$\require{mediawiki-texvc}$

연합인증

연합인증 가입 기관의 연구자들은 소속기관의 인증정보(ID와 암호)를 이용해 다른 대학, 연구기관, 서비스 공급자의 다양한 온라인 자원과 연구 데이터를 이용할 수 있습니다.

이는 여행자가 자국에서 발행 받은 여권으로 세계 각국을 자유롭게 여행할 수 있는 것과 같습니다.

연합인증으로 이용이 가능한 서비스는 NTIS, DataON, Edison, Kafe, Webinar 등이 있습니다.

한번의 인증절차만으로 연합인증 가입 서비스에 추가 로그인 없이 이용이 가능합니다.

다만, 연합인증을 위해서는 최초 1회만 인증 절차가 필요합니다. (회원이 아닐 경우 회원 가입이 필요합니다.)

연합인증 절차는 다음과 같습니다.

최초이용시에는
ScienceON에 로그인 → 연합인증 서비스 접속 → 로그인 (본인 확인 또는 회원가입) → 서비스 이용

그 이후에는
ScienceON 로그인 → 연합인증 서비스 접속 → 서비스 이용

연합인증을 활용하시면 KISTI가 제공하는 다양한 서비스를 편리하게 이용하실 수 있습니다.

Sublimation of silicon carbide to produce large, device quality single crystals of silicon carbide 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/205
  • H01L-021/36
출원번호 US-0113565 (1987-10-26)
발명자 / 주소
  • Davis Robert F. (Raleigh NC) Carter
  • Jr. Calvin H. (Raleigh NC) Hunter Charles E. (Durham NC)
출원인 / 주소
  • North Carolina State University (Raleigh NC 02)
인용정보 피인용 횟수 : 99  인용 특허 : 8

초록

The present invention is a method of forming large device quality single crystals of silicon carbide. The sublimation process is enhanced by maintaining a constant polytype composition in the source materials, selected size distribution in the source materials, by specific preparation of the growth

대표청구항

A method of reproducibly controlling the growth of large single crystals of a single polytype of silicon carbide independent of the use of impurities as a primary mechanism for controlling polytype growth, and which crystals are suitable for use in producing electrical devices, the method comprising

이 특허에 인용된 특허 (8)

  1. Hsu George C. (La Crescenta CA) Rohatgi Naresh K. (W. Corine CA), Deposition method for producing silicon carbide high-temperature semiconductors.
  2. Connell G. A. Neville (Cupertino CA) Johnson Richard I. (Menlo Park CA), Method and apparatus for pretreating and depositing thin films on substrates.
  3. Vodakov Jury A. (prospekt Engelsa ; 69/1 ; kv. 35 Leningrad SU) Mokhov Evgeny N. (prospekt Energetikov ; 54 ; korpus 2 ; kv. 59 Leningrad SU), Method for epitaxial production of semiconductor silicon carbide utilizing a close-space sublimation deposition techniqu.
  4. Saga Toshihiko (Saitama JPX) Makita Tsuyoshi (Saitama JPX) Hirono Hisao (Saitama JPX) Inao Akitaka (Saitama JPX), Method of and apparatus for supplying powdery material.
  5. Knippenberg Wilhelmus Franciscus (Eindhoven NL) Verspui Gerrit (Eindhoven NL), Method of manufacturing silicon carbide crystals.
  6. Addamiano, Arrigo, Method of preparing single crystalline cubic silicon carbide layers.
  7. Rice Dale W. (Horseheads NY), Particulate material feeder for high temperature vacuum system.
  8. Steiger ; Roger A. ; Stroke ; Frederick G., Porous refractory metal boride article having dense matrix.

이 특허를 인용한 특허 (99)

