초록 ▼

An apparatus to provide a vaporized reactant for chemical-vapor deposition is disclosed. The apparatus employs a heated quartz reactant reservoir, quartz lines, a quartz valve and, optionally, a purge system. The apparatus may also include a quartz refill reservoir and heating means for the quartz l

An apparatus to provide a vaporized reactant for chemical-vapor deposition is disclosed. The apparatus employs a heated quartz reactant reservoir, quartz lines, a quartz valve and, optionally, a purge system. The apparatus may also include a quartz refill reservoir and heating means for the quartz lines. The purge system may be a vacuum purge system.

대표청구항 ▼

An apparatus suitable for providing vaporized reactant for chemical-vapor deposition, said apparatus comprising: a. a heated quartz reactant reservoir for providing a vaporized reactant for chemical-vapor deposition, said reactant reservoir having a reactant reservoir carrier gas inlet and a vaporiz

An apparatus suitable for providing vaporized reactant for chemical-vapor deposition, said apparatus comprising: a. a heated quartz reactant reservoir for providing a vaporized reactant for chemical-vapor deposition, said reactant reservoir having a reactant reservoir carrier gas inlet and a vaporized reactant outlet; b. a carrier gas header having a carrier gas inlet conduit, a first carrier gas outlet conduit and a second carrier gas outlet conduit, said first carrier gas outlet conduit connecting at its end opposite end carrier gas header with said reactant reservoir carrier gas inlet; c. a first carrier gas valve in said first carrier gas outlet conduit and a second carrier gas valve in said second carrier gas outlet conduit; d. a reactant outlet conduit connecting at one end to said vaporized reactant outlet; e. a quartz valve comprising a T-shaped body with the straight-through portion of said T-shaped body being in vertical orientation, the bottom opening of said straight-through portion comprising the bottom quartz valve inlet and the top opening of said straight-through portion comprising the top quartz valve inlet, said bottom quartz valve inlet connecting with the end of said reactant outlet conduit opposite the end connected to said vaporized reactant outlet and said top quartz valve inlet connecting to said second carrier gas outlet conduit at the end opposite the end connecting to said carrier gas header, the third opening of said T-shaped body comprising the quartz valve outlet, said quartz valve having a seat around its internal periphery in said straight-through portion below said quartz valve outlet; f. a moveable quartz check in said quartz valve body which rests on said seat and forms a seal therewith, thereby enabling the passage of carrier gas and vaporized reactant upwardly into said bottom quartz valve inlet and out of said quartz valve outlet when said first carrier gas valve is open and said second carrier gas valve is closed and enabling the passage of carrier gas downwardly into said top quartz valve inlet and out of said quartz valve outlet, but not out of said bottom quartz valve inlet, when said first carrier gas valve is closed and said second carrier gas valve is open; and g. a reactant vapor delivery conduit connecting at one end with said quartz valve outlet and at the other end with the chemical-vapor deposition vessel in which chemical-vapor deposition is to be effected.