초록 ▼

Apparatus comprising a bakeable high vacuum system using cryopumps is disclosed. Auxiliary cooling means in thermal contact with the primary pumping stage of the cryopump remove heat from the cryopump, whereby the walls of the cryopump may be heated during operation of the cryopump, such that the cr

Apparatus comprising a bakeable high vacuum system using cryopumps is disclosed. Auxiliary cooling means in thermal contact with the primary pumping stage of the cryopump remove heat from the cryopump, whereby the walls of the cryopump may be heated during operation of the cryopump, such that the cryopump can be baked. This can result in substantially improved attainable pressure in the system.

대표청구항 ▼

Apparatus comprising an evacuable chamber and at least one cryopump for removing gas from the chamber, the cryopump comprising a mounting flange and a primary pumping stage, the primary pumping stage further comprising a primary condensor array, characterized in that the apparatus further comprises:

Apparatus comprising an evacuable chamber and at least one cryopump for removing gas from the chamber, the cryopump comprising a mounting flange and a primary pumping stage, the primary pumping stage further comprising a primary condensor array, characterized in that the apparatus further comprises: (a) a mounting ring having first and second faces, the first face being adapted for sealingly attaching to the mounting flange of the cryopump and the second face being adapted for sealingly attaching to the evacuable chamber; (b) a copper tube for conducting liquid nitrogen adjacent the primary condensor array, the copper tube having first and second ends and being configured substantially in the shape of a ring; (c) at least one low-temperature valve for controlling the flow of liquid nitrogen through the copper tube; (d) at least one purge valve for controlling the flow of purge gas for expelling residual liquid nitrogen from the copper tube; (e) at least one copper mounting block mounted to the copper tube and to the primary condensor array for thermally conductively attaching the copper tube to the primary condensor array; (f) a conduit for conducting liquid nitrogen from the low-temperature valve and purge gas from the purge valve through the mounting ring to the first end of the copper tube; and (g) a conduit for conducting liquid nitrogen and purge gas from the second end of the copper tube through the mounting ring.