  1. Barrett Donovan L. (Penn Hills Township PA) Seidensticker ; deceased Raymond G. (late of Forest Hills PA by Joan Seidensticker ; heir ) Hopkins Richard H. (Murrysville PA), Apparatus for growing large silicon carbide single crystals.
  2. Snyder, David W.; Everson, William J., Axial gradient transport apparatus and process.
  3. Rengarajan, Varatharajan; Brouhard, Bryan K.; Nolan, Michael C.; Zwieback, Ilya, Axial gradient transport growth process and apparatus utilizing resistive heating.
  4. Carter Calvin H. ; Tsvetkov Valeri F. ; Glass Robert C., Colorless silicon carbide crystals.
  5. Carter Calvin H. ; Tsvetkov Valeri F. ; Glass Robert C., Colorless silicon carbide gemstones.
  6. Larkin David J. ; Neudeck Philip G. ; Powell J. Anthony ; Matus Lawrence G., Compound semi-conductors and controlled doping thereof.
  7. Kordina Olle,SEX ; Hallin Christer,SEX ; Janzen Erik,SEX, Device and a method for epitaxially growing objects by CVD.
  8. Ellison Alex,SEX ; Kordina Olle,SEX ; Gu Chun-Yuan,SEX ; Hallin Christer,SEX ; Janzen Erik,SEX ; Tuominen Marko,SEX, Device for epitaxially growing objects and method for such a growth.
  9. Ryu, Sei-Hyung; Agarwal, Anant K.; Ward, Allan, Edge termination structures for silicon carbide devices.
  10. Singh, Ranbir, Epitaxial edge termination for silicon carbide Schottky devices and methods of fabricating silicon carbide devices incorporating same.
  11. Singh, Ranbir, Epitaxial edge termination for silicon carbide Schottky devices and methods of fabricating silicon carbide devices incorporating same.
  12. Barrett Donovan L. ; Hopkins Richard H., Feedstock arrangement for silicon carbide boule growth.
  13. Loboda, Mark; Parfeniuk, Christopher, Flat SiC semiconductor substrate.
  14. Loboda, Mark; Parfeniuk, Christopher, Flat SiC semiconductor substrate.
  15. Laia ; Jr. Joseph R. ; Carroll David W. ; Trkula Mitchell ; Anderson Wallace E. ; Valone Steven M., Fluidized bed deposition of diamond.
  16. Edmond, John Adam; Doverspike, Kathleen Marie; Kong, Hua-Shuang; Bergmann, Michael John, Group III nitride LED with silicon carbide cladding layer.
  17. Edmond,John Adam; Doverspike,Kathleen Marie; Bergmann,Michael John; Kong,Hua Shuang, Group III nitride contact structures for light emitting devices.
  18. Mueller, Stephan G.; Hobgood, Hudson M.; Tsvetkov, Valeri F., Halogen assisted physical vapor transport method for silicon carbide growth.
  19. Tischler Michael A. (83 Barclay Commons Danbury CT 06811), High brightness electroluminescent device, emitting in the green to ultraviolet spectrum, and method of making the same.
  20. Barrett Donovan L. (Penn Hills Twp. PA) Hobgood Hudson M. (Murrysville PA) McHugh James P. (Wilkins Twp. PA) Hopkins Richard H. (Murrysville PA), High resistivity silicon carbide substrates for high power microwave devices.
  21. Loboda, Mark; Chung, Gilyong, High voltage power semiconductor device on SiC.
  22. Loboda, Mark; Chung, Gilyong, High voltage power semiconductor devices on SiC.
  23. Edmond,John Adam; Doverspike,Kathleen Marie; Bergmann,Michael John; Kong,Hua Shuang, Inverted light emitting diode on conductive substrate.
  24. Snyder, David W.; Everson, William J., Large size single crystal seed crystal fabrication by intergrowth of tiled seed crystals.
  25. Edmond,John A.; Doverspike,Kathleen M.; Bergmann,Michael J.; Kong,Hua Shuang, Light emitting diode with degenerate coupling structure.
  26. Edmond, John A.; Doverspike, Kathleen M.; Bergmann, Michael J.; Kong, Hua Shuang, Light emitting diode with metal coupling structure.
  27. Powell, Adrian; Brady, Mark; Mueller, Stephan G.; Tsvetkov, Valeri F.; Leonard, Robert T., Low 1C screw dislocation 3 inch silicon carbide wafer.
  28. Powell, Adrian; Brady, Mark; Mueller, Stephan G.; Tsvetkov, Valeri F.; Leonard, Robert T., Low 1C screw dislocation 3 inch silicon carbide wafer.
