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Apparatus and method for removing minute particles from a substrate

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-007/00
출원번호 US-0116194 (1987-11-03)
발명자 / 주소
  • Whitlock Walter H. (Peapack NJ) Weltmer
  • Jr. William R. (Murray Hill NJ) Clark James D. (Mountainside NJ)
출원인 / 주소
  • The BOC Group, Inc. (Montvale NJ 02)
인용정보 피인용 횟수 : 74  인용 특허 : 2

초록

Apparatus for removing small particles from a substrate comprising a source of fluid carbon dioxide, a first means for expanding a portion of the fluid carbon dioxide into a first mixture containing gaseous carbon dioxide and fine droplets of liquid carbon dioxide, coalescing means for converting th

대표청구항

Apparatus for removing small particles from a substrate comprising: (a) A source of pure fluid carbon dioxide under pressure and having an enthalpy of below about 135 BTU per pound based on an enthalpy of zero at 150 psia for a saturated liquid, so that a solid fraction will form upon expansion of t

이 특허에 인용된 특허 (2)

  1. Fong Calvin C. (Beverly Hills CA) Altizer John W. (Simi Valley CA) Arnold Vernon E. (Fillmore CA) Lawson John K. (Granada Hills CA), Blasting machine utilizing sublimable particles.
  2. Ichinoseki Tsuyoshi ((Yoshizawa Jutaku E-206) No. 844-2 ; Yoshizawa-cho Mito-shi ; Ibaragi-ken JPX) Kato Hirobumi ((Hyakujuen Jutaku D-302) No. 2617-2 ; Motoyoshida-cho Mito-shi ; Ibaragi-ken JPX) Mi, Cleaning method.

이 특허를 인용한 특허 (74)

