray light in an optical test head.
  16. Treves,David; O'Dell,Thomas A., Method and apparatus for selectively providing data from a test head to a processor.
  17. Iwata Tetsuya,JPX ; Tsuchida Shigeru,JPX, Method and apparatus of surface inspection of a disk.
  18. John C. Stover ; Yuri A. Eremin RU, Method for discriminating between holes in and particles on a film covering a substrate.
  19. Kaupp, Ansgar, Method for examining rotationally symmetrical objects.
  20. Imaino Wayne Isami ; Juliana ; Jr. Anthony ; Latta Milton Russell ; Lee Charles H. ; Leung Wai Cheung ; Rosen Hal J. ; Brannon James Hammond, Method of producing a calibration disk.
  21. Shortt, David; Biellak, Stephen; Belyaev, Alexander, Methods and systems for inspection of a wafer.
  22. Sopori, Bhushan; Rupnowski, Przemyslaw; Ulsh, Michael, On-line, continuous monitoring in solar cell and fuel cell manufacturing using spectral reflectance imaging.
  23. Sopori,Bhushan L.; Hambarian,Artak, Optic probe for semiconductor characterization.
  24. Mueller William R. ; Gensel Lewis R. ; Van Hoof Peter, Optical disc inspection equalization system and method.
  25. Broude Sergey V. (Newton Centre MA) Allen Nicholas (Bedford MA) Boudour Abdu (West Newton MA) Chase Eric (Carlisle MA) Johnson Carl (Tewksbury MA) Miller Pascal (North Chelmsford MA) Ormsby Jay (Sale, Optical inspection system and method for detecting flaws on a diffractive surface.
  26. Zaman, Kamran Uz; Pietrzykowski, Stanley; Pietrantoni, Dante; Gottschalk, Kenneth; Schichler, Richard, Plural light source and camera to detect surface flaws.
  27. Marxer Norbert,LIX ; Gross Kenneth P. ; Altendorfer Hubert ; Kren George, Process and assembly for non-destructive surface inspections.
  28. Marxer, Norbert; Gross, Kenneth P.; Altendorfer, Hubert; Kren, George, Process and assembly for non-destructive surface inspections.
  29. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
  30. Marxer,Norbert; Gross,Kenneth P.; Altendorfer,Hubert; Kren,George, Process and assembly for non-destructive surface inspections.
  31. Treves,David; O'Dell,Thomas A., Robotic system for optically inspecting workpieces.
  32. Mehdi Vaez-Iravani ; Stanley Stokowski ; Guoheng Zhao, Sample inspection system.
  33. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  34. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  35. Vaez Iravani,Mehdi; Stokowski,Stanley; Zhao,Guoheng, Sample inspection system.
  36. Vaez-Iravani Mehdi ; Stokowski Stanley ; Zhao Guoheng, Sample inspection system.
  37. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  38. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  39. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  40. Vaez-Iravani, Mehdi; Stokowski, Stanley; Zhao, Guoheng, Sample inspection system.
  41. Zaman,Kamran; Pietrantoni,Dante; Gottschalk,Ken; Pietrzykowski,Stanley, Specular surface flaw detection.
  42. Xu,James J.; Lee,Ken K., Surface inspection system.
  43. Imaino Wayne Isami ; Juliana ; Jr. Anthony ; Latta Milton Russell ; Lee Charles H. ; Leung Wai Cheung ; Rosen Hal J., Surface inspection tool.
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  45. Imaino Wayne Isami ; Juliana ; Jr. Anthony ; Latta Milton Russell ; Lee Charles H. ; Leung Wai Cheung ; Rosen Hal J., Surface inspection tool.
  46. Imaino Wayne Isami ; Juliana ; Jr. Anthony ; Latta Milton Russell ; Lee Charles H. ; Leung Wai Cheung ; Rosen Hal J., Surface inspection tool.
  47. Imaino, Wayne Isami; Juliana, Anthony; Latta, Milton Russell; Lee, Charles H.; Leung, Wai Cheung; Rosen, Hal J.; Meeks, Steven; Sonningfeld, Richard, Surface inspection tool.
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  49. Imaino Wayne Isami ; Latta Milton Russell, Surface inspection tool using reflected and scattered light.
  50. Green, Paul M.; Robinson, Bob C.; O'Brien, Eric Christian; York, Elmer Tyree, System and method for detecting manufacturing marks on sputtered disks.
  51. Biellak, Steve; Stokowski, Stanley E.; Vaez-Iravani, Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
  52. Biellak,Steve; Stokowski,Stanley E.; Vaez Iravani,Mehdi, Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination.
  53. Treves,David; O'Dell,Thomas A., Test head for optically inspecting workpieces.
  54. Treves,David; O'Dell,Thomas A., Test head for optically inspecting workpieces.
  55. Treves,David; O'Dell,Thomas A., Test head for optically inspecting workpieces.
  56. Treves,David; O'Dell,Thomas A., Test head for optically inspecting workpieces comprising a lens for elongating a laser spot on the workpieces.
  57. Fossey Michael E. ; Stover John C., Wafer inspection system for distinguishing pits and particles.
  58. Fossey Michael E. ; Stover John C. ; Clementi Lee D., Wafer inspection system for distinguishing pits and particles.
  59. Fossey, Michael E.; Stover, John C.; Clementi, Lee D., Wafer inspection system for distinguishing pits and particles.
  60. Peale, David; Duran, Carlos; Hess, Harald, Waveguide based parallel multi-phaseshift interferometry for high speed metrology, optical inspection, and non-contact sensing.

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