|국가/구분||United States(US) Patent 등록|
|미국특허분류(USC)||422/62 ; 422/83 ; 239/34|
|발명자 / 주소|
|출원인 / 주소|
|인용정보||피인용 횟수 : 5 인용 특허 : 1|
A device adapted to generate a gas flow containing a precise amount of impurities. The device comprises a membrane through which an impurity gas peremeates and mixing means to make a mixture of said impurity gas and a vector gas sweeping said membrane. The pressure of said mixture is substantially constant, but adjustable, to enhance the accuracy of the device.
A gas generating device adapted to generate a gas flow containing a precise amount of an impurity gas in a vector gas, said device comprising a scrubber means adapted to receive a stream of vector gas containing gaseous impurities and to deliver the stream free of about any trace of said gaseous impurities, a metering means connected to the scrubber means for receiving said impurity free stream of vector gas therefrom and discharging said impurity free vector gas at a precise massic flowrate, said impurity gas generating means having an output adapted to...