초록 ▼

A process and apparatus that may be used for the production of diamond and doped diamond films at high rates by activated reactive vapor deposition. Carbon is evaporated in a vacuum chamber in the presence of atomic hydrogen containing plasma to form diamond precursors which then deposit on a substr

A process and apparatus that may be used for the production of diamond and doped diamond films at high rates by activated reactive vapor deposition. Carbon is evaporated in a vacuum chamber in the presence of atomic hydrogen containing plasma to form diamond precursors which then deposit on a substrate located within the vacuum chamber.

대표청구항 ▼

A process for depositing films comprising diamond on a substrate, said process comprising the steps of: supporting a substrate in a vacuum; evaporating a source of carbon to produce a carbon vapor in a zone between the source of carbon and the substrate; introducing a hydrogen containing gas into sa

A process for depositing films comprising diamond on a substrate, said process comprising the steps of: supporting a substrate in a vacuum; evaporating a source of carbon to produce a carbon vapor in a zone between the source of carbon and the substrate; introducing a hydrogen containing gas into said zone; accelerating electrons from an electron source into said zone to ionize said carbon vapor and hydrogen containing gas to form carbon-hydrogen complex precursor molecules in said zone, depositing said precursor molecules from said zone onto said substrate; and maintaining said substrate at a temperature sufficient to dissociate said deposited precursor molecules to form said film comprising diamond.