초록 ▼

In an apparatus for mounting discoidal substrates in a vacuum chamber for reactive ionic etching purposes, a substrate holder joined to a hollow shaft and a bottom plate under the substrate holder are disposed, which together with spacers and a clamping ring form a displaceable cage partially surrou

In an apparatus for mounting discoidal substrates in a vacuum chamber for reactive ionic etching purposes, a substrate holder joined to a hollow shaft and a bottom plate under the substrate holder are disposed, which together with spacers and a clamping ring form a displaceable cage partially surrounding the substrate holder and held coaxial to the latter, while the substrate which can be introduced through a gap in the lateral wall of the cage betwen two spacers can be laid on the substrate holder and locked in place there by the clamping ring after a relative movement between the substrate holder and the cage.

대표청구항 ▼

Apparatus for mounting workpieces, preferably discoidal substrates, in a vacuum chamber for the purpose of surface treatment, especially for reactive ionic etching or for coating by cathode sputtering comprising: a substrate support having a substrate support surface and an axis normal thereto, said

Apparatus for mounting workpieces, preferably discoidal substrates, in a vacuum chamber for the purpose of surface treatment, especially for reactive ionic etching or for coating by cathode sputtering comprising: a substrate support having a substrate support surface and an axis normal thereto, said support being axially stationary; a hollow shaft connected with said substrate support; a bottom plate disposed underneath the support; a plurality of spacers; clamping means extending approximately parallel to said substrate support surface; said bottom plate, said spacers and said clamping means forming an axially displaceable cage partially surrounding said support and held coaxial with said support and having a sidewall opening, while the substrate which can be introduced through said opening between an adjacent two of said spacers can be deposited on said substrate support surface and can be held there by said clamping means after axial movement of said cage.