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Method for manufacturing liquid crystal device with spacers formed by photolithography 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B44C-001/22
  • B29C-037/00
  • C03C-015/00
  • C03C-025/06
출원번호 US-0222633 (1988-07-21)
우선권정보 JP-0196424 (1986-08-20)
발명자 / 주소
  • Sato Masahiko (Atsugi JPX) Konuma Toshimitsu (Atsugi JPX) Odaka Seiichi (Kisakata JPX) Yamaguchi Toshiharu (Zama JPX) Watanabe Toshio (Atsugi JPX) Aoyagi Osamu (Atsugi JPX) Tabata Kaoru (Atsugi JPX)
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd. (Atsugi JPX 03)
인용정보 피인용 횟수 : 87  인용 특허 : 3

초록 ▼

An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this st

대표청구항 ▼

A method for manufacturing a liquid crystal device comprising the step of: forming electrode arrangement on the inside surfaces of a pair of substrates; coating the inside surface of one of said substrate with photocurable resin; exposing the photocurable resin coating to illumination except for the

이 특허에 인용된 특허 (3)

  1. Nishimura Katsuo (Tokorozawa JPX) Nanya Takanori (Tokorozawa JPX), Liquid type display cells and method of manufacturing the same.
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  2. Inamoto Tadayoshi (Machida JPX) Yokota Masami (Hiratsuka JPX) Sugitani Hiroshi (Machida JPX), Method for producing ink jet recording head.
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  3. Shaham Yifal J. (Los Angeles CA) Pines Michael Y. (Los Angeles CA) Koda N. John (Vista CA) Murphy Daniel F. (Carlsbad CA), Thermally insulative and electrically conductive interconnect and process for making same.
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이 특허를 인용한 특허 (87)

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