  1. Narayanswami Natraj ; Wagener Thomas J. ; Siefering Kevin L. ; Cavaliere William A., Aerodynamic aerosol chamber.
  2. Rose Peter H. ; Sferlazzo Piero ; van der Heide Robert G., Aerosol surface processing.
  3. Rose Peter H. ; Sferlazzo Piero ; van der Heide Robert G., Aerosol surface processing.
  4. Mesher Terry Bernard,CAX, Apparatus for and method for accelerating fluidized particulate matter.
  5. Brandt Werner V. ; Bowers Charles W., Apparatus for cleaning and testing precision components of hard drives and the like.
  6. Lewis, Paul E.; Ahmadi, Goodarz; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Apparatus for cleaning surfaces substantially free of contaminants.
  7. Hahn, Christopher; Lee, Hanjoo, Apparatus for ejecting fluid onto a substrate and system and method incorporating the same.
  8. Layden Lawrence M. (Stanton NJ), Apparatus for removing small particles from a substrate.
  9. Seasly, Elaine E.; Seasly, Zachariah A., Automated non-contact cleaning.
  10. Lehnig, Tony R., Blast media fragmenter.
  11. Kipp,Jens Werner, Blasting method and apparatus.
  12. Bowers, Charles W.; Varghese, Ivin; Balooch, Mehdi, CO2 nozzles.
  13. Bowers, Charles W.; Varghese, Ivin; Balooch, Mehdi, CO2 nozzles.
  14. Leitch, Kelly; Hartigan, Gavin; D'Orazio, Robert, CO2 recovery process for supercritical extraction.
  15. Krone-Schmidt Wilfried, CO2jet spray nozzles with multiple orifices.
  16. Goenka Lakhi Nandlal (Ann Arbor MI), CO2 cleaning nozzle and method with enhanced mixing zones.
  17. Goenka Lakhi N. (Ann Arbor MI), CO2 nozzle and method for cleaning pressure-sensitive surfaces.
  18. Yoshida, Takashi; Iwasaki, Motoaki; Yano, Tatsuro; Habaya, Kurao; Shiroma, Takahiro, Cleaning method and apparatus.
  19. White, Lonnie Dale, Cryogenic cleaning methods for reclaiming and reprocessing oilfield tools.
  20. Becker David Scott ; Hanestad Ronald J. ; Thomes Gregory P. ; Weygand James F. ; Zimmerman Larry D., Eliminating stiction with the use of cryogenic aerosol.
  21. Mesher Terry (Victoria CAX), Fluidized stream accelerator and pressuiser apparatus.
  22. Caimi Raoul E. B. ; Lin Feng-Nan ; Thaxton Eric A., Gas-liquid supersonic cleaning and cleaning verification spray system.
  23. Han, Yong-Pil; Sawin, Herbert H., HF vapor phase wafer cleaning and oxide etching.
  24. Leitch, Kelly; Silveira, Danny, High pressure CO2 purification and supply system.
  25. Leitch,Kelly; Silveira,Danny, High pressure COpurification and supply system.
  26. Tada Masuo (Yao JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX), Ice particle forming and blasting device.
  27. Compen, Rene Theodorus Petrus; Ottens, Joost Jeroen, Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus.
  28. Rufin Denis A. (Hinsdale IL), Method and apparatus for in situ cleaning of excimer laser optics.
  29. Boyd Robert Walter ; Pike Jessi Lynn ; Cheng David C. ; Leitch Kelly, Method and apparatus for producing a pressurized high purity liquid carbon dioxide stream.
  30. Bras, Dominique; Buil, José, Method and device for injecting two-phase COin a transfer gaseous medium.
  31. Johnson,Michael Clinton; Heim,Carl Joseph; Billingham,John Fredric; Malczewski,Mark Leonard, Method for analyzing impurities in carbon dioxide.
  32. Hendrix Walter A. ; Montero Gerardo A. ; Smith C. Brent ; Butcher Donald L., Method for introducing dyes and other chemicals into a textile treatment system.
  33. Hendrix, Walter A.; Montero, Gerardo A.; Smith, C. Brent; Butcher, Donald L., Method for introducing dyes and other chemicals into a textile treatment system.
  34. Mains Jr. Gilbert L. (2642 Joelle Dr. Toledo OH 43617), Method for material removal.
  35. Bran, Mario E., Method for megasonic processing of an article.
  36. Foster Christopher A. (Clinton TN) Fisher Paul W. (Heiskell TN), Method for producing pellets for use in a cryoblasting process.
  37. Charles W. Bowers, Method for selective metal film layer removal using carbon dioxide jet spray.
  38. Bran,Mario E., Method of cleaning a side of a thin flat substrate by applying sonic energy to the opposite side of the substrate.
  39. Smith Carl Brent ; Montero Gerardo A. ; Hendrix Walter A., Method of dyeing hydrophobic textile fibers with colorant materials in supercritical fluid carbon dioxide.
  40. Bran, Mario E., Method of manufacturing integrated circuit devices.
  41. White, Lonnie Dale, Methods and apparatus for cleaning oilfield tools.
  42. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid; Compton, Keith H., Methods for cleaning surfaces substantially free of contaminants.
  43. Ahmadi, Goodarz; Lewis, Paul E.; Tannous, Adel George; Makhamreh, Khalid, Methods for cleaning utilizing multi-stage filtered carbon dioxide.
  44. Boumerzoug,Mohamed; Tannous,Adel George, Methods for residue removal and corrosion prevention in a post-metal etch process.
  45. Boumerzoug, Mohamed; Tannous, Adel George; Makhamreh, Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  46. Boumerzoug,Mohamed; Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and cleaning surfaces substantially free of contaminants.
  47. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  48. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  49. Tannous,Adel George; Makhamreh,Khalid, Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants.
  50. Benson, Peter A., Non-chemical, non-optical edge bead removal process.
  51. Benson, Peter A., Non-chemical, non-optical edge bead removal process.
  52. Kunkel, Pam; Narayanswani, Natraj; Patrin, John C., Nozzle design for generating fluid streams useful in the manufacture of microelectronic devices.
  53. Jackson,David P., Nozzle device and method for forming cryogenic composite fluid spray.
  54. Yoon, Cheol-Nam, Nozzle for spraying sublimable solid particles entrained in gas for cleaning surface.
  55. Yoon,Cheol Nam, Nozzle for spraying sublimable solid particles entrained in gas for cleaning surface.
  56. Lloyd Daniel L. (Mason OH), Phase change injection nozzle.
  57. Smith, Carl Brent; Hendrix, Walter A.; Butcher, Donald L., Process for treating textile substrates.
  58. Rose Peter H. ; Sferlazzo Piero, Processing a surface.
  59. Tada Masuo (Yao JPX) Hata Takeki (Kobe JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX), Processing apparatus for semiconductor wafers.
  60. Tada Masuo (Yao JPX) Hata Takeki (Kobe JPX) Fukumoto Takaaki (Itami JPX) Ohmori Toshiaki (Itami JPX), Processing apparatus for semiconductor wafers.
  61. Tada, Masuo; Hata, Takeki; Fukumoto, Takaaki; Ohmori, Toshiaki, Processing method for semiconductor wafers.
  62. Wagener Thomas J. ; Siefering Kevin L. ; Kunkel Pamela A. ; Weygand James F. ; Thomes Gregory P., Rotatable and translatable spray nozzle.
  63. Bowen Howard S. ; Lee Richard M. ; Bowen John H., Solid/gas carbon dioxide spray cleaning system.
  64. Wilkinson Steven Paul ; Schweighardt Frank Kenneth ; Robeson Lloyd Mahlon, Surfactants for use in liquid/supercritical CO.sub.2.
  65. Bran, Mario E., System for megasonic processing of an article.
  66. Cates Michael C. ; Hamm Richard R. ; Hoogerwerl John D. ; Lewis Michael W. ; Schmitz Wayne N., System for removing a coating from a substrate.
  67. Butterbaugh, Jeffery W.; Mbanaso, Chimaobi W.; Becker, David Scott, Systems and methods for treating substrates with cryogenic fluid mixtures.
  68. Butterbaugh, Jeffery W.; Mbanaso, Chimaobi W.; Becker, David Scott, Systems and methods for treating substrates with cryogenic fluid mixtures.
  69. Mbanaso, Chimaobi W.; Butterbaugh, Jeffery W.; Becker, David Scott, Systems and methods for treating substrates with cryogenic fluid mixtures.
  70. Patrin John C. ; Heitzinger John M., Treating substrates by producing and controlling a cryogenic aerosol.
  71. Bran, Mario E., Wafer cleaning.
  72. Bran, Mario E., Wafer cleaning.
  73. Bran Mario E., Wafer cleaning system.
  74. Bran Mario E., Wafer cleaning system.
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