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특허 상세정보

Method for manufacturing liquid crystal device with spacers formed by photolithography

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판) B44C-001/22    B29C-037/00    C03C-015/00    C03C-025/06   
미국특허분류(USC) 156/633 ; 156/632 ; 156/655 ; 156/668
출원번호 US-0222633 (1988-07-21)
우선권정보 JP-0196424 (1986-08-20)
발명자 / 주소
출원인 / 주소
인용정보 피인용 횟수 : 87  인용 특허 : 3
초록

An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this structure, the spacers can be in surface contact with the inside surfaces of the substrates on which electrode arrangement and active devices are formed.

대표
청구항

A method for manufacturing a liquid crystal device comprising the step of: forming electrode arrangement on the inside surfaces of a pair of substrates; coating the inside surface of one of said substrate with photocurable resin; exposing the photocurable resin coating to illumination except for the portions to be pillars and sealing member through a mask; removing the uncured portion of said photocurable resin with a solvent; and joining and uniting said pair of substrates; disposing a liquid crystal between said pair of substrates.

이 특허를 인용한 특허 피인용횟수: 87

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