초록 ▼

There is disclosed an apparatus for forming deposited film which forms deposited film on a substrate by introducing a gaseous starting material for formation of deposited film and a gaseous oxidizing agent having the property of oxidation action for said gaseous starting material through separate ro

There is disclosed an apparatus for forming deposited film which forms deposited film on a substrate by introducing a gaseous starting material for formation of deposited film and a gaseous oxidizing agent having the property of oxidation action for said gaseous starting material through separate routes respectively into a film forming space to thereby effect chemical contact therebetween, comprising one or two or more chambers for formation of deposited film and one or two or more etching chambers for etching at least one of said substrate and the deposited film formed on the substrate connected to one another.

대표청구항 ▼

An apparatus for forming a deposited film on a substrate by a chemical reaction between a gaseous starting material for formation of the deposited film and a gaseous oxidizing agent having the property of oxidation action on said gaseous starting material, comprising: at least one deposition chamber

An apparatus for forming a deposited film on a substrate by a chemical reaction between a gaseous starting material for formation of the deposited film and a gaseous oxidizing agent having the property of oxidation action on said gaseous starting material, comprising: at least one deposition chamber in which said deposited film is formed, said chamber including a gaseous releasing means having a first orifice for introducing said gaseous starting material and a second orifice for introducing said gaseous oxidizing agent, said first and second orifices positioned adjacent one another so as to create a reaction mixture between said gaseous starting material and gaseous oxidizing agent; and at least one etching chamber in which the etching of said substrate or the deposited film formed thereon occurs, said etching chamber including a gas orifice with a narrowed tip to dispense etchant gas.