초록 ▼

This invention comprises a method by which a carbon based film is deposited by ion beam deposition upon and chemically bonded to a substrate article. The carbon based film deposited by the method of this invention comprises an atomic initial layer, adjacent to and chemically bonded by carbide bondin

This invention comprises a method by which a carbon based film is deposited by ion beam deposition upon and chemically bonded to a substrate article. The carbon based film deposited by the method of this invention comprises an atomic initial layer, adjacent to and chemically bonded by carbide bonding to the substrate surface, which is overgrown by a carbon layer that assumes the true diamond microstructure or, alternatively, a carbon structure which more closely approximates the microstructure and physical, chemical and electrical properties of true diamond than has heretofore been attained by prior diamond-like films. The method by which the chemically bonded diamond or diamond-like film is deposited upon a substrate comprises: positioning an electrically grounded substrate having an atomically clean surface within a deposition chamber maintained at a pressure of 1×10-9 torr or less and impinging upon the atomically clean substrate surface a 12C+ion beam having a beam energy in the range 10-300 eV and using a dose no greater than that defined by region AB of FIG. 1 in order to form a carbon layer bound to said substrate by carbide bonding; thereafter the 12C+Ion beam is increased in dose to a level at least as great as that defined by of region BC of FIG. 1 and impingement of such 12C+ion beam on the substrate is continued for a time sufficient to overlay said substrate carbide bonded carbon layer with a diamond layer of the thickness desired.

대표청구항 ▼

A method for depositing a chemically bonded carbon based film having a diamond structure on a substrate, comprising the steps of: positioning an electrically grounded substrate within a deposition chamber; preparing the substrate to have an atomically clean surface and maintaining said surface in an

A method for depositing a chemically bonded carbon based film having a diamond structure on a substrate, comprising the steps of: positioning an electrically grounded substrate within a deposition chamber; preparing the substrate to have an atomically clean surface and maintaining said surface in an atomically clean state during deposition by maintaining the pressure within the deposition chamber at or below 1×10-9 torr; generating from a carbon containing material a source of gaseous ions in an ionization region maintained at 1-300eV above the grounded substrate; directing ions from the ionization region into electromagnetic mass analyser; selecting 12C+ions to exit from the mass analyser; directing said 12C+ion beam through a bend by passing said beam through a parallel plate condenser to eliminate line-of-sight neutral particles from said ion beam; directing said 12C+ion beam through a decelerator lens immediately in front of said substrate; impinging said ion beam on the atomically clean substrate surface at a beam energy sufficient to form a carbon layer bound to said substrate surface by carbide bonding; and impinging said ion beam on said carbide bound carbon layer at a beam energy of at least about 10 eV for a time sufficient to overlay said carbide bound carbon layer with a diamond layer of the thickness desired, said diamond layer being substantially free from included hydrogen or oxygen.