초록 ▼

An apparatus and method for creating an aperture between the lenslets of a lenslet array, which lenslet array has been produced by a process that leaves at least partially opaque barriers between the lenslets, comprising utilizing a photoresist over the entire surface of the lenslets and the spaces

An apparatus and method for creating an aperture between the lenslets of a lenslet array, which lenslet array has been produced by a process that leaves at least partially opaque barriers between the lenslets, comprising utilizing a photoresist over the entire surface of the lenslets and the spaces therebetween and shining ultraviolet light from the back of the array so that light exposes the photoresist in the lenslet portions and not in the areas therebetween.

대표청구항 ▼

The method of applying a material between the lenslets of a lenslet array, which array includes a body of material with a first surface upon which the lenslets are formed in first areas with second areas therebetween and a second surface spaced from the first surface and with at least partly opaque

The method of applying a material between the lenslets of a lenslet array, which array includes a body of material with a first surface upon which the lenslets are formed in first areas with second areas therebetween and a second surface spaced from the first surface and with at least partly opaque portions in said body extending between the first and second surfaces under only the second areas comprising the steps of: A. applying a photoresist over the first surface; B. shining an ultraviolet light through the body of material from the second surface to the first surface, the at least partly opaque portion of the body blocking a portion of the light from reaching the second areas so that they are affected differently by the light than the first areas to facilitate photoresist removal in one of the first and second areas; and C. removing the photoresist from one of the first and second areas.