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A composition for making low K dielectric layers which is an admixture of finely divided solids consisting essentially of (a) lead-free amorphous borosilicate glass containing Al2O3, a mixture of oxides of alkali metals, alkaline earth metals or mixtures thereof containing Li2O and (b) an inorganic

A composition for making low K dielectric layers which is an admixture of finely divided solids consisting essentially of (a) lead-free amorphous borosilicate glass containing Al2O3, a mixture of oxides of alkali metals, alkaline earth metals or mixtures thereof containing Li2O and (b) an inorganic filler selected from quartz and mixtures of quartz with 0.5-5% wt. inert oxides having a TCE equal to or greater than 7.

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A composition for making low K dielectric layers which is an admixture of finely divided solids consisting essentially of: (a) 55-75% wt. lead-free amorphous borosilicate glass in which the weight ratio of B2O3 to SiO2 is 0.22-0.55 containing 0.5-1.5% wt. Al2O3, 1.5-4.0% wt. of a mixture of oxides o

A composition for making low K dielectric layers which is an admixture of finely divided solids consisting essentially of: (a) 55-75% wt. lead-free amorphous borosilicate glass in which the weight ratio of B2O3 to SiO2 is 0.22-0.55 containing 0.5-1.5% wt. Al2O3, 1.5-4.0% wt. of a mixture of oxides of alkali metals, alkaline earth metals or mixtures thereof, which oxide mixture contains 0.3-1.0% wt. Li2O, basis total glass; and (b) 45-25% wt. of a ceramic filler selected from alpha-quartz and mixtures thereof with 0.5-5.0% wt. inert oxides having a TCE equal to or greater than 7.