  29. Powell, Adrian; Brady, Mark; Mueller, Stephan G.; Tsvetkov, Valeri F.; Leonard, Robert T., Low 1C screw dislocation 3 inch silicon carbide wafer.
  30. Powell,Adrian; Brady,Mark; Tsvetkov,Valeri F., Low basal plane dislocation bulk grown SiC wafers.
  31. Vodakov, Yury Alexandrovich; Mokhov, Evgeny Nikolaevich; Ramm, Mark Grigorievich; Roenkov, Alexandr Dmitrievich; Makarov, Yury Nikolaevich; Karpov, Sergei Yurievich; Ramm, Mark Spiridonovich; Temkin,, Low defect axially grown single crystal silicon carbide.
  32. Nobuyuki Nagato JP; Kunio Komaki JP; Isamu Yamamoto JP; Naoki Oyanagi JP; Shigehiro Nishino JP, Method and apparatus for producing silicon carbide single crystal.
  33. de Heer, Walt A.; Li, Xuebin; Sprinkle, Michael, Method and apparatus for producing ultra-thin graphitic layers.
  34. Tsvetkov,Valeri F.; Malta,David P., Method and apparatus for the production of silicon carbide crystals.
  35. Loboda, Mark; Drachev, Roman; Hansen, Darren; Sanchez, Edward, Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a support shelf which permits thermal expansion.
  36. Loboda, Mark, Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a supporting shelf which permits thermal expansion.
  37. Barrett Donovan L. ; Seidensticker ; deceased Raymond G. ; Hopkins Richard H., Method for growing large silicon carbide single crystals.
  38. Vodakov, Yury Alexandrovich; Mokhov, Evgeny Nikolaevich; Ramm, Mark Grigorievich; Roenkov, Alexandr Dmitrievich; Makarov, Yury Nikolaevich; Karpov, Sergei Yurievich; Ramm, Mark Spiridonovich; Temkin,, Method for growing single crystal silicon carbide.
  39. Hansen, Darren; Loboda, Mark; Manning, Ian; Moeggenborg, Kevin; Mueller, Stephan; Parfeniuk, Christopher; Quast, Jeffrey; Torres, Victor; Whiteley, Clinton, Method for manufacturing SiC wafer fit for integration with power device manufacturing technology.
  40. Hansen, Darren; Loboda, Mark; Manning, Ian; Moeggenborg, Kevin; Mueller, Stephan; Parfeniuk, Christopher; Quast, Jeffrey; Torres, Victor; Whiteley, Clinton, Method for manufacturing SiC wafer fit for integration with power device manufacturing technology.
  41. Jenny, Jason Ronald; Malta, David Phillip; Hobgood, Hudson McDonald; Mueller, Stephan; Tsvetkov, Valeri F., Method for producing semi-insulating resistivity in high purity silicon carbide crystals.
  42. Jenny, Jason Ronald; Malta, David Phillip; Hobgood, Hudson McDonald; Mueller, Stephan; Tsvetokov, Valeri F., Method for producing semi-insulating resistivity in high purity silicon carbide crystals.
  43. Stein Rene,DEX ; Rupp Roland,DEX ; Volkl Johannes,DEX, Method for producing silicon carbide monocrystals.
  44. Dmitriev Vladimir A. (Fuquay-Varina NC) Rendakova Svetlana V. (St. Petersburg RUX) Ivantsov Vladimir A. (St. Petersburg RUX) Carter ; Jr. Calvin H. (Cary NC), Method for reducing micropipe formation in the epitaxial growth of silicon carbide and resulting silicon carbide structu.
  45. Barrett Donovan L. ; Hopkins Richard H. ; McHugh James P. ; Hobgood Hudson McDonald, Method of making a low resistivity silicon carbide boule.
  46. Palmour John W., Method of obtaining high quality silicon dioxide passivation on silicon carbide and resulting passivated structures.
  47. Palmour John W. (Cary NC), Method of obtaining high quality silicon dioxide passivation on silicon carbide and resulting passivated structures.
  48. Palmour John W. (Cary NC), Method of obtaining high quality silicon dioxide passivation on silicon carbide and resulting passivated structures.
  49. Li, Si Yi; Zhu, Helen H.; Sadjadi, S. M. Reza; Pirkle, David R.; Bowers, James; Goss, Michael, Method of plasma etching of silicon carbide.
  50. Leonard, Robert Tyler; Powell, Adrian; Tsvetkov, Valeri F., Method of producing high quality silicon carbide crystal in a seeded growth system.
