초록 ▼

A composition of a metallic compound represented by the formula MT, and G is provided by sputtering an MxG100-x target. M is a metal selected from the group of titanium, hafnium, zirconium, and mixtures thereof. T is selected from the group of N, C, and mixtures thereof. G is a metal selected from t

A composition of a metallic compound represented by the formula MT, and G is provided by sputtering an MxG100-x target. M is a metal selected from the group of titanium, hafnium, zirconium, and mixtures thereof. T is selected from the group of N, C, and mixtures thereof. G is a metal selected from the group of gold, platinum, and palladium. X is an integer from about 65 to about 95. Also provided are substances coated with the composition and process for depositing the composition on substrates.

대표청구항 ▼

A process for depositing a layer containing particles of a metal G in a matrix of a metallic compound represented by the formula MT onto a substrate which comprises: providing a substrate; providing a target source of MxG100-x separate from said substrate; subjecting said target source to reactive s

A process for depositing a layer containing particles of a metal G in a matrix of a metallic compound represented by the formula MT onto a substrate which comprises: providing a substrate; providing a target source of MxG100-x separate from said substrate; subjecting said target source to reactive sputtering with a gas containing a source of N, C, or mixtures thereof and flowing in the direction towards the substrate to thereby deposit said layer on said substrate wherein; M is a metal selected from the group of titanium, hafnium, zirconium, and mixtures thereof; T is selected from the group of N, C, and mixtures thereof; G is a metal selected from the group of gold, platinum, and palladium; X is an integer from about 65 to about 95.