초록 ▼

A rotatable substrate holder (6) which has a plurality of substrate pickups in a circular arrangement at equal distances apart is disposed in a vacuum chamber (1). A corresponding number of substrates are driven stepwise on a circular path from an air lock station (8, 9) through at least one coating

A rotatable substrate holder (6) which has a plurality of substrate pickups in a circular arrangement at equal distances apart is disposed in a vacuum chamber (1). A corresponding number of substrates are driven stepwise on a circular path from an air lock station (8, 9) through at least one coating station (10, 11) to the air lock station. To increase the throughput of substrates, the vacuum chamber (1) has two air lock stations (8, 9) and two coating stations (10, 11) one following the other. The step size of the drive (36) on the one hand, and the angular position of each coating station (10 and 11, respectively) with respect to the air lock station associated with it (8 and 9, respectively) with reference to the axis of rotation of the substrate holder (6) on the other hand, are selected such that one and the same coating station (10 and 11, respectively), through the step-wise movement of a particular substrate pickup (63), is associated in each case with one and the same air lock station (8 and 9, respectively).

대표청구항 ▼

Apparatus according to the carousel principle for the coating of substrates, with a vacuum chamber and a rotatable substrate holder disposed therein, which has in equidistant distribution and in circular arrangement a plurality of substrate pickups, adjacent pickups being angularly separated by a pi

Apparatus according to the carousel principle for the coating of substrates, with a vacuum chamber and a rotatable substrate holder disposed therein, which has in equidistant distribution and in circular arrangement a plurality of substrate pickups, adjacent pickups being angularly separated by a pitch angle, said holder being and is transportable step-wise by means of a drive on a circular path from an air lock station through at least one coating station to an air lock station, characterized in that the vacuum chamber (1) has, in the circumferential direction of the rotatable substrate holder (6), two air lock stations (8, 9) and two coating stations (10, 11), one behind the other in each case, and that the stepping width of the drive (36) on the one hand, and, on the other hand, the angular position of each coating station (10 and 11, respectively) to the air lock station (8 or 9, respectively) associated with it, are selected in reference to the axis of rotation of the substrate holder (6) such that one and the same coating station (10 and 11, respectively) is associated, via the step-wise movement of a particular substrate pickup (63), with one and the same air lock station (8 and 9, respectively). Apparatus according to claim 1, characterized in that the coating station (10, 11) has a cathode chamber (77, 73) disposed on the vacuum chamber (1), with a sputtering cathode (67) with a target (68), whose sputtering surface (68a) faces the substrate holder (6), that between the target and the substrate holder a mask holder (76) with a mask (80) is disposed, and that underneath the vacuum chamber (1) a lifting means (77) is disposed, with a lift rod (78) sealingly penetrating the chamber floor (3), by which the substrate (26) can be pressed by means of the substrate pickup concentrically against the mask (80).