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Cylinder cabinet piping system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-009/00
출원번호 US-0194841 (1988-05-17)
우선권정보 JP-0052457 (1988-03-05)
발명자 / 주소
  • Ohmi Tadahiro (Sendai JPX) Sugiyama Kazuhiko (Sendai JPX) Nakahara Fumio (Sendai JPX) Umeda Masaru (Tokyo JPX)
출원인 / 주소
  • Tadahiro OHMI (Miyagi-ken JPX 03)
인용정보 피인용 횟수 : 32  인용 특허 : 7

초록

The cylinder cabinet piping system of this invention has a system to supply a purge gas continuously to the main line, or to the main line and the branch line, thereby to prevent stagnation of gas in the purge gas line and to supply a super-high-purity gas to a process unit.

대표청구항

A cylinder cabinet piping system comprising: a process gas cylinder connected to at least one cylinder valve, a process system and at least one process gas supply line for supplying process gas from said at least one cylinder valve to said process system, a purge gas line and a main line, said main

이 특허에 인용된 특허 (7)

  1. Novak William J. (Guttenberg NJ) McClung Ronald G. (Bridgewater NJ), Apparatus for catalytic reforming with continuous sulfur removal.
  2. Queiser Horst (Maintal DEX), Method for treating gaseous nuclides and gas system for ventilating tanks containing radioactive liquid.
  3. Ura ; Mitsuru ; Ogawa ; Takuzo ; Suzuki ; Takaya ; Inoue ; Yosuke ; Nomur a ; Masayoshi, Method of doping inpurities.
  4. Williams, Todd E.; Desch, Steven M., Process gas controller.
  5. Lorenz, Andrew K.; Mobley, Scott R., Purging apparatus.
  6. Thorogood Robert Michael (London EN), Reversible heat exchanger or regenerator systems.
  7. Wienke Volker (Lbeck DEX) Scheel Heinrich (Lbeck DEX), Valve for a gas vessel.

이 특허를 인용한 특허 (32)

  1. Friedrichs, John; Gallagher, Lawrence; Gamboni, Christopher; Dukas, Georg; Cusimano, Richard, Air actuated valves switch and software control system for use with cryogenic liquid systems.
  2. Dietz James, Auto-switching gas delivery system utilizing sub-atmospheric pressure gas supply vessels.
  3. Kim Young-Roe,KRX ; Kim Hyun-Young,KRX ; Ko Hyun-kuk,KRX ; Koo Kyung-Burn,KRX ; Kim Ju-Wan,KRX ; Kim Hyong-Soo,KRX ; Park Dong-chan,KRX ; Na Dong-Geun,KRX, Filtering technique for CVD chamber process gases.
  4. Zheng Dao-Hong,GBX ; Irven John,GBX ; George Mark Allen, Gas control device and method of supplying gas.
  5. Zheng, Dao-Hong; Irven, John; George, Mark Allen, Gas control device and method of supplying gas.
  6. Zheng, Dao-Hong; Irven, John; George, Mark Allen, Gas control device and method of supplying gas.
  7. Dukas Sande ; Bailey Kevin ; Friedrichs John ; Cooper Robert ; Durkin David, Gas flow control device for high purity, highly corrosive gas service.
  8. Park Jae Won,KRX, Gas supply device for semiconductor manufacturing apparatus.
  9. Yokogi Kazuo,JPX, Gas supply system equipped with cylinders.
  10. Patterson David R., Hand powered liquid chemical measuring and dispensing system.
  11. Glick Jeffrey S. ; Fox Randolph M., Isolation and protection system for preventing a source of ultra-purified water from being contaminated with chemicals.
  12. Patterson David R., Liquid chemical measuring and distribution system.
  13. Patterson David R. (Fort Wayne IN), Liquid chemical measuring and distribution system.
  14. Patterson David R. (Fort Wayne IN), Liquid chemical measuring and distribution system.
  15. Arai, Mayumi; Yamazaki, Yoshiyuki, Liquid supply system, method for cleaning the same and vaporizer.
  16. Ted G. Yoshidome ; Tushar Mandrekar ; Nitin Khurana ; Anish Tolia, Method and apparatus for removing processing liquid from a processing liquid path.
  17. Jean-Marc Girard FR; James McAndrew FR; Eric Duchateau FR; Bertrand Lefevre FR, Method and device for filling a distribution line with corrosive gas.
  18. Beals, Scott A.; Hammer, Ronald D., Method and system for installing cable in pressurized pipelines.
  19. Ohmi Tadahiro,JPX, Method of forming a passivation film.
  20. Beals, Scott A.; Hammer, Ronald D.; Evans, Robert E.; Leeds, Kevin, Methods and systems for installing a pipeline within a pipeline.
  21. Beals, Scott A.; Hammer, Ronald D.; Evans, Robert E., Methods and systems for installing cable and conduit in pipelines.
  22. Beals, Scott A.; Hammer, Ronald D.; Evans, Robert E.; Leeds, Kevin, Methods and systems for installing cable and conduit in pipelines.
  23. Yelverton, Mark E.; Campbell, Mark A., Process line purge system and method.
  24. Hasegawa, Hiroyuki; Yamaoka, Tomonori; Ishihara, Yoshio; Masusaki, Hiroshi, Semiconductor manufacturing apparatus having a moisture measuring device.
  25. Hasegawa, Hiroyuki; Yamaoka, Tomonori; Ishihara, Yoshio; Masusaki, Hiroshi, Semiconductor manufacturing method and semiconductor manufacturing apparatus.
  26. Hasegawa,Hiroyuki; Yamaoka,Tomonori; Ishihara,Yoshio; Masusaki,Hiroshi, Semiconductor manufacturing method and semiconductor manufacturing apparatus.
  27. Pearlstein,Ronald Martin; Langan,John Giles; Zheng,Dao Hong; Irven,John; Hertzler,Benjamin Lee, Sub-atmospheric gas delivery method and apparatus.
  28. Donald M. Mintz ; Ted G. Yoshidome, Ultrasonic enhancement for solvent purge of a liquid delivery system.
  29. Arai, Mayumi; Yamazaki, Yoshiyuki, Vaporizer.
  30. Park, Kwang-Jin, Water hammer cleaning machine.
  31. DuRoss Ronald R. (Huntsville AL) Tucker William K. (Cherry Hill NJ), Zero dead-leg gas control apparatus and method.
  32. DuRoss Ronald R. ; Tucker William K., Zero dead-leg valve structure.
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