  51. Barrett Donovan L. ; Thomas Richard N. ; Seidensticker ; deceased Raymond G. ; Hopkins Richard H., Method of producing large diameter silicon carbide crystals.
  52. Sugiyama Naohiro,JPX ; Okamoto Atsuto,JPX ; Tani Toshihiko,JPX ; Kamiya Nobuo,JPX, Method of producing silicon carbide single crystal.
  53. Kitou Yasuo,JPX ; Sugiyama Naohiro,JPX ; Okamoto Atsuto,JPX ; Tani Toshihiko,JPX ; Kamiya Nobuo,JPX, Method of producing single crystals and a seed crystal used in the method.
  54. Kito Yasuo,JPX ; Kotanshi Youichi,JPX ; Onda Shoichi,JPX ; Hanazawa Tatuyuki,JPX ; Kitaoka Eiji,JPX, Method of producing single-crystal silicon carbide.
  55. Wang, Shaoping; Kopec, Aneta; Ware, Rodd Mitchell; Holmes, Sonia, Method of silicon carbide monocrystalline boule growth.
  56. Loboda, Mark, Method to reduce dislocations in SiC crystal growth.
  57. Mueller, Stephan, Methods of fabricating silicon carbide crystals.
  58. Mueller,Stephan, Methods of fabricating silicon carbide crystals.
  59. Mueller,Stephan, Methods of fabricating silicon carbide crystals.
  60. Ryu,Sei Hyung; Agarwal,Anant K., Methods of fabricating silicon carbide devices including multiple floating guard ring edge termination.
  61. Ryu, Sei-Hyung; Agarwal, Anant K., Methods of fabricating silicon carbide devices incorporating multiple floating guard ring edge terminations.
  62. Ryu, Sei-Hyung; Agarwal, Anant K., Methods of fabricating silicon carbide devices incorporating multiple floating guard ring edge terminations.
  63. Sumakeris, Joseph John; Hobgood, Hudson McDonald; Paisley, Michael James; Jenny, Jason Ronald; Carter, Jr., Calvin H.; Tsvetkov, Valeri Fedorovich, Methods of forming power semiconductor devices using boule-grown silicon carbide drift layers and power semiconductor devices formed thereby.
  64. Basceri, Cem; Khlebnikov, Yuri; Khlebnikov, Igor; Balkas, Cengiz; Silan, Murat N.; Hobgood, Hudson McD.; Carter, Jr., Calvin H.; Balakrishna, Vijay; Leonard, Robert T.; Powell, Adrian R.; Tsvetkov, Valeri T.; Jenny, Jason R., Micropipe-free silicon carbide and related method of manufacture.
  65. Basceri, Cem; Khlebnikov, Yuri; Khlebnikov, Igor; Balkas, Cengiz; Silan, Murat N.; Hobgood, Hudson McD.; Carter, Jr., Calvin H.; Balakrishna, Vijay; Leonard, Robert T.; Powell, Adrian R.; Tsvetkov, Valeri T.; Jenny, Jason R., Micropipe-free silicon carbide and related method of manufacture.
  66. Ryu,Sei Hyung; Agarwal,Anant K., Multiple floating guard ring edge termination for silicon carbide devices.
  67. Vodakov, Yury Alexandrovich; Mokhov, Evgeny Nikolaevich; Ramm, Mark Grigorievich; Roenkov, Alexandr Dmitrievich; Makarov, Yury Nikolaevich; Karpov, Sergei Yurievich; Ramm, Mark Spiridonovich; Temkin,, Niobium crucible fabrication and treatment.
  68. Leonard, Robert T.; Brady, Mark; Powell, Adrian, One hundred millimeter SiC crystal grown on off-axis seed.
  69. Jenny, Jason Ronald; Malta, David Phillip; Hobgood, Hudson McDonald; Mueller, Stephan Georg; Brady, Mark; Leonard, Robert Tyler; Powell, Adrian; Tsvetkov, Valerl F., One hundred millimeter high purity semi-insulating single crystal silicon carbide wafer.
  70. Hobgood,Hudson M.; Jenny,Jason R.; Malta,David Phillip; Tsvetkov,Valeri F.; Carter, Jr.,Calvin H.; Leonard,Robert Tyler; Fechko, Jr.,George J., One hundred millimeter single crystal silicon carbide wafer.
  71. Jenny, Jason Ronald; Malta, David Phillip; Hobgood, Hudson McDonald; Mueller, Stephan Georg; Brady, Mark; Leonard, Robert Tyler; Powell, Adrian; Tsvetkov, Valeri F., One hundred millimeter single crystal silicon carbide wafer.
  72. Leonard,Robert Tyler; Powell,Adrian; Mueller,Stephan Georg; Tsvetkov,Valeri F., One hundred millimeter single crystal silicon carbide wafer.
  73. Sullivan Thomas M., Polycrystalline silicon carbide ceramic wafer and substrate.
  74. Sullivan Thomas M., Polycrystalline silicon carbide ceramic wafer and substrate.
