IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0235054
(1988-08-23)
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발명자
/ 주소 |
- D\Agostino Riccardo (Bari ITX) Cramarossa Francesco (Bari ITX) Fracassi Francesco (Triggiano ITX) Illuzzi Francesca (Giovinazzo ITX) Caporiccio Gerardo (Milan ITX)
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출원인 / 주소 |
- Ausimont S.p.A. (Milan ITX 03)
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인용정보 |
피인용 횟수 :
9 인용 특허 :
0 |
초록
▼
Films, layers, tapes, plates, and similar structures of metal or of plastic materials, coated with thin polyfluorocarbon films. These films, tapes, etc., are characterized in that no other materials are interposed; the polyfluorocarbon films are adherent and not porous, and have controlled wettabili
Films, layers, tapes, plates, and similar structures of metal or of plastic materials, coated with thin polyfluorocarbon films. These films, tapes, etc., are characterized in that no other materials are interposed; the polyfluorocarbon films are adherent and not porous, and have controlled wettability characteristics. The polyfluorocarbons have the formula (CFx)n, wherein x is within the range of from 0.3 to 2.0, and are directly obtained on the substrate by the plasma-polymerization of gaseous streams of C2F6 and H2; C2F6 and C2F4; CF4 and H2; CF4 and C2F4; or of C2F4. The metal substrate may be, e.g., Al, Cu, Fe, tin-coated Fe, Si, noble metals and alloys thereof. The substrate of plastic materials may be constituted, e.g., by polytetrafluoroethylene, polypropylene, polyethylene, polyphenyloxide, polycarbonate, and neoprene.
대표청구항
▼
Process for coating films, layers, tapes, plates, and similar structures of metal or plastic materials with a thin polyfluorocarbon film characterized in that no other materials are interposed; the polyfluorocarbon films are adherent and non-porous, and have controlled wettability characteristics; t
Process for coating films, layers, tapes, plates, and similar structures of metal or plastic materials with a thin polyfluorocarbon film characterized in that no other materials are interposed; the polyfluorocarbon films are adherent and non-porous, and have controlled wettability characteristics; the polyfluorocarbons have the formula (CFx)n, where x is within the range of from 0.3 to 2.0, and are obtained directly on the substrate by the plasma-polymerization of gaseous streams of C2F6and H2; or C2F6 and C2F4; or CF4 and H2; or CF4 and C2F4; or C2F4; and wherein in said process a gaseous stream of C2F6 and H2; or C2F6 and C2F4; or CF4 and H2; or CF4 and C2F4; or C2F4 is passed through a reactor provided with two electrodes, one of which is connected to a radio frequency current generator, and the other of which is connected to ground; the substrate is placed on one of the electrodes; the pressure of the gaseous stream is within the range of from 0.1 to 2 torr; a power densitiy of at least 1 watt/cm2 is applied, the plasma being thus generated, and the consequent polymerization of the fluorocarbons being caused directly on the substrate, the temperature of which is maintained at values within the range of 20°to 120°C.
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