  75. Powell, Adrian; Tsvetkov, Valeri F.; Brady, Mark; Leonard, Robert T., Process for producing high quality large size silicon carbide crystals.
  76. Carter, Jr., Calvin H.; Jenny, Jason R.; Malta, David P.; Hobgood, Hudson M.; Tsvetkov, Valeri F.; Das, Mrinal K., Process for producing silicon carbide crystals having increased minority carrier lifetimes.
  77. Carter, Jr., Calvin H.; Jenny, Jason R.; Malta, David P.; Hobgood, Hudson M.; Tsvetkov, Valeri F.; Das, Mrinal K., Process for producing silicon carbide crystals having increased minority carrier lifetimes.
  78. Masashi Shigeto JP; Kotaro Yano JP; Nobuyuki Nagato JP, Process for producing silicon carbide single crystal and production apparatus therefor.
  79. Leonard, Robert Tyler; Powell, Adrian; Tsvetkov, Valeri F., Producing high quality bulk silicon carbide single crystal by managing thermal stresses at a seed interface.
  80. Robbins, Joshua; Seman, Michael, Production of bulk silicon carbide with hot-filament chemical vapor deposition.
  81. Tsvetkov,Valeri F.; Powell,Adrian; Mueller,Stephan Georg, Reduction of subsurface damage in the production of bulk SiC crystals.
  82. Mueller,Stephan; Powell,Adrian; Tsvetkov,Valeri F., Seed and seedholder combinations for high quality growth of large silicon carbide single crystals.
  83. Mueller,Stephan; Powell,Adrian; Tsvetkov,Valeri F., Seed and seedholder combinations for high quality growth of large silicon carbide single crystals.
  84. Jenny,Jason Ronald; Malta,David Phillip; Hobgood,Hudson McDonald; Mueller,Stephan Georg; Brady,Mark; Leonard,Robert Tyler; Powell,Adrian; Tsvetkov,Valeri F.; Fechko, Jr.,George J.; Carter, Jr.,Calvin H., Seeded single crystal silicon carbide growth and resulting crystals.
  85. Tsvetkov, Valeri F.; Hobgood, Hudson M.; Carter, Jr., Calvin H.; Jenny, Jason R., Semi-insulating silicon carbide produced by Neutron transmutation doping.
  86. Takahashi Jun,JPX ; Kanaya Masatoshi,JPX ; Fujiwara Yuichiro,JPX ; Ohtani Noboru,JPX, SiC single crystal and method for growth thereof.
  87. Loboda, Mark J.; Zhang, Jie, SiC substrate with SiC epitaxial film.
  88. Ryu, Sei-Hyung; Agarwal, Anant K., Silicon carbide junction barrier Schottky diodes with suppressed minority carrier injection.
  89. Sakaguchi,Yasuyuki; Takagi,Atsushi; Oyanagi,Naoki, Silicon carbide single crystal and method and apparatus for producing the same.
  90. Otsuki, Masashi; Maruyama, Takayuki; Endo, Shigeki; Kondo, Daisuke; Monbara, Takuya, Silicon carbide single crystal and production thereof.
  91. Emerson, David T., Substrate buffer structure for group III nitride devices.
  92. Helava,Heikki I.; Ramm,Mark G., Tantalum based crucible.
  93. Vodakov, Yury Alexandrovich; Mokhov, Evgeny Nikolaevich; Ramm, Mark Grigorievich; Roenkov, Alexandr Dmitrievich; Makarov, Yury Nikolaevich; Karpov, Sergei Yurievich; Ramm, Mark Spiridonovich; Temkin,, Tantalum crucible fabrication and treatment.
  94. Vodakov Yury Alexandrovich,RUX ; Mokhov Evgeny Nikolaevich,RUX ; Ramm Mark Grigorievich,RUX ; Roenkov Alexandr Dmitrievich,RUX ; Makarov Yury Nikolaevich,RUX ; Karpov Sergei Yurievich,RUX ; Ramm Mark, Technique for growing silicon carbide monocrystals.
  95. Powell,Adrian; Brixius,William H.; Leonard,Robert Tyler; McClure,Davis Andrew; Laughner,Michael, Three inch silicon carbide wafer with low warp, bow, and TTV.
  96. Emerson, David Todd; Abare, Amber Christine; Bergmann, Michael John, Ultraviolet light emitting diode.
  97. Emerson, David Todd; Abare, Amber Christine; Bergmann, Michael John, Ultraviolet light emitting diode.
  98. Emerson, David Todd; Abare, Amber Christine; Bergmann, Michael John, Ultraviolet light emitting diode.
  99. Liu,Deming; Fu,Ran, Wire clamping plate.
섹션별 컨텐츠 바로가기

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

AI-Helper 아이콘
AI-Helper
안녕하세요, AI-Helper입니다. 좌측 "선택된 텍스트"에서 텍스트를 선택하여 요약, 번역, 용어설명을 실행하세요.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.

선택된 텍스트

맨위로